The disclosure is related to reducing the cost of sputtering target products. Provided is a sputtering target product wherein: the sputtering target product includes a target, a backing plate or backing tube, and insert material layer; at least a part of the non-sputtering side of the target is profiled so as to have protrusions and recesses that have plane symmetry; the insert material layer is formed so as to adhere closely to the profiled side, and the insert material is made of metal with specific gravity that is at least less than those of the metal constituting the target.

This optical laminate includes a transparent substrate, an optical functional layer, and an antifouling layer laminated in this order, wherein the optical functional layer is a laminate in which a low refractive index layer and a high refractive index layer are alternately laminated, the antifouling layer is formed of a vapor-deposited film obtained by vapor deposition of an antifouling material, and the residual amount of fluorine atoms in the antifouling layer detected by XRF after 10 minutes of cleaning by irradiation with 40 KHz and 240 W ultrasonic waves in a fluorine-based solvent is 70% or more.

This optical laminate includes a transparent substrate, an optical functional layer, and an antifouling layer laminated in this order, wherein the optical functional layer is a laminate in which a low refractive index layer and a high refractive index layer are alternately laminated, the antifouling layer is formed of a vapor-deposited film obtained by vapor deposition of an antifouling material, and the residual amount of fluorine atoms in the antifouling layer detected by XRF after 10 minutes of cleaning by irradiation with 40 KHz and 240 W ultrasonic waves in a fluorine-based solvent is 70% or more.

The transparent conductive layer (3) includes a first main surface (5), and a second main surface (6) opposed to the first main surface (5) in a thickness direction. The transparent conductive layer (3) has a first grain boundary (7) in which two end edges (23) in a cross-sectional view are both opened to the first main surface (5) and an intermediate region (25) between the end edges (23) is not in contact with the second main surface (6); and a first crystal grain (31) partitioned by the first grain boundary (7) and facing only the first main surface (5). The transparent conductive layer (3) contains rare gas atoms having a higher atomic number than argon atoms.

A transparent electroconductive film (X) includes a resin film (11) and a light-transmitting electroconductive layer (20) in this order in a thickness direction (D). The light-transmitting electroconductive layer (20) has a first compressive residual stress in a first in-plane direction orthogonal to the thickness direction (D), and has a second compressive residual stress less than the first compressive residual stress in a second in-plane direction orthogonal to each of the thickness direction (D) and the first in-plane direction. A ratio of the second compressive residual stress to the first compressive residual stress is 0.82 or less.

A film contains a fluororesin, a chromatic pigment, and a black pigment, in which a visible light transmittance of the film is from 5 to 60% and a haze value of the film is 30% or less.

A film contains a fluororesin, a chromatic pigment, and a black pigment, in which a visible light transmittance of the film is from 5 to 60% and a haze value of the film is 30% or less.

A process for protecting a part made of a hafnium-free nickel-based single-crystal superalloy against corrosion and oxidation includes manufacturing a part made of a hafnium-free nickel-based single-crystal superalloy, depositing successively on the part, a first layer including hafnium, then a mixed layer of stacked layers of an undercoat of an alloy having 10 atomic % or more of aluminum and a second layer including hafnium or a mixed layer of an alloy of aluminum and hafnium, and then a third layer including hafnium, and diffusing and performing an oxidation treatment so as to obtain a hafnium-doped alumina layer.

A process for protecting a part made of a hafnium-free nickel-based single-crystal superalloy against corrosion and oxidation includes manufacturing a part made of a hafnium-free nickel-based single-crystal superalloy, depositing successively on the part, a first layer including hafnium, then a mixed layer of stacked layers of an undercoat of an alloy having 10 atomic % or more of aluminum and a second layer including hafnium or a mixed layer of an alloy of aluminum and hafnium, and then a third layer including hafnium, and diffusing and performing an oxidation treatment so as to obtain a hafnium-doped alumina layer.

Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer, which are in direct contact with one another. The interfacial region contains an ion conducting electronically insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices. In addition to the improved electrochromic devices and methods for fabrication, integrated deposition systems for forming such improved devices are also disclosed.