Embodiments of the present disclosure generally relate to processing a workpiece containing a substrate during deposition, etching, and/or curing processes with a mask to have localized deposition on the workpiece. A mask is placed on a first layer of a workpiece, which protects a plurality of trenches from deposition of a second layer. In some embodiments, the mask is placed before deposition of the second layer. In other embodiments, the second layer is cured before the mask is deposited. In other embodiments, the second layer is etched after the mask is deposited. Methods disclosed herein allow the deposition of a second layer in some of the trenches present in the workpiece, while at least partially preventing deposition of the second layer in other trenches present in the workpiece.

A display apparatus includes a substrate including first and display areas, wherein the first display area includes first and second pixel areas and a transmission area; a first pixel disposed in the first pixel area and including a first pixel electrode, a first counter electrode, and a first intermediate layer between the first electrode and the first counter electrode; and a second pixel disposed in the second pixel area and including a second pixel electrode, a second counter electrode, and a second intermediate layer between the second pixel electrode and the second counter electrode. The first and second counter electrodes are disposed in the first and second pixel areas, and the first and the second counter electrodes include a first contact area where the first and the second pixel areas are adjacent to each other. A method of manufacturing the display apparatus is provided.

Some embodiments relate to articles having removable coatings. The articles may comprise a substrate and a coating on the substrate. An etch stop layer may be provided between the substrate and the coating to permit removal of the coating without damaging the substrate. Some embodiments relate to methods for removing a coating from an article. The methods may comprise obtaining an article comprising an etch stop layer between a substrate and a coating on the substrate, and removing at least a portion of the coating from the article. Other embodiments further provide articles and related methods.

Embodiments of the present disclosure generally relate to methods for enhancing photoresist (PR) to have improved profile control. A method for treating a PR includes positioning a workpiece within a process region of a processing chamber, where the workpiece contains a patterned PR disposed on an underlayer, and treating the patterned PR by exposing the workpiece to a sequential infiltration synthesis (SIS) process to produce a treated patterned PR which is denser and harder than the patterned PR. The SIS process includes one or more infiltration cycles of exposing the patterned PR to a precursor containing silicon or boron, infiltrating the patterned PR with the precursor, purging to remove remnants of the precursor, exposing the patterned PR to an oxidizing agent, infiltrating the patterned PR with the oxidizing agent to produce oxide coating disposed on inner surfaces of the patterned PR, and purging to remove remnants of the oxidizing agent.

A deposition mask including a resin film including first holes, a non-resin layer disposed on the resin film and including second holes corresponding to the first holes, and a protective layer disposed on the non-resin layer and including third holes corresponding to the first holes, wherein the protective layer includes a first portion disposed on a top surface of the non-resin layer, and a second portion covering a side surface of the second holes of the non-resin layer.

A corrugated shadow mask for patterned vapor deposition includes a corrugated membrane under tensile stress with a plurality of through-apertures forming an aperture array through which a vaporized deposition material can pass. The through-apertures are at the apexes of the corrugation and project from the membrane surface surrounding the through-apertures. The shadow mask is particularly suited for forming pixel arrays for OLED displays without color mixing from adjacent pixels.

A shadow mask for a substrate is disclosed. The shadow mask includes a frame circumscribing a surface of the substrate. The shadow mask further includes one or more island mask features within the surface of the substrate, configured to block a deposition of a material onto at least a portion of the surface of the substrate. The shadow mask further includes one or more crossbeams coupling one or more island mask features to the frame at an elevation relative to the substrate. The one or more cross beams are configured to permit deposition of a material onto the substrate surface underneath the one or more crossbeams. In some instances, the shadow mask is manufactured through an additive manufacturing process.

Fabricating a nanopore sensor includes depositing a first and second oxide layers on first and second sides of a sapphire substrate. The second oxide layer is patterned to form an etch mask having a mask opening in the second oxide layer. A crystalline orientation dependent wet anisotropic etch is performed on the second side of the sapphire substrate using the etch mask to form a cavity having sloped side walls through the sapphire substrate to yield an exposed portion of the first oxide layer, each of the sloped side walls being a crystalline facet aligned with a respective crystalline plane of the sapphire substrate. A silicon nitride layer is deposited on the first oxide layer. The exposed portion of the first oxide layer in the cavity is removed, thereby defining a silicon nitride membrane in the cavity. An opening is formed through the silicon nitride membrane.

Embodiments of the present disclosure relate to forming multi-depth films for the fabrication of optical devices. One embodiment includes disposing a base layer of a device material on a surface of a substrate. One or more mandrels of the device material are disposed on the base layer. The disposing the one or more mandrels includes positioning a mask over of the base layer. The device material is deposited with the mask positioned over the base layer to form an optical device having the base layer with a base layer depth and the one or more mandrels having a first mandrel depth and a second mandrel depth.

An apparatus for manufacturing a display apparatus includes a mask assembly; and a first magnet and a second magnet facing the mask assembly, the mask assembly includes a mask frame including an opening; and a mask sheet disposed on the mask frame, the mask sheet includes a first body portion including first openings; and a second body portion connected to the first body portion and including second openings, and the second body portion overlaps at least a portion of the first magnet and the second magnet.