There is provided a substrate processing apparatus for performing film formation by supplying a processing gas to a substrate, including: a rotary table provided in a processing container; a mounting stand provided to mount the substrate and configured to be revolved by rotating the rotary table; a processing gas supply part configured to supply a processing gas to a region through which the mounting stand passes by the rotation of the rotary table; a rotation shaft rotatably provided in a portion rotating together with the rotary table and configured to support the mounting stand; a driven gear provided on the rotation shaft; a driving gear provided along an entire circumference of a revolution trajectory of the driven gear to face the revolution trajectory of the driven gear and configured to constitute a magnetic gear mechanism with the driven gear; and a rotating mechanism configured to rotate the driving gear.

Aspects of the present disclosure provide systems and apparatuses for a substrate processing assembly with a laminar flow cavity gas injection for high and low pressure. A dual gas reservoir assembly is provided in a substrate processing chamber, positioned within a lower shield assembly. A first gas reservoir is in fluid communication with a processing volume of the substrate processing assembly via a plurality of gas inlet, positioned circumferentially about the processing volume. A second gas reservoir is positioned circumferentially about the first gas reservoir, coupled therewith via one or more reservoir ports. The second gas reservoir is in fluid communication with a first gas source. A recursive path gas assembly is positioned in an upper shield body adjacent to an electrode to provide one or more gases to a dark space gap.

The present invention relates to a method for producing a blade or blade arrangement of a turbomachine, which features the following steps: producing a blade (4) from at least one blade material, machining the blade in at least one region of the blade by a surface machining process, cleaning the surface of the blade depositing an erosion protection coating (10) of at least two layers of different hardness by physical vapor deposition in the at least one region, machining the erosion protection coating (10) by a coating smoothing process in order to establish a defined surface roughness.

Furthermore, the invention relates to correspondingly produced blades or blade arrangements.

A first device is provided. The device includes a print head. The print head further includes a first nozzle hermetically sealed to a first source of gas. The first nozzle has an aperture having a smallest dimension of 0.5 to 500 microns in a direction perpendicular to a flow direction of the first nozzle. At a distance from the aperture into the first nozzle that is 5 times the smallest dimension of the aperture of the first nozzle, the smallest dimension perpendicular to the flow direction is at least twice the smallest dimension of the aperture of the first nozzle.

Certain exemplary embodiments can provide a system, which can comprise an ultra-thin polymer ceramic composite separator. The ultra-thin polymer ceramic composite separator can comprise Li-ion conducting ceramic material. The ceramic composite separator has a columnar grained microstructure. The ultra-thin polymer ceramic composite separator can comprise a single or bi-layer combination of LiPON, LATP, garnets, lithium sulfides, or Li.sub.1+2xZr.sub.2−zCa(PO.sub.4).sub.3.

A sputtering system and a sputtering method are provided. The sputtering system includes a first electrode, a magnet and a second electrode. The first electrode is an elongated tube having a first end and a second end downstream of the first end. The first end is configured to receive a gas flow and the second end is placed next to a substrate. The magnet surrounds at least a portion of the elongated tube and is configured to generate a magnetic field in a space within the elongated tube. The second electrode is disposed within the elongated tube. A voltage is configured to be applied between the first and second electrodes to generate an electric field between the first and second electrodes.

A device for use in OVJP and similar arrangements includes a print head movable in more than one degree of freedom with sufficient thermal insulation that there is little to no movement in the Z direction. One or more sensors may be used to monitor and adjust the distance between the substrate and the print head.

The invention relates to a device for forming coatings on surfaces of a component, band-shaped material, or tool, in which at least one wire-shaped or band-shaped material (2.1 and/or 2.2) is used for forming the coating and that is/are connected to a direct electrical current source, wherein an electric arc is formed between wire-shaped materials (2.1 and 2.2) or between one wire-shaped or band-shaped material and one anode or cathode, wherein wire-shaped or band-shaped material (2.1 and/or 2.2) may be fed by means of a feed device; and melted and/or evaporated material of the wire-shaped or band-shaped material (2.1 and/or 2.2) flows, by means of a gas jet (3) of a gas or gas mixture, through an inlet into the interior of a chamber (4) that can be heated to a temperature that is at least equal to the evaporation temperature of the at least one material used for the coating or of the material with the highest evaporation temperature, and the material(s) completely evaporates and exits through at least one opening (5) present on the chamber (4) and impinges on the surface to be coated of the component or tool (6) for forming the coating.

In a drill, a negative hind is provided on a rake face, and a ridge line at an intersecting position of the negative land and a flank face, a ridge line at an intersecting position of the flank face and a margin, and a ridge line at an intersecting position of the negative land and the margin are convex faces in a longitudinal rectangular cross section. When a curvature radius of the convex face of a first ridge line at the intersecting position of the flank face and the negative land is 1, at curvature radius of the convex face of a second ridge line at the intersecting position of the flank face and the margin is 0.8 to 1.5 times the curvature radius of the first ridge line, and a curvature radius of the convex face of a fourth ridge line at the intersecting position of the negative land and the margin is 1.5 to 3.0 times the curvature radius of the first ridge line.

The present invention provides an apparatus for forming a uniform, large scale nanoparticle coating on a substrate. The apparatus comprises a source of vaporised metal nanoparticles. The apparatus further comprises a first plate (20) providing an array of spaced apart first apertures (22). The apparatus further comprises a second plate (24) aligned with and spaced apart from the first plate (20). The second plate (24) provides an array of spaced apart second apertures 26. Each second aperture (26) of the second plate (24) is aligned with a first aperture (22) of the first plate (20).