A DC magnetron sputtering apparatus is for depositing a film on a substrate. The apparatus includes a chamber, a substrate support positioned within the chamber, a DC magnetron, and an electrical signal supply device for supplying an electrical bias signal that, in use, causes ions to bombard a substrate positioned on the substrate support. The substrate support includes a central region surrounded by an edge region, the central region being raised with respect to the edge region.

The invention relates to a method for producing a coated cutting tool in which a coating with at least one oxide layer is applied to a base layer by means of a PVD method. The method includes voltage-pulsed sputtering of at least one cathode metal selected from the group of aluminum, scandium, yttrium, silicon, zinc, titanium, zirconium, hafnium, chromium, niobium, and tantalum, as well as mixtures and alloys thereof in the presence of a reactive gas; and the depositing of at least one oxide layer formed by converting the reactive gas with the sputtered cathode metal onto the base body. The cathode metal includes at least aluminum. Dinitrogen oxide is used as the reactive gas. The at least one oxide layer is in the form of an oxide, mixed oxide, or oxide mixture of the at least one cathode metal.

Embodiments of the present invention disclose a refrigerator having a main body including a storage space, a door coupled to the main body, and a glass film member covering at least a portion of a front surface of the door. The glass film member includes a glass panel, a protection layer bonded onto the glass panel, a film bonded to the protection layer, the film including a transparent film layer having a pattern formed on a surface thereof, a metal deposition layer deposited on the transparent film layer, and a coating layer coated on the transparent film layer.

Embodiments of the present invention disclose a refrigerator having a main body including a storage space, a door coupled to the main body, and a glass film member covering at least a portion of a front surface of the door. The glass film member includes a glass panel, a protection layer bonded onto the glass panel, a film bonded to the protection layer, the film including a transparent film layer having a pattern formed on a surface thereof, a metal deposition layer deposited on the transparent film layer, and a coating layer coated on the transparent film layer.

A highly reliable semiconductor device includes a first insulator, a second insulator, a first conductor, a third insulator, an oxide semiconductor, second and third conductors, a fourth insulator, a fourth conductor overlapping with a region between the second and third conductors, a fifth insulator, and a sixth insulator in this order. The fourth insulator is in contact with top and side surfaces of the oxide semiconductor, and a top surface of the third insulator. The fifth insulator is in contact with the side surface of the oxide semiconductor and the top surface of the third insulator so as to cover the oxide semiconductor, the second to fourth conductors, and the fourth insulator. The first, second, fifth, and sixth insulators have low permeability for hydrogen, water, and oxygen. The first and sixth insulators have a thinner thickness than the second and sixth insulators, respectively.

A highly reliable semiconductor device includes a first insulator, a second insulator, a first conductor, a third insulator, an oxide semiconductor, second and third conductors, a fourth insulator, a fourth conductor overlapping with a region between the second and third conductors, a fifth insulator, and a sixth insulator in this order. The fourth insulator is in contact with top and side surfaces of the oxide semiconductor, and a top surface of the third insulator. The fifth insulator is in contact with the side surface of the oxide semiconductor and the top surface of the third insulator so as to cover the oxide semiconductor, the second to fourth conductors, and the fourth insulator. The first, second, fifth, and sixth insulators have low permeability for hydrogen, water, and oxygen. The first and sixth insulators have a thinner thickness than the second and sixth insulators, respectively.

In various embodiments, a sputtering target initially formed by ingot metallurgy or powder metallurgy and rejuvenated by, e.g., cold spray, is utilized in sputtering processes to produce metallic thin films.

A process for the production of an optically selective coating of a receiver substrate of a suitable material for solar receiver devices particularly suitable for operating at high temperatures, more specifically for receiver tubes of linear parabolic trough, which comprises: deposition of a layer reflecting infrared radiation consisting of a high-melting metal on a heated receiver substrate of a suitable material; annealing under the same temperature and pressure conditions as the deposition of the reflecting layer; deposition on the high-melting metal of one or more layers of metal-ceramic composite materials (CERMET), wherein the metal is W and the ceramic matrix is YPSZ (“Yttria-Partially Stabilized Zirconia”); deposition on the cermet of an antireflection layer; annealing under the same temperature and pressure conditions as the depositions of the cermet and antireflection layers.

A process for the production of an optically selective coating of a receiver substrate of a suitable material for solar receiver devices particularly suitable for operating at high temperatures, more specifically for receiver tubes of linear parabolic trough, which comprises: deposition of a layer reflecting infrared radiation consisting of a high-melting metal on a heated receiver substrate of a suitable material; annealing under the same temperature and pressure conditions as the deposition of the reflecting layer; deposition on the high-melting metal of one or more layers of metal-ceramic composite materials (CERMET), wherein the metal is W and the ceramic matrix is YPSZ (“Yttria-Partially Stabilized Zirconia”); deposition on the cermet of an antireflection layer; annealing under the same temperature and pressure conditions as the depositions of the cermet and antireflection layers.

A plasmonic sensor, having at least a substrate, a laser processed active surface area on the said substrate, and a metal coating on the activate surface, where the laser processed surface is fabricated by means of short laser pulses in such a way that in a shallow layer of the surface material, the viscosity is reduced and under the influence of the same pulse, which was used to reduce the viscosity, or a successive incident one or more pulses a self-organized, stochastic nanostructure is formed, which has features smaller than 1 μm. In some implementations, the substrate material is amorphous, such as soda-lime glass or similar. Also disclosed is a slide and/or a slip cover, which are used in microscopy, for forming the active sensor area on top surface of it.