A mask manufacturing method includes the steps of: providing a substrate, wherein the substrate has a surface; forming a photoresist pattern on the substrate and covering a first part of the surface of the substrate with the photoresist pattern; providing a metal frame, wherein the metal frame has an inner wall enclosing a within-frame zone, and an area of the within-frame zone is smaller than an area of the surface of the substrate; assembling the metal frame and the substrate, so as to connect the inner wall with the surface and expose the photoresist pattern to the within-frame zone; and performing metal deposition in the within-frame zone and forming a deposited metal layer on the surface. The invention further provides a mask manufactured by the aforementioned mask manufacturing method.

The present application describes apparatus (100) for colouring an additively manufactured polymer part, comprising a chamber (106) for locating at least one additively manufactured polymer part (105) to be coloured, a first reservoir (102) for containing dye pigment particles to be suspended in a gas, and fluidly coupled to the chamber, and a further reservoir (104) for containing a solvent vapour, and fluidly coupled to the chamber. A method of colouring an additively manufactured polymer part is also described.

The present application describes apparatus (100) for colouring an additively manufactured polymer part, comprising a chamber (106) for locating at least one additively manufactured polymer part (105) to be coloured, a first reservoir (102) for containing dye pigment particles to be suspended in a gas, and fluidly coupled to the chamber, and a further reservoir (104) for containing a solvent vapour, and fluidly coupled to the chamber. A method of colouring an additively manufactured polymer part is also described.

Implementations of the present disclosure generally relate to separators, high performance electrochemical devices, such as, batteries and capacitors, including the aforementioned separators, and methods for fabricating the same. In one implementation, a method of forming a separator for a battery is provided. The method comprises exposing a metallic material to be deposited on a surface of an electrode structure positioned in a processing region to an evaporation process. The method further comprises flowing a reactive gas into the processing region. The method further comprises reacting the reactive gas and the evaporated metallic material to deposit a ceramic separator layer on the surface of the electrode structure.

Implementations of the present disclosure generally relate to separators, high performance electrochemical devices, such as, batteries and capacitors, including the aforementioned separators, and methods for fabricating the same. In one implementation, a method of forming a separator for a battery is provided. The method comprises exposing a metallic material to be deposited on a surface of an electrode structure positioned in a processing region to an evaporation process. The method further comprises flowing a reactive gas into the processing region. The method further comprises reacting the reactive gas and the evaporated metallic material to deposit a ceramic separator layer on the surface of the electrode structure.

A display processing mask manufacturing apparatus includes a stage, a clamp arranged outside the stage, and a chuck configured to move in a direction and arranged above the stage. The clamp includes a first clamp and a second clamp spaced apart from the first clamp in a first direction and arranged at a position opposite to a position of the first clamp with respect to the stage, and the chuck includes a first chuck and a second chuck spaced apart from the first chuck in a second direction crossing the first direction.

A display processing mask manufacturing apparatus includes a stage, a clamp arranged outside the stage, and a chuck configured to move in a direction and arranged above the stage. The clamp includes a first clamp and a second clamp spaced apart from the first clamp in a first direction and arranged at a position opposite to a position of the first clamp with respect to the stage, and the chuck includes a first chuck and a second chuck spaced apart from the first chuck in a second direction crossing the first direction.

A hybrid halide perovskite film and methods of forming a hybrid halide perovskite film on a substrate are described. The film is formed on the substrate by depositing an organic solution on a substrate, heating the substrate and the organic solution to form an organic layer on the substrate, depositing an inorganic layer on the organic layer, and heating the substrate having the inorganic layer thereon to form a hybrid halide perovskite film. In some embodiments, the hybrid halide perovskite film comprises a CH[NH.sub.2].sub.2.sup.+MX.sub.3 compound, where M is selected from the group consisting of Sn, Pb, Bi, Mg and Mn, and where X is selected from the group consisting of I, Br and Cl. In other embodiments, the hybrid halide perovskite film comprises a FAMX.sub.3 compound. Methods of forming a piezoelectric device are also disclosed.

A hybrid halide perovskite film and methods of forming a hybrid halide perovskite film on a substrate are described. The film is formed on the substrate by depositing an organic solution on a substrate, heating the substrate and the organic solution to form an organic layer on the substrate, depositing an inorganic layer on the organic layer, and heating the substrate having the inorganic layer thereon to form a hybrid halide perovskite film. In some embodiments, the hybrid halide perovskite film comprises a CH[NH.sub.2].sub.2.sup.+MX.sub.3 compound, where M is selected from the group consisting of Sn, Pb, Bi, Mg and Mn, and where X is selected from the group consisting of I, Br and Cl. In other embodiments, the hybrid halide perovskite film comprises a FAMX.sub.3 compound. Methods of forming a piezoelectric device are also disclosed.

Embodiments disclosed herein generally provide improved control of gas flow in processing chambers. In at least one embodiment, a liner for a processing chamber includes an annular body having a sidewall and a vent formed in the annular body for exhausting gas from inside to outside the annular body. The vent comprises one or more vent holes disposed through the sidewall. The liner further includes an opening in the annular body for substrate loading and unloading.