A laminate including a base material and a resin layer provided on at least one surface of the base material. The resin layer is formed of a heat- or active energy ray-curable resin composition, and an outermost surface of the laminate on the one surface side of the base material has an unevenness containing a wrinkle structure.

A method of forming a low reflectivity coating on an optical surface for wide angle of incidence is provided. The method includes depositing a low refractive index layer of material on a stack of dielectric layers, depositing a hydrophobic compatible material on the stack of dielectric layers, forming a blend interface layer on the stack of dielectric layers, the blend interface layer including a portion of the low refractive index layer of material and a portion of the hydrophobic compatible material, and depositing a hydrophobic layer of material adjacent to the blend interface layer. A physical vapor deposition chamber to perform the above method is also provided.

A method of forming a low reflectivity coating on an optical surface for wide angle of incidence is provided. The method includes depositing a low refractive index layer of material on a stack of dielectric layers, depositing a hydrophobic compatible material on the stack of dielectric layers, forming a blend interface layer on the stack of dielectric layers, the blend interface layer including a portion of the low refractive index layer of material and a portion of the hydrophobic compatible material, and depositing a hydrophobic layer of material adjacent to the blend interface layer. A physical vapor deposition chamber to perform the above method is also provided.

Provided are a transparent member having excellent transparency and maintaining anti-fogging properties for a long period of time and a method for producing a transparent member. A transparent member includes a substrate and a stacked body having an organic layer and an inorganic porous layer stacked on the substrate in the mentioned order such that the both layers are in contact with each other, in which the organic layer includes an organic molecular chain network including an organic polymer chain and an organic crosslinking chain having 3 or more to 30 or less carbon atoms, and an acidic group aggregate, and in which the inorganic porous layer has hydrophilicity and includes silicon oxide.

Provided are a transparent member having excellent transparency and maintaining anti-fogging properties for a long period of time and a method for producing a transparent member. A transparent member includes a substrate and a stacked body having an organic layer and an inorganic porous layer stacked on the substrate in the mentioned order such that the both layers are in contact with each other, in which the organic layer includes an organic molecular chain network including an organic polymer chain and an organic crosslinking chain having 3 or more to 30 or less carbon atoms, and an acidic group aggregate, and in which the inorganic porous layer has hydrophilicity and includes silicon oxide.

Disclosed are a mask device, a manufacturing method thereof, an evaporation method and a display device. The mask device includes: a mask frame; at least one first mask strip extending in a first direction, at least one second mask strip extending in a second direction, and a first mask plate extending in the first direction, which are fixed on the mask frame. The first direction crosses the second direction, the first mask strip and the second mask strip are intersected to define at least one mask opening, the first mask plate includes a mask pattern region, and the mask pattern region includes a first group of through holes covered by an orthographic projection of the at least one mask opening on the first mask plate, and a second group of through holes covered by an orthographic projection of the first and second mask strips on the first mask plate.

Disclosed are a mask device, a manufacturing method thereof, an evaporation method and a display device. The mask device includes: a mask frame; at least one first mask strip extending in a first direction, at least one second mask strip extending in a second direction, and a first mask plate extending in the first direction, which are fixed on the mask frame. The first direction crosses the second direction, the first mask strip and the second mask strip are intersected to define at least one mask opening, the first mask plate includes a mask pattern region, and the mask pattern region includes a first group of through holes covered by an orthographic projection of the at least one mask opening on the first mask plate, and a second group of through holes covered by an orthographic projection of the first and second mask strips on the first mask plate.

A plasma vapor deposition (PVD) chamber used for depositing material includes an apparatus for influencing ion trajectories during deposition in an edge region of a substrate. The apparatus includes a reflector assembly that surrounds a substrate support and is configured to reflect heat to the substrate during reflowing of material deposited on the substrate and a plurality of permanent magnets embedded in the reflector assembly that are configured to influence ion trajectories on the edge region of the substrate during deposition processes, the plurality of permanent magnets are spaced symmetrically around the reflector assembly.

A plasma vapor deposition (PVD) chamber used for depositing material includes an apparatus for influencing ion trajectories during deposition in an edge region of a substrate. The apparatus includes a reflector assembly that surrounds a substrate support and is configured to reflect heat to the substrate during reflowing of material deposited on the substrate and a plurality of permanent magnets embedded in the reflector assembly that are configured to influence ion trajectories on the edge region of the substrate during deposition processes, the plurality of permanent magnets are spaced symmetrically around the reflector assembly.

A versatile high throughput deposition apparatus includes a process chamber and a workpiece platform in the process chamber. The workpiece platform can hold a plurality of workpieces around a center region and to rotate the plurality of workpieces around the center region. Each of the plurality of workpieces includes a deposition surface facing the center region. A gas distribution system can distribute a vapor gas in the center region of the process chamber to deposit a material on the deposition surfaces on the plurality of workpieces. A magnetron apparatus can form a closed-loop magnetic field near the plurality of workpieces. The plurality of workpieces can be electrically biased to produce a plasma near the deposition surfaces on the plurality of workpieces.