Patent classifications
C23C14/584
METHOD FOR PREPARING AMMONIUM THIOMOLYBDATE-POROUS AMORPHOUS CARBON COMPOSITE SUPERLUBRICITY FILM
A method for preparing an ammonium thiomolybdate-porous amorphous carbon composite superlubricity film is disclosed. First, a porous amorphous carbon film is prepared by an anode layer ion source assisted plasma chemical vapor deposition method and a reactive magnetron sputtering method on a substrate. The porous amorphous carbon film is then impregnated in an ammonium thiomolybdate solution, so that the ammonium thiomolybdate is adsorbed on the porous amorphous carbon film, and the impregnated porous amorphous carbon film is air dried. During the friction process, the composited porous amorphous carbon superlubricity film prepared in the present disclosure promotes the in-situ decomposition of ammonium thiomolybdate to generate molybdenum disulfide by utilizing the friction heat at the initial stage of running-in, further to generate a graphene-like structure under the function of a catalyst, thus realizing a macroscopic super lubricity through a heterogeneous incommensurate contact between graphene and molybdenum disulfide.
SELECTIVE DEPOSITION OF METALLIC LAYERS
A method is described for selectively depositing a metallic layer (10) including one or more of copper, silver and gold. The method includes depositing a fluorinated layer (5) over a surface (1, 4). The fluorinated layer (5) has a thickness sufficient to substantially prevent deposition of the copper, silver and/or gold between the fluorinated layer (5) and the surface (1, 4) during a subsequent evaporation step using a given deposition rate. The method also includes forming the metallic layer (10) by evaporating, at the given deposition rate, the copper, silver and/or gold over the surface (1, 4) and the fluorinated layer (5). The copper, silver and/or gold preferentially adhere to the portions of the surface (1, 4) not covered by the fluorinated layer (s).
Functional curtain fabric with anhydrous coating layer and method for manufacturing same
Disclosed is a functional curtain fabric with an anhydrous coating layer. The functional curtain fabric is manufactured by method comprising step S1, preprocessing a fabric substrate; step S2, placing the preprocessed fabric substrate in step S1 into vacuum chamber of magnetron sputtering machine for coating: sputtering a metal onto the fabric substrate by using magnetron sputtering technology, so as to form a nano-metal film on the fabric substrate; and step S3, performing anti-oxidation treatment on the fabric substrate covered with the nano-metal film. The functional curtain fabric with an anhydrous coating layer can serve as an effective heat shield against exterior sunlight while having good light transmission. In addition, the functional curtain fabric with an anhydrous coating layer has good antimicrobial properties due to use of a metal coating of silver and titanium, and also has a degree of water resistance due to the nano-metal layer of silver and titanium.
Discontinuous vacuum-metalized thin film and wire and method for manufacturing same
A method for manufacturing a discontinuous vacuum-metalized thin film includes the following steps: step 1: coating a corona surface of a flexible thin film (1) with a longitudinal discontinuous stripping layer; step 2: coating the corona surface and the stripping layer with a metal layer (3); and step 3: removing the stripping layer and the metal layer (3) on the stripping layer to obtain a discontinuous vacuum-metalized thin film. A method for manufacturing a discontinuous vacuum-metalized wire, a discontinuous vacuum-metalized thin film and a discontinuous vacuum-metalized wire are further disclosed.
Fabrication method for a multi-layer substrate
A method for fabricating a substrate provided with a plurality of layers, includes: providing a steel substrate with an oxide layer including metal oxides on the steel substrate; providing a metal coating layer directly on the oxide layer, the metal coating layer including: at least 8% by weight nickel; at least 10% by weight chromium; and a remainder being iron and impurities from a fabrication process; and providing an anti-corrosion coating layer directly on the metal coating layer.
METHODS AND COMPOSITIONS FOR COOLING YARNS AND FABRICS, AND ARTICLES COMPRISING SAME
In one aspect, the disclosure relates to cooling films comprising a substrate and one or more cooling materials deposited on the substrate. The disclosed cooling films can be used to prepare the disclosed cooling masterbatch materials. The disclosed cooling masterbatch materials can be used to prepare disclosed cooling yarns. The one or more cooling materials deposited on the substrate of a disclosed cooling film, dispersed in a disclosed cooling masterbatch material, or in disclosed cooling yarn are nano-sized particles. In still further aspects, the present disclosure pertains to a fabric comprising a disclosed cooling yarn. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present disclosure.
METHOD OF VACUUM DRYING FILM LAYER AND DISPLAY DEVICE
The present disclosure provides a method of vacuum drying a film layer and a display device, the method includes: placing a substrate on which a film layer material is formed in a vacuum drying environment, wherein the film layer material contains a solvent and a solute for forming the film layer; in a first stage, evaporating and condensing the solvent in the film layer material on an upper cover plate, wherein the film layer material still contains an amount of solvent to form a soft film having fluidity; in a second stage, re-condensing a portion of the solvent condensed on the upper cover plate onto the substrate to increase the fluidity of the soft film on the substrate; and repeating the first stage and the second stage, vacuuming to completely evaporate the solvent and cure the film layer after forming a substantially flat film layer.
Method of vacuum drying film layer and display device
The present disclosure provides a method of vacuum drying a film layer and a display device, the method includes: placing a substrate on which a film layer material is formed in a vacuum drying environment, wherein the film layer material contains a solvent and a solute for forming the film layer; in a first stage, evaporating and condensing the solvent in the film layer material on an upper cover plate, wherein the film layer material still contains an amount of solvent to form a soft film having fluidity; in a second stage, re-condensing a portion of the solvent condensed on the upper cover plate onto the substrate to increase the fluidity of the soft film on the substrate; and repeating the first stage and the second stage, vacuuming to completely evaporate the solvent and cure the film layer after forming a substantially flat film layer.
COMPOSITE TUNGSTEN OXIDE FILM AND METHOD FOR PRODUCING SAME, AND FILM-DEPOSITED BASE MATERIAL AND ARTICLE EACH PROVIDED WITH SAID FILM
A composite tungsten oxide film includes a composition represented by a general formula M.sub.xW.sub.yO.sub.z (wherein, an element M is one or more elements selected from alkaline metal, alkaline earth metal, Fe, In, Tl, and Sn, an element W is tungsten, and an element O is oxygen) as main components, wherein 0.001≤x/y≤1, 2.2≤z/y≤3.0, organic components are not contained substantially, a sheet resistance is 10.sup.5 ohms per square or more, a transmittance in a wavelength of 550 nm is 50% or more, a transmittance in a wavelength of 1400 nm is 30% or less, and also, an absorptance in a wavelength of 1400 nm is 35% or more, and an absorptance in a wavelength of 800 nm with respect to an absorptance in a wavelength of 1400 nm is 80% or less.
PVD titanium dioxide formation using sputter etch to halt onset of crystalinity in thick films
Embodiments described herein provide methods of forming amorphous or nano-crystalline ceramic films. The methods include depositing a ceramic layer on a substrate using a physical vapor deposition (PVD) process, discontinuing the PVD process when the ceramic layer has a predetermined layer thickness, sputter etching the ceramic layer for a predetermined period of time, and repeating the depositing the ceramic layer using the PVD process, the discontinuing the PVD process, and the sputter etching the ceramic layer until a ceramic film with a predetermined film thickness is formed.