A protective film-forming composition which protects against a semiconductor wet etching solution, contains a solvent and a compound or polymer thereof containing at least one pair including two adjacent hydroxyl groups in a molecule thereof, and forms a protective film which can quickly be removed by dry etching and exhibits excellent resistance against a semiconductor wet etching solution during the lithographic process when producing semiconductors; a method for producing a resist pattern-equipped substrate which uses the protective film; and a method for producing a semiconductor device.

Copper-filled carbon nanotubes and methods of synthesizing the same are provided. Plasma-enhanced chemical vapor deposition can be used to synthesize vertically aligned carbon nanotubes filled with copper nanowires. The copper filling can occur concurrently with the carbon nanotube growth, and the carbon nanotubes can be completely filled by copper. The filling of Cu inside the CNTs can be controlled by tuning the synthesis temperature.

A flexible method to provide a variety of value-added coatings to a piece of jewelry or a group of jewelries is disclosed. Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) technique is implemented to deposit a layer of conformal coating on intended jewelry surfaces, including both exterior and interior surfaces, to enhance a vast majority of process-driven or end of use driven properties. The coating compositions include dielectrics material, metals, organic materials or organic-inorganic hybrid materials. The method steps of forming a layer of coating are straightforward and can be tailed to different purposes.

Provided are chrome-free adhesion pretreatment processes for use on a variety of reinforced or unreinforced plastics and polymers, such as polyimides, polyetherimides and polyvinylchloride. The pretreatment process can be performed in a combination of two sequential operations, which includes treating with a first solution containing nitric acid and subsequently treating with a second solution that includes sulfuric acid and periodate ions. Alternatively, the pretreatment process can be performed by treatment with a single combined composition that includes nitric acid, sulfuric acid, and periodate ions. The pretreatment processes, either done in two separate solutions, sequentially, or in one combined solution, produce an adherent surface for further metallization of the article, with adhesional values of the metal layer higher than those achieved using conventional chromic acid pretreatment processes.

A photocatalytic assembly (100) includes a substrate (110) and a photocatalytic unit (120) laminated on the substrate (110). The photocatalytic unit (120) includes a laminated titanium dioxide layer (122) and a metal layer (124). The titanium dioxide layer (122) has a thickness of 10 nm to 100 nm. The metal layer (124) is formed by stacking metal nanoparticles. The metal nanoparticle is made of at least one selected from the group consisting of rhodium, palladium, platinum, gold, silver, and aluminum.

A substrate cleaning apparatus that cleans a processing target substrate by blasting the gas clusters to the processing target substrate. The apparatus includes: a chamber configured to accommodate the processing target substrate; a rotary stage configured to rotatably support the processing target substrate in the chamber; an blasting unit configured to blast the gas clusters to the processing target substrate supported by the rotary stage; a driving unit configured to scan a gas cluster-blasted position on the processing target substrate; an exhaust port configured to evacuate the chamber; and a control mechanism configured to control a scattering direction of particles by controlling a rotation direction of the processing target substrate by the rotary stage and a scanning direction of the gas cluster-blasted position, thereby suppressing re-adhesion of the particles to the processing target substrate.

A substrate for a display article includes: a primary surface; a textured region on at least a portion of the primary surface, the textured region comprising surface features that reflect a random distribution, each of the surface features comprising a perimeter that is parallel to a base-plane extending through a thickness of the substrate below the textured region, wherein the perimeter is elliptical. The textured region can further include (i) one or more higher surfaces residing at a higher mean elevation from the base-plane and (ii) one or more lower surfaces residing at a lower mean elevation from the base-plane that is closer to the base-plane than the higher mean elevation. The higher mean elevation can differ from the lower mean elevation by a distance within a range of 0.05 μm to 0.70 μm.

The invention discloses equipment and preparation method for open and continuous growth of a carbon nanomaterial. The equipment comprises a metal foil tape feeding system, a CVD system and a collection system. The method includes continuously conveying a metal foil tape pretreated or not into the CVD system via the metal foil tape feeding system, depositing a required carbon nanomaterial on the surface of the metal foil tape by CVD, directly collecting by the collection system or directly post-treating the carbon nanomaterial by a post-treatment system, and even directly producing a end product of the carbon nanomaterial. All the systems in the invention are arranged in the open atmosphere rather than an air-isolated closed space. The invention can realize round-the-clock continuous operation to greatly improve the production efficiency of carbon nanomaterials.

There is provided a technique that includes: (a) supplying an adsorption suppressor to a substrate having a surface on which a first base and a second base are exposed under a first temperature to adsorb the adsorption suppressor on a surface of one base of the first base and the second base; (b) thermally annealing the substrate under a second temperature higher than the first temperature after adsorbing the adsorption suppressor on the surface of the one base; and (c) forming a film on a surface of the other base different from the one base of the first base and the second base by supplying a film-forming gas to the thermally-annealed substrate under a third temperature lower than the second temperature.

Embodiments of the present disclosure generally relate to methods for refurbishing aerospace components by removing corrosion and depositing protective coatings. In one or more embodiments, a method of refurbishing an aerospace component includes exposing the aerospace component containing corrosion to an aqueous cleaning solution. The aerospace component contains a nickel superalloy, an aluminide layer disposed on the nickel superalloy, and an aluminum oxide layer disposed on the aluminide layer. The method includes removing the corrosion from a portion of the aluminum oxide layer with the aqueous cleaning solution to reveal the aluminum oxide layer, then exposing the aluminum oxide layer to a post-rinse, and forming a protective coating on the aluminum oxide layer.