The invention relates to a method and a vacuum-coating system (10) for coating a band-type material (11), in particular made of metal. For this, the band-type material (11) is moved, via a conveying section (12), in a transport direction (T) and is vacuum-coated within a coating chamber (14), in which a vacuum is applied. As seen in the transport direction (T) of the band-type material (11), at least one flatness optimization device (39) is arranged upstream of the coating chamber (14), through which flatness optimization device the band-type material (11) can be guided. In this way, a desired flatness is generated for the band-type material (11).

Disclosed is a method of forming wiring of a substrate includes masking a substrate side portion, on which the wiring will be formed, by attaching a deposition mask to the substrate; and forming the wiring on the substrate side portion based on sputtering after introducing the masked substrate into a chamber.

Disclosed is a method of forming wiring of a substrate includes masking a substrate side portion, on which the wiring will be formed, by attaching a deposition mask to the substrate; and forming the wiring on the substrate side portion based on sputtering after introducing the masked substrate into a chamber.

A magnet unit for a magnetron sputtering apparatus is disposed above the target has: a yoke made of magnetic material and is disposed to lie opposite to the target; and plural pieces of magnets disposed on a lower surface of the yoke, wherein a leakage magnetic field in which a line passing through a position where the vertical component of the magnetic field becomes zero is closed in an endless manner, is caused to locally act on such a lower space of the target as is positioned between the center of the target and a periphery thereof, the magnet unit being driven for rotation about the center of the target. In a predetermined position of the yoke there is formed a recessed groove in a circumferentially elongated manner along an imaginary circle with the center of the target serving as a center.

A magnet unit for a magnetron sputtering apparatus is disposed above the target has: a yoke made of magnetic material and is disposed to lie opposite to the target; and plural pieces of magnets disposed on a lower surface of the yoke, wherein a leakage magnetic field in which a line passing through a position where the vertical component of the magnetic field becomes zero is closed in an endless manner, is caused to locally act on such a lower space of the target as is positioned between the center of the target and a periphery thereof, the magnet unit being driven for rotation about the center of the target. In a predetermined position of the yoke there is formed a recessed groove in a circumferentially elongated manner along an imaginary circle with the center of the target serving as a center.

Embodiments of the disclosure generally relate to a process kit including a shield serving as an anode in a physical deposition chamber. The shield has a cylindrical band, the cylindrical band having a top and a bottom, the cylindrical band sized to encircle a sputtering surface of a sputtering target disposed adjacent the top and a substrate support disposed at the bottom, the cylindrical band having an interior surface. A texture is disposed on the interior surface. The texture has a plurality of features. A film is provided on a portion of the features. The film includes a porosity of about 2% to about 3.5%.

Embodiments of the disclosure generally relate to a process kit including a shield serving as an anode in a physical deposition chamber. The shield has a cylindrical band, the cylindrical band having a top and a bottom, the cylindrical band sized to encircle a sputtering surface of a sputtering target disposed adjacent the top and a substrate support disposed at the bottom, the cylindrical band having an interior surface. A texture is disposed on the interior surface. The texture has a plurality of features. A film is provided on a portion of the features. The film includes a porosity of about 2% to about 3.5%.

A sputtering apparatus includes a plate-shaped regulator that is provided between a target and a substrate, has an opening corresponding to a magnetic circuit, and covers a portion not corresponding to the magnetic circuit. The regulator covers at least a surface area that is greater than or equal to a half of a surface area of the substrate. The opening has a substantially fan-shaped outline. The opening is arranged so as to substantially coincide with the magnetic circuit when viewed in a direction of a rotation axis line of the target, and the rotation axis line of the target and a rotation axis line of the substrate are arranged substantially parallel to each other.

Disclosed are a flexible paper-based surface-enhanced Raman scattering (SERS) substrate and a method of preparing the same, which relate to detection of trace organics. This invention deposits a film of silver nanoparticles on a carrier such as filter paper by oblique-angle deposition to prepare the SERS substrate, which can be used for the detection of trace organics. Silver nanoparticles are closely arranged on the flexible paper, allowing the substrate for good SERS effect due to the interparticle coupling effect. Moreover, compared to the traditional rigid and brittle substrates, the substrate prepared herein can be readily used in the detection of residual organics on complex surfaces in various liquid or solid conditions by dipping, dropwise adding or wiping due to the use of a flexible and absorbent carrier.

A heater comprises a folded heater wire, a first insulator provided on the folded heater wire, a metal sheath in contact with a part of the first insulator, a first insulating member arranged in parallel to a part of a first end of the folded heater wire taken out from a first end of the metal sheath, a second insulating member arranged in parallel to a part of the first insulating member and parallel to a part of a second end of the folded heater wire taken out from the first end of the metal sheath, a third insulating member arranged in parallel to a part of the first insulating member and the second insulating member, and bundle the first insulating member and the second insulating member, and a cylindrical member arranged in parallel to a part of the metal sheath and the third insulating member.