A soft-landing (SL) instrument for depositing ions onto substrates using a laser ablation source is described herein. The instrument of the instant invention is designed with a custom drift tube and a split-ring ion optic for the isolation of selected ions and is capable of operating at atmospheric pressure. The drift tube allows for the separation and thermalization of ions formed after laser ablation through collisions with an inert bath gas that allow the ions to be landed at energies below 1 eV onto substrates. The split-ring ion optic is capable of directing ions toward the detector or a landing substrate for selected components.

A system and method for in-situ characterization of functional devices. The system comprises a vacuum chamber; a pump system coupled to the vacuum chamber for evacuation the vacuum chamber to near ultra high vacuum pressures of about 10.sup.8 mbar or lower; a sample holder for a functional device based on nanostructured materials disposed inside the vacuum chamber and configured to provide electrical connection to the functional device for measuring electrical properties of the functional device; and a source system for exposing a surface/interface of the functional device to a modification species; whereby the system is configured to measure the electrical properties of the functional device in-situ upon the exposure to the modification species.

A system and method for in-situ characterization of functional devices. The system comprises a vacuum chamber; a pump system coupled to the vacuum chamber for evacuation the vacuum chamber to near ultra high vacuum pressures of about 10.sup.8 mbar or lower; a sample holder for a functional device based on nanostructured materials disposed inside the vacuum chamber and configured to provide electrical connection to the functional device for measuring electrical properties of the functional device; and a source system for exposing a surface/interface of the functional device to a modification species; whereby the system is configured to measure the electrical properties of the functional device in-situ upon the exposure to the modification species.

A deposition chamber includes a chamber wall, an optically transparent rod which extends through an aperture in the wall, such that a first end of the rod is exposed inside of the deposition chamber and an opposing second end of the rod is exposed outside of the deposition chamber, a compression collar which is selectively attached to an outer surface of the wall, such that the collar surrounds the second end of the rod, and a gasket disposed around the rod and compressed by the compression collar, such that the gasket secures the rod in the aperture and generates an air-tight seal.

A deposition chamber includes a chamber wall, an optically transparent rod which extends through an aperture in the wall, such that a first end of the rod is exposed inside of the deposition chamber and an opposing second end of the rod is exposed outside of the deposition chamber, a compression collar which is selectively attached to an outer surface of the wall, such that the collar surrounds the second end of the rod, and a gasket disposed around the rod and compressed by the compression collar, such that the gasket secures the rod in the aperture and generates an air-tight seal.

A sputtering system includes a vacuum chamber, a power source having a pole coupled to a backing plate for holding a sputtering target within the vacuum chamber, a pedestal for holding a substrate within the vacuum chamber, and a time of flight camera positioned to scan a surface of a target held to the backing plate. The time of flight camera may be used to obtain information relating to the topography of the target while the target is at sub-atmospheric pressure. The target information may be used to manage operation of the sputtering system. Managing operation of the sputtering system may include setting an adjustable parameter of a deposition process or deciding when to replace a sputtering target. Machine learning may be used to apply the time of flight camera data in managing the sputtering system operation.

Methods and apparatus for detecting a shutter disk assembly in a process chamber using a number of sensors. A first, second, and third sensor in a shutter housing for a shutter disk assembly provide indications of a status of the shutter disk assembly. The indications are used in part to determine the operational status of the shutter disk assembly along with process information from a process controller. The operational status is then used to alter a process of the process chamber when necessary.

Methods and apparatus for detecting a shutter disk assembly in a process chamber using a number of sensors. A first, second, and third sensor in a shutter housing for a shutter disk assembly provide indications of a status of the shutter disk assembly. The indications are used in part to determine the operational status of the shutter disk assembly along with process information from a process controller. The operational status is then used to alter a process of the process chamber when necessary.

A charged-particle beam microscope is provided for imaging a sample. The microscope has a vacuum chamber to maintain a low-pressure environment. A stage is provided to hold a sample in the vacuum chamber. The microscope has a charged-particle beam source to generate a charged-particle beam. The microscope also has charged-particle beam optics to converge the charged-particle beam onto the sample and a detector to detect charged-particle radiation emanating from the sample. The microscope has a controller to analyze the detected charged-particle radiation to generate an image of the sample. A power supply is provided that has a battery to power at least the charged-particle beam optics and the controller.

A charged-particle beam microscope is provided for imaging a sample. The microscope has a vacuum chamber to maintain a low-pressure environment. A stage is provided to hold a sample in the vacuum chamber. The microscope has a charged-particle beam source to generate a charged-particle beam. The microscope also has charged-particle beam optics to converge the charged-particle beam onto the sample and a detector to detect charged-particle radiation emanating from the sample. The microscope has a controller to analyze the detected charged-particle radiation to generate an image of the sample. A power supply is provided that has a battery to power at least the charged-particle beam optics and the controller.