A manufacturing method of a display device is provided. The manufacturing method includes: forming a first electrode over a substrate; forming an organic layer over the first electrode; and forming a second electrode over the organic layer by sputtering a target including a conductive oxide with a light-transmitting property. A mask is arranged between the organic layer and the target when the second electrode is formed. The mask has periodically arranged through holes with a maximum width equal to or larger than 0.1 ?m and equal to or smaller than 3 ?m.

A mask frame assembly for manufacturing a display device, and a method of manufacturing the mask frame assembly are disclosed. In one aspect, the mask frame assembly includes a frame having at least one opening portion defined therein. The mask frame assembly further includes a polymer film having a plurality of slits defined therein and combined to the frame. In another aspect, the method includes coating a polymer solution on a glass and drying and hardening the polymer solution so as to form a polymer film. The method also includes combining a frame to the polymer film, desorbing the glass from the polymer film and processing a plurality of slits on the polymer film.

A mask frame assembly for manufacturing a display device, and a method of manufacturing the mask frame assembly are disclosed. In one aspect, the mask frame assembly includes a frame having at least one opening portion defined therein. The mask frame assembly further includes a polymer film having a plurality of slits defined therein and combined to the frame. In another aspect, the method includes coating a polymer solution on a glass and drying and hardening the polymer solution so as to form a polymer film. The method also includes combining a frame to the polymer film, desorbing the glass from the polymer film and processing a plurality of slits on the polymer film.

The present disclosure provides a vacuum heating device including: a vacuum chamber; a plurality of heating units each provided in the vacuum chamber to heat a tray; and a nitrogen gas generator unit configured to be in fluid communication with the vacuum chamber.

The present disclosure provides a vacuum heating device including: a vacuum chamber; a plurality of heating units each provided in the vacuum chamber to heat a tray; and a nitrogen gas generator unit configured to be in fluid communication with the vacuum chamber.

This film-forming apparatus comprises a processing container, a sputtering target provided in the processing container, a pedestal having a mounting surface for mounting of a substrate in the processing container, a shutter member capable of covering the mounting surface, a conveyance mechanism for carrying in and carrying out the shutter member to/from the pedestal, a detection unit that is provided to the conveyance mechanism itself and detects an indicator relating to the presence/absence of the shutter member, and a processing unit for determining whether the shutter member is present/absent with respect to the conveyance mechanism on the basis of the detection result from the detection unit.

This film-forming apparatus comprises a processing container, a sputtering target provided in the processing container, a pedestal having a mounting surface for mounting of a substrate in the processing container, a shutter member capable of covering the mounting surface, a conveyance mechanism for carrying in and carrying out the shutter member to/from the pedestal, a detection unit that is provided to the conveyance mechanism itself and detects an indicator relating to the presence/absence of the shutter member, and a processing unit for determining whether the shutter member is present/absent with respect to the conveyance mechanism on the basis of the detection result from the detection unit.

The invention provides an evaporation apparatus, which is able to improve an efficiency of evaporation materials, uniformity of deposited films, and throughput of the evaporation process. Disclosed is an evaporation source holder, which is installed in an evaporation chamber and configured to hold an evaporation material, and a moving mechanism, which is configured to move the evaporation source holder during evaporation of the evaporation material. The evaporation apparatus is further characterized by a shutter over the evaporation source holder, a filter over the shutter, and a heater surrounding the filter.

A film formation apparatus for forming a self-assembled monomolecular film on a film formation surface of a substrate includes: a chamber for accommodating the substrate, the chamber including a facing inner wall surface facing the film formation surface of the substrate, the facing inner wall surface being a ground potential surface; a source gas supply part for supplying a source gas for the self-assembled monomolecular film into the chamber; and an electrode positioned between the film formation surface of the substrate accommodated in the chamber and the facing inner wall surface of the chamber, and configured to form an electric field in a direction extending from the film formation surface of the substrate accommodated in the chamber toward the facing inner wall surface of the chamber or in a direction extending from the facing inner wall surface of the chamber toward the film formation surface of the substrate.

A film formation apparatus for forming a self-assembled monomolecular film on a film formation surface of a substrate includes: a chamber for accommodating the substrate, the chamber including a facing inner wall surface facing the film formation surface of the substrate, the facing inner wall surface being a ground potential surface; a source gas supply part for supplying a source gas for the self-assembled monomolecular film into the chamber; and an electrode positioned between the film formation surface of the substrate accommodated in the chamber and the facing inner wall surface of the chamber, and configured to form an electric field in a direction extending from the film formation surface of the substrate accommodated in the chamber toward the facing inner wall surface of the chamber or in a direction extending from the facing inner wall surface of the chamber toward the film formation surface of the substrate.