C23C14/5873

MOTH-EYE TRANSFER MOLD, METHOD OF MANUFACTURING MOTH-EYE TRANSFER MOLD, AND METHOD OF TRANSFERRING MOTH-EYE STRUCTURE
20200406509 · 2020-12-31 ·

To provide a moth-eye transfer mold and a method of manufacturing a moth-eye transfer mold that provide a simple and inexpensive manufacturing process. A moth-eye transfer mold 1 is characterized by including a base 10, an underlayer 20 formed on the base 10, and a glassy carbon layer 30 formed on the underlayer 20, the glassy carbon layer 30 has an inverted moth-eye structure RM over a surface 30a, and the inverted moth-eye structure RM is randomly arranged cone-shaped pores.

FORMING METHOD OF THIN LAYER
20200408960 · 2020-12-31 ·

A forming method of a thin layer with a pore is provided. The method includes forming a thin layer on a substrate, stacking a first mask and a second mask on the thin layer in this order, and forming a pore in the thin layer by dry etching. The first mask includes at least a self-assembling material. The second mask is more resistant to reactive etching or physical etching than the first mask.

COVERING MEMBER AND METHOD FOR MANUFACTURING THE SAME
20200407837 · 2020-12-31 · ·

A covering member has a hard film on the surface of a base material, wherein the hard film comprises a layer A selected from a nitride, a carbonitride, an oxynitride, and an oxycarbonitride of Cr or CrM; a metal layer which is formed on the outer surface side of the A layer and includes Cr, Ti, or W; and a layer B which is formed on the outer surface side of the metal layer and selected from a nitride, a carbonitride, an oxynitride, and an oxycarbonitride of Cr or CrM, and wherein M is one or two or more from a Group 4 metal, a Group 5 metal, a Group 6 metal of the periodic table, Al, Si, and B, and strain is introduced in the outer surface side of the metal layer.

Techniques, system and apparatus for selective deposition of a layer using angled ions

A method is provided. The method may include providing a substrate, the substrate comprising a substrate surface, the substrate surface having a three-dimensional shape. The method may further include directing a depositing species from a deposition source to the substrate surface, wherein a layer is deposited on a deposition region of the substrate surface. The method may include performing a substrate scan during the directing or after the directing to transport the substrate from a first position to a second position. The method may also include directing angled ions to the substrate surface, in a presence of the layer, wherein the layer is sputter-etched from a first portion of the deposition region, and wherein the layer remains in a second portion of the deposition region.

ENGINEERED PLATELETS FOR ADDITIVE MANUFACTURING

The present disclosure is directed to systems and methods for producing a metal-containing powder useful for additive manufacturing. The metal-containing powder includes a plurality of metal-containing platelets having a defined physical geometry and a defined aspect ratio. The metal platelets may be produced by depositing a metal layer on a substrate that includes one or more recessed or raised surface features. The one or more recessed or raised surface features create a fracture pattern in a metal layer deposited across at least a portion of the one or more surface features. By separating the metal layer from the substrate and fracturing the metal layer along the fracture pattern, a plurality of metal platelets are produced. In some embodiments, a release agent may be disposed between the metal layer and the substrate to facilitate the separation of the metal layer from the substrate.

Counter electrode material for electrochromic devices

Various embodiments herein relate to electrochromic devices, methods of fabricating electrochromic devices, and apparatus for fabricating electrochromic devices. In a number of cases, the electrochromic device may be fabricated to include a particular counter electrode material. The counter electrode material may include a base anodically coloring material. The counter electrode material may further include one or more halogens. The counter electrode material may also include one or more additives.

Transparent omniphobic thin film articles
10844479 · 2020-11-24 · ·

An article having a nanostructured surface and a method of making the same are described. The article can include a substrate and a nanostructured layer bonded to the substrate. The nanostructured layer can include a plurality of spaced apart nanostructured features comprising a contiguous, protrusive material and the nanostructured features can be sufficiently small that the nanostructured layer is optically transparent. A surface of the nanostructured features can be coated with a continuous hydrophobic coating. The method can include providing a substrate; depositing a film on the substrate; decomposing the film to form a decomposed film; and etching the decomposed film to form the nanostructured layer.

METHOD TO PRODUCE HIGH DENSITY DIAMOND LIKE CARBON THIN FILMS
20200354826 · 2020-11-12 ·

A method for forming a diamond-like carbon (DLC) coating on an article is provided, comprising: alternatingly performing a deposition process and an ashing process on the article a determined number of times, wherein during the deposition process the method proceeds by forming on the article a layer of DLC which includes graphitic sp.sup.2 carbon and tetrahedral sp.sup.3 carbon, and during the ashing process the method proceeds by selectively etching the graphitic sp.sup.2 carbon, wherein the determine number of time is configured to result in a designated overall thickness of the DLC coating.

Molybdenum containing targets

The invention is directed at sputter targets including 50 atomic % or more molybdenum, a second metal element of niobium or vanadium, and a third metal element selected from the group consisting of titanium, chromium, niobium, vanadium, and tantalum, wherein the third metal element is different from the second metal element, and deposited films prepared by the sputter targets. In a preferred aspect of the invention, the sputter target includes a phase that is rich in molybdenum, a phase that is rich in the second metal element, and a phase that is rich in the third metal element.

Surface treatment apparatus and surface treatment method
11866819 · 2024-01-09 · ·

The inventive concept provides a method for treating a surface of an object to be treated, in which a part provided and contaminated in an apparatus for treatment of a substrate such as a wafer serves as the object to be treated. In an embodiment, the surface treatment method includes forming a vacuum in an atmosphere in which the object is provided and cleaning the surface of the object by collision of first particles with contaminants on the surface of the object at supersonic speed.