A vacuum system for depositing a plurality of materials on a substrate is described. The vacuum system includes a plurality of deposition modules arranged along a main transport direction and including deposition sources which are movable in the main transport direction; and a transport system with a plurality of tracks extending in the main transport direction through the plurality of deposition modules and including a first mask track for mask transport, a first substrate track for substrate transport and a return track for returning empty carriers.

A vacuum system for depositing a plurality of materials on a substrate is described. The vacuum system includes a plurality of deposition modules arranged along a main transport direction and including deposition sources which are movable in the main transport direction; and a transport system with a plurality of tracks extending in the main transport direction through the plurality of deposition modules and including a first mask track for mask transport, a first substrate track for substrate transport and a return track for returning empty carriers.

The present disclosure discloses a display panel and a manufacturing method thereof, and a display device, and belongs to the field of display technology. The method includes: fixing a base substrate on a supporting plate; disposing the supporting plate on which the base substrate is fixed at a specified position in a process apparatus; and performing a process corresponding to the process apparatus on the base substrate which is fixed on the supporting plate by means of the process apparatus.

A piston ring for internal combustion engines provided with a ferrous alloy base includes an annular outer surface on which a coating including at least one outer layer is applied deposited on an adhesive layer, the outer layer being provided with a variable thickness, in such a way that the thickness of the outer layer gradually increases from 90 and 270 towards 0 and 360 respectively, with the thickness attaining its maximum value in the region of 10 and 350 and slightly decreasing towards 0 and 360 so as to ensure an optimal working condition, minimizing the contact pressure and consequently the accelerated wear in the vicinities of the ends of the ring, in addition to preventing and/or impeding the detachment of the outer layer of the coating.

A film forming apparatus for forming a film by reactive sputtering includes a processing chamber, a sputter mechanism, a sputtered particle shielding member, a reaction chamber, a substrate support, a substrate moving mechanism, a sputtered particle passage hole, and a reactive gas introducing unit. While moving a substrate by the substrate moving mechanism, sputtered particles, that are released to the discharge space by the sputter mechanism and pass through the sputtered particle passage hole to be injected to the reaction chamber, are reacted with a reactive gas introduced into the reaction chamber, and a reactive sputtering film generated by the reaction is formed on the substrate.

A substrate side-deposition apparatus includes a substrate mounting drum rotatable within a chamber and allowing at least one substrate to be inserted and mounted in a direction from a circumferential surface toward a center; and at least one source target configured to deposit wiring based on sputtering to a lateral side portion of the substrate exposed protruding from the circumferential surface of the substrate mounting drum.

A deposition system includes a system housing having a housing interior, a fixture transfer assembly having a generally sloped fixture transfer rail extending through the housing interior, a plurality of processing chambers connected by the fixture transfer rail, a controller interfacing with the processing chambers and at least one fixture carrier assembly carried by the fixture transfer rail and adapted to contain at least one substrate. The fixture carrier assembly travels along the fixture transfer rail under influence of gravity.

A deposition system includes a system housing having a housing interior, a fixture transfer assembly having a generally sloped fixture transfer rail extending through the housing interior, a plurality of processing chambers connected by the fixture transfer rail, a controller interfacing with the processing chambers and at least one fixture carrier assembly carried by the fixture transfer rail and adapted to contain at least one substrate. The fixture carrier assembly travels along the fixture transfer rail under influence of gravity.

A deposition system includes a system housing having a housing interior, a fixture transfer assembly having a generally sloped fixture transfer rail extending through the housing interior, a plurality of processing chambers connected by the fixture transfer rail, a controller interfacing with the processing chambers and at least one fixture carrier assembly carried by the fixture transfer rail and adapted to contain one substrate. The fixture carrier assembly travels along the fixture transfer rail under influence of gravity.

A deposition system includes a system housing having a housing interior, a fixture transfer assembly having a generally sloped fixture transfer rail extending through the housing interior, a plurality of processing chambers connected by the fixture transfer rail, a controller interfacing with the processing chambers and at least one fixture carrier assembly carried by the fixture transfer rail and adapted to contain one substrate. The fixture carrier assembly travels along the fixture transfer rail under influence of gravity.