Patent classifications
C23C16/0254
EQUIPMENT FOR MANUFACTURING GRAIN-ORIENTED ELECTROMAGNETIC STEEL SHEET
In the present invention, film forming performed under reduced pressure conditions on the surface of a grain-oriented electromagnetic steel sheet which is passed through the inside of a film forming chamber after finish-annealing. A plurality of stages of inlet-side reduced pressure chambers arranged on the inlet side of the film forming chamber have an internal pressure which becomes closer to the internal pressure of the film forming chamber as the inlet side reduced pressure chambers approach the film forming chamber. A plurality of stages of outlet-side reduced pressure chambers arranged on the outlet side of the film forming chamber save an internal pressure which becomes closer to atmospheric pressure as the outlet-side reduced pressure chambers are distanced from the film forming chamber. The inlet-side reduced pressure chambers and the outlet-side reduced pressure chambers comprise: partition plates which define each reduced pressure chamber and in which are formed a sheet-passing hole having a shape through which the grain-oriented electromagnetic steel sheet can pass; and sealing pads arranged on the upper and lower sides of the sheet-passing hole in the partition plates. Due to this configuration, harm to the grain-oriented electromagnetic steel sheet after finish-annealing is suppressed.
MOISSANITE ORNAMENT AND METHOD FOR COATING DIAMOND FILM ON SURFACE OF MOISSANITE ORNAMENT
A moissanite ornament, wherein the surface of the moissanite is coated with a diamond film. A method for coating a diamond film on a surface of a moissanite, including: Step 1: performing ultrasonic grinding pretreatment on the moissanite ornament in the nano-diamond powder suspension; Step 2: taking the moissanite ornament out from the nano-diamond powder suspension, and washing clean; Step 3: pressing the moissanite ornament into a preset shape-preserving sample platform to maintain; Step 4: placing, the moissanite ornament together with the shape-preserving sample platform into a diamond film deposition furnace to perform a plasma treatment; Step 5: introducing methane to conduct in-situ diamond film deposition. The moissanite coated with the diamond film on the surface provided by the present disclosure can greatly improve the surface hardness while maintaining the optical properties of the moissanite, thereby improving the scratch resistance performance of the moissanite.
ULTRA-FINE NANOCRYSTALLINE DIAMOND PRECISION CUTTING TOOL AND MANUFACTURING METHOD THEREFOR
An ultra-fine nanocrystalline diamond precision cutting tool and a manufacturing method therefor. A diamond cutter is made of a thick self-supporting film of ultra-fine nanocrystalline diamond, the thick film having a thickness of 100-3000 microns, where 1 nanometer diamond grain size 520 nanometers. In the manufacturing method, the growth of ultra-fine nanocrystalline diamond on a silicon substrate is accomplished by means of two steps of direct current hot cathode glow discharge chemical vapor deposition and hot filament chemical vapor deposition, then the silicon substrate is separated from the diamond to obtain a thick self-supporting film of ultra-fine nanocrystalline diamond, the thick self-supporting film of ultra-fine nanocrystalline diamond is laser cut and then welded to a cutter body, and then by means of edging, rough grinding and fine grinding, an ultra-fine nanocrystalline diamond precision cutting tool is obtained.
A CYLINDER PISTON ROD AND METHOD OF FABRICATION THEREOF
A piston for a cylinder, and a method of fabrication thereof, the piston rod comprising a substrate and a coating, the substrate having a surface roughness profile comprising peaks and valleys with a peak-to-valley height in a range between 0.5 and 2 m, and the coating having a hardness in a range between 1000 and 4000 HV and a coefficient of friction in a range between 0.1 and 0.05.
METHOD FOR PRODUCING A CONSOLIDATED FIBER PREFORM
A method for producing a consolidated fiber preform intended for the manufacture of a part made of composite material, includes shaping a fiber texture in a heated metal mold, the texture being pre-impregnated with a transient or fugitive material, or shaping a fiber texture in a metal mold and injecting a transient or fugitive material into the fiber texture held in shape in the metal mold, cooling the mold, removing the set fiber preform from the mold, coating the fiber preform with a slurry containing a powder of ceramic or carbon particles, heat-treating the coated fiber preform so as to form a porous shell around the fiber preform by consolidation of the slurry and so as to remove the transient or fugitive material present in the fiber preform, consolidating the fiber preform by gas-phase chemical infiltration.
Cylinder piston rod and method of fabrication thereof
A piston for a cylinder, and a method of fabrication thereof, the piston rod comprising a substrate and a coating, the substrate having a surface roughness profile comprising peaks and valleys with a peak-to-valley height in a range between 0.5 and 2 m, and the coating having a hardness in a range between 1000 and 4000 HV and a coefficient of friction in a range between 0.1 and 0.05.
Surface having properties that reduce light scattering by water condensation and method for the production thereof
Surface having properties for reducing diffuse light due to water condensation, wherein the antifog means consist in atomic aggregates adhered to and dispersed over the surface, wherein the aggregates are selected among the transition metals and the silicon. It is also related to a method for obtaining a surface having properties for reducing diffuse light due to water condensation a wavelength selected in the range from 100 nm to 50 micrometers, comprising the steps of selecting the wavelength, obtaining a glass or polymer surface that has been subjected to optical polishing and adhering to the surface atomic aggregates which are selected among the transition metals and the silicon with a separation between them being lower than or having an order of the selected wavelength selected. Thus a durable antifogging surface is obtained.
Multi-layer plasma erosion protection for chamber components
A method of applying a multi-layer plasma resistant coating on an article comprises performing plating or ALD to form a conformal first plasma resistant layer on an article, wherein the conformal first plasma resistant layer is formed on a surface of the article and on walls of high aspect ratio features in the article. The conformal first plasma resistant coating has a porosity of approximately 0% and a thickness of approximately 200 nm to approximately 1 micron. One of electron beam ion assisted deposition (EB-IAD), plasma enhanced chemical vapor deposition (PECVD), aerosol deposition or plasma spraying is then performed to form a second plasma resistant layer that covers the conformal first plasma resistant layer at a region of the surface but not at the walls of the high aspect ratio features.
PHOTOCATALYTIC STRUCTURE AND METHOD FOR MAKING THE SAME
The disclosure relates to a photocatalytic structure. The photocatalytic structure includes a substrate, a photocatalytic active layer, and a metal layer. The substrate, the photocatalytic active layer, and the metal layer are arranged in succession. The substrate includes a base and a patterned bulge layer on a surface of the base. The patterned bulge layer is a net-like structure comprising a plurality of strip-shaped bulges intersected with each other and a plurality of indents defined by the plurality of strip-shaped bulges. The plurality of strip-shaped bulges is an integrated structure. The photocatalytic active layer is on the surface of the patterned bulge layer. The metal layer includes a plurality of nanoparticles located on the surface of the photocatalytic active layer away from the substrate.
Semiconductor substrate
A semiconductor substrate according to the present invention includes a nitride semiconductor layer 203, an amorphous semiconductor layer 205 formed on one main surface side of the nitride semiconductor layer 203, a high-roughness layer 206 which is a semiconductor layer formed on the amorphous semiconductor layer 205 and has a surface roughness larger than the amorphous semiconductor layer 205, and a diamond layer 207 formed on the high-roughness layer 206. Damage to the nitride semiconductor layer can be reduced in forming the diamond layer on the nitride semiconductor layer and adhesion between the layers can be increased.