A corrosion-resistant member including: a metal base material (10); and a corrosion-resistant coating (30) formed on the surface of the base material (10). The corrosion-resistant coating (30) is a stack of a magnesium fluoride layer (31) and an aluminum fluoride layer (32) in order from the base material (10) side. The aluminum fluoride layer (32) is a stack of a first crystalline layer (32A) containing crystalline aluminum fluoride, an amorphous layer (32B) containing amorphous aluminum fluoride, and a second crystalline layer (32C) containing crystalline aluminum fluoride in order from the magnesium fluoride layer (31) side. The first crystalline layer (32A) and the second crystalline layer (32C) are layers in which diffraction spots are observed in electron beam diffraction images obtained by electron beam irradiation and the amorphous layer (32B) is a layer in which a halo pattern is observed in an electron beam diffraction image obtained by electron beam irradiation.

Deposition processes are disclosed herein for depositing thin films comprising a dielectric transition metal compound phase and a conductive or semiconducting transition metal compound phase on a substrate in a reaction space. Deposition processes can include a plurality of super-cycles. Each super-cycle may include a dielectric transition metal compound sub-cycle and a reducing sub-cycle. The dielectric transition metal compound sub-cycle may include contacting the substrate with a dielectric transition metal compound. The reducing sub-cycle may include alternately and sequentially contacting the substrate with a reducing agent and a nitrogen reactant. The thin film may comprise a dielectric transition metal compound phase embedded in a conductive or semiconducting transition metal compound phase.

An optical thin film provided on a base substrate, includes a layer whose main component is ytterbium oxide, and a layer whose main component is magnesium fluoride. The layer whose main component is magnesium fluoride disposed on the layer whose main component is ytterbium oxide. The layer whose main component is magnesium fluoride is positioned opposite from the base substrate with respect to the layer whose main component is ytterbium oxide.

Several embodiments of the present technology are directed to actively controlling a temperature of a substrate in a chamber during manufacturing of a material or thin film. In some embodiments, the method can include cooling or heating the substrate to have a temperature within a target range, depositing a material over a surface of the substrate, and controlling the temperature of the substrate while the material is being deposited. In some embodiments, controlling the temperature of the substrate can include removing thermal energy from the substrate by directing a fluid over the substrate to maintain the temperature of the substrate within a target range throughout the deposition process.

An infrared-cut filter structure is disclosed. The infrared-cut filter structure uses a glass substrate having an upper side and a lower side, with a first multilayer film formed on the upper side and a second multilayer film formed on the lower side so that the infrared-cut filter can effectively filter out infrared light and transmit visible light to produce normal colored images.

Techniques for depositing a functionally integrated coating structure on a substrate are provided. An example method according to the disclosure includes receiving the substrate into a process chamber of a multi-process ion beam assisted deposition system, disposing the substrate in a first zone including a first evaporator species and a first ion beam, wherein the first evaporator species is Aluminum Oxide (Al2O3), disposing the substrate in a second zone including a second evaporator species and a second ion beam, wherein the second evaporator species is Yttrium Oxide (Y2O3), and disposing the substrate in a third zone including a third evaporator species and a third ion beam, wherein the third evaporator species is Yttrium Fluoride (YF3).

A method for depositing an inorganic perovskite layer, comprising the following steps: providing a substrate and an inorganic target; positioning the substrate and the target in a close-space sublimation furnace; depositing an inorganic perovskite layer onto the substrate by sublimation of the target.

A carbon nanotube-based reference electrode and an all-carbon nanotube microelectrode assembly for electrochemical sensing and specialized analytics are disclosed, along with methods of manufacture, and applications including detection of ionic species including heavy metals in municipal and environmental water, monitoring of steel corrosion in steel-reinforced concrete, and analysis of biological fluids.

A scintillator plate provided with a scintillator having, on a substrate, a first surface facing the substrate and a second surface on an opposite side to the first surface is provided. The scintillator includes needle-like crystals each containing an alkali metal halide compound, thallium iodide, and copper and/or silver as an additive element. The additive element is contained in the second surface at a concentration of not less than 0.04 mol % and not more than 0.5 mol %, and has a higher concentration in the first surface than in the second surface. A thickness of a largest portion of each of the needle-like crystals becomes not less than one time and not more than nine times a thickness at a height of 10 μm in a direction from the first surface to the second surface.

An optical filter may include a set of optical filter layers disposed onto a substrate. The set of optical filter layers may include a first subset of optical filter layers comprising a first material with a first refractive index. The first material may comprise at least silicon and hydrogen. The set of optical filter layers may include a second subset of optical filter layers comprising a second material with a second refractive index. The second material is different from the first material and the second refractive index is less than the first refractive index. The set of optical filter layers may include a third subset of optical filter layers comprising a third material different from the first material and the second material.