In one embodiment, a semiconductor manufacturing apparatus includes a carrier having first and second ends extending in a first direction, and third and fourth ends extending in a second direction and being not shorter than the first and second ends. The apparatus further includes a member holder having a magnet placement face on which first and second magnetic-pole portions are placed, the magnet placement face having fifth and sixth ends extending in the first direction and being shorter than the first and second ends, and seventh and eighth ends extending in the second direction, being longer than the fifth and sixth ends, and being longer than the third and fourth ends. The apparatus further includes a carrier transporter transporting the carrier along the first direction. The carrier transporter can transport the carrier such that the third and fourth ends pass under a center line of the magnet placement face.

Embodiments relate to a sputter chamber comprising both a target surface and an anode surface. The sputter chamber has both an ingress and an egress to allow passage of a gas. The sputter chamber further includes a target substrate. A secondary material flexibly changes the composition of the target substrate in-situ by changing coverage of the target by the secondary material. Gas entering the sputter chamber interacts with the changed composition of the target. The interaction discharges a plasma alloy and the alloy condenses on the anode surface in the sputter chamber. The condensed alloy produces an alloy film.

A target device for a magnetic spattering coating device includes: a spattering target fixture; a target bearing plate installed on the spattering target fixture, for bearing a target; a magnetic pole device fixed on one surface of the spattering target fixture backing toward the target bearing plate, for producing a horizontal magnetic field on one surface of the target. A predetermined interval is formed between the magnetic pole device and corresponding margins of the target bearing plate. The present invention can not only enhances utilization of the target but also makes the thin film deposited on the substrate highly well-distributed.

The embodiments herein relate to electrochromic stacks, electrochromic devices, and methods and apparatus for making such stacks and devices. In various embodiments, an anodically coloring layer in an electrochromic stack or device is fabricated to include nickel-tungsten-tin-oxide (NiWSnO). This material is particularly beneficial in that it is very transparent in its clear state.

The embodiments herein relate to electrochromic stacks, electrochromic devices, and methods and apparatus for making such stacks and devices. In various embodiments, an anodically coloring layer in an electrochromic stack or device is fabricated to include nickel-tungsten-tin-oxide (NiWSnO). This material is particularly beneficial in that it is very transparent in its clear state.

A W.sub.18O.sub.49 peak is confirmed by X-ray diffraction analysis of a sputtering surface and a cross section orthogonal to the sputtering surface, a ratio I.sub.S(103)/I.sub.S(010) of a diffraction intensity I.sub.S(103) of a (103) plane to a diffraction intensity I.sub.S(010) of a (010) plane of W.sub.18O.sub.49 of the sputtering surface is 0.38 or less, a ratio I.sub.C(103)/I.sub.C(010) of a diffraction intensity I.sub.C(103) of the (103) plane to a diffraction intensity I.sub.C(010) of the (010) plane of W.sub.18O.sub.49 of the cross section is 0.55 or more, and an area ratio of W.sub.18O.sub.49 phase of a surface parallel to the sputtering surface is 37% or more.

A method for preparing an ammonium thiomolybdate-porous amorphous carbon composite superlubricity film is disclosed. First, a porous amorphous carbon film is prepared by an anode layer ion source assisted plasma chemical vapor deposition method and a reactive magnetron sputtering method on a substrate. The porous amorphous carbon film is then impregnated in an ammonium thiomolybdate solution, so that the ammonium thiomolybdate is adsorbed on the porous amorphous carbon film, and the impregnated porous amorphous carbon film is air dried. During the friction process, the composited porous amorphous carbon superlubricity film prepared in the present disclosure promotes the in-situ decomposition of ammonium thiomolybdate to generate molybdenum disulfide by utilizing the friction heat at the initial stage of running-in, further to generate a graphene-like structure under the function of a catalyst, thus realizing a macroscopic super lubricity through a heterogeneous incommensurate contact between graphene and molybdenum disulfide.

A coated cutting tool has a hard coating on a surface of a base material. The hard coating is a nitride of Al, Cr, and Si in which Al is 50 atom % or more, Cr is 30 atom % or more, and Si is 1 atom % or more and 5 atom % or less. The hard coating contains 0.02 atom % or less of Ar, and the atomic ratio A and the atomic ratio B of nitrogen satisfy the relationship of 1.02≤B/A≤1.10, and a diffraction peak originating from the (111) plane of a face-centered cubic lattice structure shows the maximum intensity. In the cross-sectional observation of the hard coating, the number of droplets having an equivalent circle diameter of 3 μm or more is less than 1 per 100 μm.sup.2. The surface of the hard coating has an arithmetical mean curvature Spc value of 5000 or less.

There is provided a method of manufacturing a decorative surface, comprising the steps of: coating a substrate with an opaque coating using a vapour deposition process; and etching the coating to expose the substrate selectively thereby to manufacture a decorative surface.

There is provided a method of manufacturing a decorative surface, comprising the steps of: coating a substrate with an opaque coating using a vapour deposition process; and etching the coating to expose the substrate selectively thereby to manufacture a decorative surface.