Patent classifications
C23C14/52
ELECTRON BEAM EVAPORATOR, COATING APPARATUS AND COATING METHOD
In accordance with various embodiments, an electron beam evaporator can comprise the following: a tubular target; an electron beam gun for producing at least one vapor source on a removal surface of the tubular target by means of an electron beam; wherein the removal surface is a ring-shaped axial end surface or a surface of the tubular target that extends conically or in a curved fashion from the free end edge.
Deposition apparatus
A deposition apparatus includes a chamber, a first stage and a second stage for supporting substrates within the chamber, an evaporating source assembly moving a first stage area corresponding to the first stage and a second stage area corresponding to the second stage, and including a plurality of nozzles through which a source material is spurted, and a photographing assembly which is disposed between the first stage and the second stage and photographs the plurality of nozzles.
Method of measuring the temperature reached by a part, in particular a turbine engine part
A method of measuring temperature reached by a part, for example a turbine engine part, in operation, the method including: mechanically treating the part; oxidizing the part; and depositing a layer including a temperature indicator for indicating the temperature reached by the part in operation.
Method of measuring the temperature reached by a part, in particular a turbine engine part
A method of measuring temperature reached by a part, for example a turbine engine part, in operation, the method including: mechanically treating the part; oxidizing the part; and depositing a layer including a temperature indicator for indicating the temperature reached by the part in operation.
APPLYING A TRANSPARENT CONDUCTIVE FILM TO FLUORINE-DOPED TIN OXIDE
Examples are disclosed relate to the application of films of transparent conductors over fluorine-doped tin oxide (FTO) to form a multi-layer structure comprising a lower sheet resistance and smoother surface, while exhibiting a higher transparency, than a single thicker FTO with an equivalent thickness. Various compositions of transparent conductor may be deposited using such solutions. Examples include Sn:In.sub.2O.sub.3, Ti:In.sub.2O.sub.3, Cd.sub.2SnO.sub.4, and combinations of two or more such materials. One example provides optical device, comprising a substrate, an FTO film on the substrate, and a film of a transparent conductor on the FTO film.
APPLYING A TRANSPARENT CONDUCTIVE FILM TO FLUORINE-DOPED TIN OXIDE
Examples are disclosed relate to the application of films of transparent conductors over fluorine-doped tin oxide (FTO) to form a multi-layer structure comprising a lower sheet resistance and smoother surface, while exhibiting a higher transparency, than a single thicker FTO with an equivalent thickness. Various compositions of transparent conductor may be deposited using such solutions. Examples include Sn:In.sub.2O.sub.3, Ti:In.sub.2O.sub.3, Cd.sub.2SnO.sub.4, and combinations of two or more such materials. One example provides optical device, comprising a substrate, an FTO film on the substrate, and a film of a transparent conductor on the FTO film.
Method of adjusting the output power of a power supply supplying electrical power to a plasma, plasma apparatus and power supply
A method adjusts an output power of a power supply supplying electrical power to a plasma in a plasma chamber. The method includes: connecting the power supply to at least one electrode in the plasma chamber; transporting one or more substrates relative to the electrode using a substrate carrier; maintaining the plasma by the electrical power; processing the one or more substrates with the plasma; and adjusting the output power based on a parameter related to a distance between a surface of the electrode facing a carrier-substrate-assembly and a surface of the substrate-carrier-assembly facing the electrode.
Method and control device
In various aspects of the disclosure, a method of operating a process group that performs at least a first reactive coating process and a second reactive coating process may comprise: coating of a substrate by means of the first reactive coating process and by means of the second reactive coating process; closed-loop control of the process group by means of a first manipulated variable of the first coating process and a second manipulated variable of the second coating process and using a correction element; wherein the correction element relates the first manipulated variable and the second manipulated variable to one another in such a way that their control values are different from one another.
METHOD, DEVICE, AND SYSTEM FOR MANUFACTURING COMPOSITE METAL FOIL
A method, device, and system for manufacturing a composite metal foil are provided. The device includes: a first-time double-sided coating module and a second-time double-sided coating module arranged at an interval, where the first-time double-sided coating module includes: a first vapor deposition column and a second vapor deposition column arranged oppositely, and an unwinding roller, a first evaporation source, a first set of over rollers, a second evaporation source, and a second set of over rollers arranged sequentially from bottom to top on opposite surfaces of the first vapor deposition column and the second vapor deposition column; and the second-time double-sided coating module includes: a third vapor deposition column, and a first set of cooling rollers, a third evaporation source, a second set of cooling rollers, a fourth evaporation source, and a winding roller arranged sequentially from top to bottom on the third vapor deposition column.
METHOD, DEVICE, AND SYSTEM FOR MANUFACTURING COMPOSITE METAL FOIL
A method, device, and system for manufacturing a composite metal foil are provided. The device includes: a first-time double-sided coating module and a second-time double-sided coating module arranged at an interval, where the first-time double-sided coating module includes: a first vapor deposition column and a second vapor deposition column arranged oppositely, and an unwinding roller, a first evaporation source, a first set of over rollers, a second evaporation source, and a second set of over rollers arranged sequentially from bottom to top on opposite surfaces of the first vapor deposition column and the second vapor deposition column; and the second-time double-sided coating module includes: a third vapor deposition column, and a first set of cooling rollers, a third evaporation source, a second set of cooling rollers, a fourth evaporation source, and a winding roller arranged sequentially from top to bottom on the third vapor deposition column.