According to the invention, a device is provided for coating substrates having planar or shaped surfaces by means of magnetron sputtering, by means of which device surfaces having any shape, for examples lenses, aspheres or freeform surfaces which have an adjustable layer-thickness profile, can be coated such that a layer function is maintained on the substantially complete surface. A method for coating substrates having planar or shaped surfaces by means of magnetron sputtering is also provided.

A device for conveying a sheet of substrate having two opposed main faces linked b y an edge face, wherein one of the main faces of the sheet of substrate is positioned along a reception plane of the device, the reception plane being close to a vertical plane, including a plurality of lower rollers positioned side by side along a conveying direction, each of them being able to rotate about a lower rotation axis extending perpendicularly to the conveying direction in a conveying plane and being arranged to receive a part of the edge face of the sheet of substrate, a plurality of upper rollers, each of them being arranged to receive one of said main faces of the sheet of substrate and being able to rotate about an upper rotation axis orthogonal to the conveying direction.

A device for conveying a sheet of substrate having two opposed main faces linked b y an edge face, wherein one of the main faces of the sheet of substrate is positioned along a reception plane of the device, the reception plane being close to a vertical plane, including a plurality of lower rollers positioned side by side along a conveying direction, each of them being able to rotate about a lower rotation axis extending perpendicularly to the conveying direction in a conveying plane and being arranged to receive a part of the edge face of the sheet of substrate, a plurality of upper rollers, each of them being arranged to receive one of said main faces of the sheet of substrate and being able to rotate about an upper rotation axis orthogonal to the conveying direction.

A loading jig and an evaporator are provided. The loading jig includes a body and at least one elastic membrane. The body has a plate-like structure and is sandwiched between the bearing platform and the plurality of clamping blocks. Said at least one elastic membrane is respectively disposed between at least one clamping block and a bottom of the body. The elastic membrane is externally connected to a signal converter. The pressure applied by the clamping block may be measured through the elastic membrane when the clamping block is pressed against the bottom of the body, and then the measured pressure signal is transmitted to the signal converter to be converted into a pressure value.

A loading jig and an evaporator are provided. The loading jig includes a body and at least one elastic membrane. The body has a plate-like structure and is sandwiched between the bearing platform and the plurality of clamping blocks. Said at least one elastic membrane is respectively disposed between at least one clamping block and a bottom of the body. The elastic membrane is externally connected to a signal converter. The pressure applied by the clamping block may be measured through the elastic membrane when the clamping block is pressed against the bottom of the body, and then the measured pressure signal is transmitted to the signal converter to be converted into a pressure value.

A film-forming device according to one embodiment includes a chamber body, a support, a moving device, a shielding member, a first holder and a second holder, in the film-forming device, a substrate supported by the support is linearly moved. The shielding member is disposed above an area where the substrate is moved, and includes a slit extending in a direction perpendicular to a movement direction of the substrate. The first holder and the second holder hold a first target and a second target, respectively, above the shielding member. The first target and the second target are arranged symmetrically with respect to a vertical plane including a linear path on which the center of the substrate is moved.

A film-forming device according to one embodiment includes a chamber body, a support, a moving device, a shielding member, a first holder and a second holder, in the film-forming device, a substrate supported by the support is linearly moved. The shielding member is disposed above an area where the substrate is moved, and includes a slit extending in a direction perpendicular to a movement direction of the substrate. The first holder and the second holder hold a first target and a second target, respectively, above the shielding member. The first target and the second target are arranged symmetrically with respect to a vertical plane including a linear path on which the center of the substrate is moved.

A movement system is provided for moving a non-flat substrate across a sputter flux distribution without circumferentially exposing the non-flat substrate to the sputter flux distribution. The movement system is arranged for a first movement of translationally transporting the non-flat substrate along the sputter flux distribution, and a second movement of translating and/or rotating the non-flat substrate with respect to the sputter flux distribution.

The present invention provides a solution for coating substrates which are moved on a carrier that can move from painting, coating or treatment modules in a continuous inline production facility having a system which allows to easily switch between a back and forth limited rotational movement, called rocking mode, for critical processes such as physical vapor deposition (PVD) coating, UV hardening and IR flashing, and a continuous rotational movement of the substrates when the substrates are in a painting or drying process module.

Embodiments of the present disclosure provide a mask structure and a filtered cathodic vacuum arc (FCVA) apparatus. The mask structure is configured to prepare protrusions on a carrying surface of an electrostatic chuck and includes a main mask plate and a side mask plate that are made of a conductive metal. The main mask plate is configured to form a patterned film layer corresponding to the protrusions on the carrying surface of the electrostatic chuck. The side mask is configured to cover a side surface of the electrostatic chuck to avoid forming a film layer on the side surface. The mask structure can be electrically conductive. The mask structure may prevent the side surface of the electrostatic chuck from being coated when the protrusions are prepared on the carrying surface of the electrostatic chuck. Thus, the mask structure may be applied to an FCVA process.