An evaporation source for organic material is described. The evaporation source includes an evaporation crucible, wherein the evaporation crucible is configured to evaporate the organic material; a distribution pipe with one or more outlets, wherein the distribution pipe is in fluid communication with the evaporation crucible and wherein the distribution pipe is rotatable around an axis during evaporation; and a support for the distribution pipe, wherein the support is connectable to a first drive or includes the first drive, wherein the first drive is configured for a translational movement of the support and the distribution pipe.

A device used for making a carbon fiber film includes a chamber, a support base, and a power supply. The support base is used for suspending a carbon nanotube film in the chamber and transporting a negative voltage to the carbon nanotube film. The power supply is located outside of the chamber and used for applying the negative voltage.

A device used for making a carbon fiber film includes a chamber, a support base, and a power supply. The support base is used for suspending a carbon nanotube film in the chamber and transporting a negative voltage to the carbon nanotube film. The power supply is located outside of the chamber and used for applying the negative voltage.

The present disclosure discloses a fixing apparatus for fixing a substrate to be processed below a bearing base during an evaporation process, the substrate to be processed includes a base substrate, a ferromagnetic material is formed on a front surface or a back surface of the base substrate, and a magnetic field generator is disposed on a back surface of the bearing base at a location corresponding to the ferromagnetic material; the magnetic field generator is configured to generate a magnetic field so that the ferromagnetic material and the magnetic field generator are approaching to each other under an effect of the magnetic field generated by the magnetic field generator to fix a front surface of the bearing base with the back surface of the base substrate. An evaporation method is further disclosed.

The present disclosure discloses a fixing apparatus for fixing a substrate to be processed below a bearing base during an evaporation process, the substrate to be processed includes a base substrate, a ferromagnetic material is formed on a front surface or a back surface of the base substrate, and a magnetic field generator is disposed on a back surface of the bearing base at a location corresponding to the ferromagnetic material; the magnetic field generator is configured to generate a magnetic field so that the ferromagnetic material and the magnetic field generator are approaching to each other under an effect of the magnetic field generated by the magnetic field generator to fix a front surface of the bearing base with the back surface of the base substrate. An evaporation method is further disclosed.

A film forming apparatus for forming a film on a moving substrate by sputtering includes a processing container, a placement base having a placement surface on which a substrate is placed, a holder configured to hold a target, an upper shield member configured to divide a space in the processing container into an upper space and a lower space, a movement mechanism configured to move the placement base in a movement direction parallel to the placement surface and to move the placement base in the vertical direction, a leg member configured to connect the placement base and the movement mechanism, and a lower shield member configured to define the movement space together with the upper shield member. The lower shield member includes a fixed shield member and a moving shield member.

A film forming apparatus for forming a film on a moving substrate by sputtering includes a processing container, a placement base having a placement surface on which a substrate is placed, a holder configured to hold a target, an upper shield member configured to divide a space in the processing container into an upper space and a lower space, a movement mechanism configured to move the placement base in a movement direction parallel to the placement surface and to move the placement base in the vertical direction, a leg member configured to connect the placement base and the movement mechanism, and a lower shield member configured to define the movement space together with the upper shield member. The lower shield member includes a fixed shield member and a moving shield member.

The present invention relates to a manufacturing apparatus and a manufacturing method for microwave means. The manufacturing apparatus (1) for microwave means comprises: a fixture (10, 10′), the fixture (10, 10′) comprising a base (11) capable of rotating about a first axis (A1), and a carrier (12) capable of swinging about a second axis (A2), the carrier (12) being connected to the base (11) so as to hold an insulating substrate (40), wherein the first axis (A1) intersects the second axis (A2); a source (20) for releasing metal ions towards the insulating substrate (40); and a controller (30), the controller (30) coupled to the fixture (10, 10′) and the source (20) and configured to control a movement pattern of the fixture (10, 10′) and/or an angle of the source (20) such that the insulating substrate (40) receives the metal ions from a plurality of angles and a metal layer (50) is formed over all surfaces (41) of the insulating substrate (40).

The purpose of the invention is to provide technology, which, in addition to being capable of forming thick hard carbon films of excellent durability even using PVD, is able to establish both chipping resistance and wear resistance in the formed hard carbon film and able to improve low friction properties and peeling resistance. Provided is a coating film to be coated on the surface of a substrate, the coating film having a total film thickness of greater than 1 μm to 50 μm wherein: when a cross-section is observed using bright field TEM images, white hard carbon layers that are shown as relatively white and black hard carbon layers that are shown as black are alternately laminated in the thickness direction; and the white hard carbon layers have regions that have grown in a fan-shape in the thickness direction.

Provided are a substrate treatment apparatus and method for treating a substrate by simultaneously providing a stripper for peeling a coating film on the substrate to an entire surface of the substrate. The substrate treatment method includes discharging a first liquid onto a substrate by using a first nozzle, and forming a coating film collecting particles by using the first liquid; spraying a second liquid on the substrate by using a second nozzle, and peeling the coating film from the substrate by using the second liquid; and discharging a third liquid onto the substrate by using a third nozzle, and rinsing the coating film from the substrate by using the third liquid, wherein in the peeling of the coating film, the second liquid is simultaneously sprayed on an entire surface of the substrate.