Patent classifications
C23C14/50
Planetary gear assembly for sputtering multiple balloon catheter distal ends
An apparatus includes an assembly and hollow templates. The assembly includes multiple hinges mounted thereon. The assembly is configured to rotate about a first axis, and each of the hinges is additionally configured to rotate about a respective second axis. The hollow templates are fitted on the respective hinges and are each configured to contain a balloon-based distal end of a medical instrument, each template having a patterned opening through which one or more electrodes are deposited on the distal end.
System architecture for combined static and pass-by processing
Disclosed is a substrate processing system which enables combined static and pass-by processing. Also, a system architecture is provided, which reduces footprint size. The system is constructed such that the substrates are processed therein vertically, and each chamber has a processing source attached to one sidewall thereof, wherein the other sidewall backs to a complementary processing chamber. The chamber system can be milled from a single block of metal, e.g., aluminum, wherein the block is milled from both sides, such that a wall remains and separates each two complementary processing chambers.
System architecture for combined static and pass-by processing
Disclosed is a substrate processing system which enables combined static and pass-by processing. Also, a system architecture is provided, which reduces footprint size. The system is constructed such that the substrates are processed therein vertically, and each chamber has a processing source attached to one sidewall thereof, wherein the other sidewall backs to a complementary processing chamber. The chamber system can be milled from a single block of metal, e.g., aluminum, wherein the block is milled from both sides, such that a wall remains and separates each two complementary processing chambers.
METHOD FOR MAKING AN EYEGLASS LENS COATED BY MEANS OF PHYSICAL VAPOR DEPOSITION PVD AND SUPPORT BODY FOR A LENS BLANK
Method for making an eyeglass lens coated by means of physical vapor deposition PVD, such method comprising a step of arranging a lens blank, provided with a first centering reference, a step of arranging a support body, provided with a first shaped and through opening oriented with respect to a second centering reference thereof, and a step of arranging a centering template. The present method then comprises an assembly step of the lens blank with the support body and of the support body with the centering template. Subsequently, the present method comprises a step of coating the lens blank by means of physical vapor deposition PVD, and finally comprises a cutting step in which the lens blank is cut along a cutting profile shaped in eyeglass lens form and oriented with respect to the first centering reference.
Substrate processing apparatus
A substrate processing apparatus includes a supporting table having a mounting region for a substrate. A rotation shaft supporting a shutter extends in a vertical direction. The shutter is moved between a first region above the supporting table and a second region by rotating the rotation shaft about its central axis. The shutter includes a pipe having gas output holes. When the shutter is disposed in the first region, the gas output holes are located outside the mounting region in a rotation direction from the second region toward the first region. The minimum distance between the central axis and the gas output holes is smaller than or equal to the minimum distance between the central axis and the mounting region. The maximum distance between the central axis and the gas output holes is greater than equal to the maximum distance between the central axis and the mounting region.
DEPOSITION APPARATUS
A deposition apparatus, which forms a film on a substrate, includes a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.
Multi-chamber deposition equipment for solid free form fabrication
Provided is a chamber system for solid free form fabrication, the chamber system having a deposition chamber, a service chamber and one or more loading/unloading chambers. The chamber system allows for a more efficient and cost effective process to service the deposition apparatus, load holding substrates, and unload workpieces without requiring having to adjust the atmosphere in the deposition chamber.
Multi-chamber deposition equipment for solid free form fabrication
Provided is a chamber system for solid free form fabrication, the chamber system having a deposition chamber, a service chamber and one or more loading/unloading chambers. The chamber system allows for a more efficient and cost effective process to service the deposition apparatus, load holding substrates, and unload workpieces without requiring having to adjust the atmosphere in the deposition chamber.
Hard thin films
Systems and methods provide for the improvement of surface properties via deposition of a film. A typical film may comprise at least three, including at least four components, and typically includes at least one of, including both of, Nitrogen and Oxygen. A film may include at least one of Silicon, Phosphorous, and Boron, and one or more modifiers. For some films, a modifier may include an element having a cationic field strength greater than 10 {circumflex over ()}2. A film may have a high hardness and/or modulus. A film, may be substantially transparent to visible light. Some films have high refractive indices. Some films have low refractive indices. Some films have very low ultraviolet extinction coefficients.
Deposition apparatus
A deposition apparatus includes a chamber, a holding unit configured to hold a substrate in the chamber, a driving unit configured to move the holding unit holding the substrate such that the substrate passes through a deposition area in the chamber, a deposition unit configured to form a film on the substrate passing through the deposition area by supplying a deposition material to the deposition area, and a cooling unit configured to cool the holding unit.