Embodiments disclosed herein generally provide improved control of gas flow in processing chambers. In at least one embodiment, a liner for a processing chamber includes an annular body having a sidewall and a vent formed in the annular body for exhausting gas from inside to outside the annular body. The vent comprises one or more vent holes disposed through the sidewall. The liner further includes an opening in the annular body for substrate loading and unloading.

Methods and apparatus for processing a substrate are provided herein. For example, a method for processing a substrate comprises applying a DC target voltage to a target disposed within a processing volume of a plasma processing chamber, rotating a magnet disposed above the target at a default speed to direct sputter material from the target toward a substrate support disposed within the processing volume, measuring in-situ DC voltage in the processing volume, the in-situ DC voltage different from the DC target voltage, determining if a measured in-situ DC voltage is greater than a preset value, if the measured in-situ DC voltage is less than or equal to the preset value, maintaining the magnet at the default speed, and if the measured in-situ DC voltage is greater than the preset value, rotating the magnet at a speed less than the default speed to decrease the in-situ DC voltage.

A hydrogen-free carbon film polymer lubricating material and a preparation method and use thereof are disclosed. In the method, a graphite target is used as the target material, and a magnetron sputtering deposition is performed on a surface of the polymer substrate, thereby physically depositing and forming a hydrogen-free carbon film on the surface of the polymer substrate, thereby obtaining a hydrogen-free carbon film polymer lubricating material.

Provided is a cover ring assembly that allows suppressing a dust generation source and reducing adhesion of particles on a substrate. A cover ring assembly for a substrate processing apparatus, which exposes a substrate to processing particles in an internal space to process the substrate, includes an annular flat plate and a cover ring having an annular shape. The annular flat plate has an inner peripheral upper surface and an outer peripheral upper surface. The inner peripheral upper surface is in contact with an outer peripheral lower surface terminating at an outer surface of the substrate. The outer peripheral upper surface is around the inner peripheral upper surface. The cover ring has a lower portion surface having an abutting surface in contact with the outer peripheral upper surface of the annular flat plate. A thermal spraying film covering a surface exposed to the processing particles is disposed to the cover ring except for the abutting surface.

Provided is a cover ring assembly that allows suppressing a dust generation source and reducing adhesion of particles on a substrate. A cover ring assembly for a substrate processing apparatus, which exposes a substrate to processing particles in an internal space to process the substrate, includes an annular flat plate and a cover ring having an annular shape. The annular flat plate has an inner peripheral upper surface and an outer peripheral upper surface. The inner peripheral upper surface is in contact with an outer peripheral lower surface terminating at an outer surface of the substrate. The outer peripheral upper surface is around the inner peripheral upper surface. The cover ring has a lower portion surface having an abutting surface in contact with the outer peripheral upper surface of the annular flat plate. A thermal spraying film covering a surface exposed to the processing particles is disposed to the cover ring except for the abutting surface.

An apparatus for manufacturing a display device includes: a first housing having a first chamber; a support member disposed in the first chamber and including a frame having a plurality of openings; a plurality of adhesive patterns disposed on the frame; and a plurality of electrostatic supports overlapping the plurality of openings and supported for reciprocal movement in respective ones of the openings.

An apparatus for manufacturing a display device includes: a first housing having a first chamber; a support member disposed in the first chamber and including a frame having a plurality of openings; a plurality of adhesive patterns disposed on the frame; and a plurality of electrostatic supports overlapping the plurality of openings and supported for reciprocal movement in respective ones of the openings.

According to one embodiment, a method for producing a coated glass article may include applying an anti-reflective coating onto a glass substrate. The glass substrate may include a first major surface, and a second major surface opposite the first major surface. The anti-reflective coating may be applied to the first major surface of the glass substrate. A substrate thickness may be measured between the first major surface and the second major surface. The glass substrate may have an aspect ratio of at least about 100:1. The coated glass article may have a reflectance of less than 2% for all wavelengths from 450 nanometers to 700 nanometers. The anti-reflective coating may include one or more layers. The cumulative layer stress of the anti-reflective coating may have an absolute value less than or equal to about 167,000 MPa nm.

According to one embodiment, a method for producing a coated glass article may include applying an anti-reflective coating onto a glass substrate. The glass substrate may include a first major surface, and a second major surface opposite the first major surface. The anti-reflective coating may be applied to the first major surface of the glass substrate. A substrate thickness may be measured between the first major surface and the second major surface. The glass substrate may have an aspect ratio of at least about 100:1. The coated glass article may have a reflectance of less than 2% for all wavelengths from 450 nanometers to 700 nanometers. The anti-reflective coating may include one or more layers. The cumulative layer stress of the anti-reflective coating may have an absolute value less than or equal to about 167,000 MPa nm.

A device for positioning a shadow mask includes a mask application tool, the mask application tool comprising an inner body comprising, at an end surface of the inner body, one or more magnets. The mask application tool further comprises a hollow outer body for receiving the inner body, the outer body comprising, at an end surface of the outer body, a mask socket and one or more guide elements for positioning the mask application tool on a substrate tray.