C23C16/4417

SURFACE COATED POROUS SUBSTRATES AND PARTICLES AND SYSTEMS AND METHODS THEREOF

In an aspect, a functional, a conformal surface layer coating on an internal surface of pores of a porous substrate may be formed via exposure to gas streams of precursor molecules in an atomic-layer deposition (ALD) reactor. In another aspect, a functional surface layer coating on particles of a powder (or particle powder) may be formed via exposure to gas streams of precursor molecules in an ALD reactor. In another aspect, an ALD reactor system may be configured with mechanisms for supplying gas streams of precursor molecules to form the conformal surface layer(s). In another aspect, the porous electrode(s) and/or particle(s) with the conformal surface coating(s) may be made part of a Li-ion battery cell, which in turn be made part of a Li-ion battery module or Li-ion battery pack.

Reactor for coating particles in stationary chamber with rotating paddles

A reactor for coating particles includes a stationary vacuum chamber to hold a bed of particles to be coated, a vacuum port in an upper portion of the chamber, a chemical delivery system configured to inject a reactant or precursor gas into a lower portion of the chamber, a paddle assembly, and a motor to rotate a drive shaft of the paddle assembly. The lower portion of the chamber forms a half-cylinder. The paddle assembly includes a rotatable drive shaft extending through the chamber along the axial axis of the half cylinder, and a plurality of paddles extending radially from the drive shaft such that rotation of the drive shaft by the motor orbits the plurality of paddles about the drive shaft.

Metal oxide encapsulated drug compositions and methods of preparing the same

A method of preparing a pharmaceutical composition having a drug-containing core enclosed by one or more metal oxide materials is provided. The method includes the sequential steps of (a) loading the particles comprising the drug into a reactor, (b) applying a vaporous or gaseous metal precursor to the particles in the reactor, (c) performing one or more pump-purge cycles of the reactor using inert gas, (d) applying a vaporous or gaseous oxidant to the particles in the reactor, and (e) performing one or more pump-purge cycles of the reactor using inert gas. The temperature of the particles does not exceed 35° C. This produces a pharmaceutical composition comprising a drug containing core enclosed by one or more metal oxide materials.

Gas Separation Control in Spatial Atomic Layer Deposition

Apparatus and methods for spatial atomic layer deposition including at least one first exhaust system and at least one second exhaust system. Each exhaust system including a throttle valve and a pressure gauge to control the pressure in the processing region associated with the individual exhaust system.

METHODS OF PASSIVATION TO CONTROL OXYGEN CONTENT AND REACTIVITY OF SILICON-CARBON COMPOSITE MATERIALS

Passivated silicon-carbon composite materials and related processes are disclosed that overcome the challenges for providing amorphous nano-sized silicon entrained within porous carbon. Compared to other, inferior materials and processes described in the prior art, the materials and processes disclosed herein find superior utility in various applications, including energy storage devices such as lithium ion batteries.

VIBRO-THERMALLY ASSISTED CHEMICAL VAPOR INFILTRATION

Reactor designs and process steps are provided for accomplishing vibro-thermally assisted chemical vapor infiltration (VTA-CVI). The provided reactors and processes overcome the challenges for manufacturing composite materials from porous scaffolds. Such reactors and processes find utility in various applications, including production of battery materials, including silicon-carbon composites suitable as anode materials for lithium ion batteries.

Detachable atomic layer deposition apparatus for powders
11767591 · 2023-09-26 · ·

A detachable atomic layer deposition apparatus for powders is disclosed, which includes a vacuum chamber, a shaft sealing device, and a driving unit. The driving unit is connected to the shaft sealing device. The vacuum chamber is fixed to one end of the shaft sealing device via at least one fixing member. The driving unit drives the vacuum chamber to rotate via the shaft sealing device to agitate the powders in a reaction space of the vacuum chamber to facilitate the formation of thin films with uniform thickness on the surface of the powders. In addition, the vacuum chamber can be removed from the shaft sealing device for users to take out the powders from the vacuum chamber and clean the vacuum chamber, thereby improving the convenience in usage.

DEPOSITION OF CERAMIC LAYERS USING LIQUID ORGANOMETALLIC PRECURSORS
20230295796 · 2023-09-21 ·

A metal or ceramic layer may be deposited on nuclear materials by chemical vapor deposition using a non-halogenated liquid organometallic metal precursor. The chemical vapor deposition is carried out by a method including steps of introducing nuclear fuel particles into a fluidized bed reactor, and heating the fluidized bed reactor to a desired operating temperature T.sub.1. A flow of a carrier- gas is initiated through a vaporizer, and the non-halogenated liquid organometallic metal precursor is injected into the vaporizer and vaporized. A first mixture of the carrier gas and the vaporized non-halogenated liquid organometallic metal precursor may be mixed with a gaseous carbon source, a gaseous nitrogen source, a gaseous oxygen source, or a mixture thereof to produce a second mixture; and the second mixture flows into the fluidized bed reactor at operating temperature T.sub.1, allowing deposition of a desired ceramic coating on the particles. The non-halogenated liquid organometallic metal precursor may be a compound of Zr, Hf, Nb, Ta, W, V, Ti, or a mixture thereof.

Gas separation control in spatial atomic layer deposition

Apparatus and methods for spatial atomic layer deposition including at least one first exhaust system and at least one second exhaust system. Each exhaust system including a throttle valve and a pressure gauge to control the pressure in the processing region associated with the individual exhaust system.

Rotary reactor for uniform particle coating with thin films

A reactor for coating particles includes one or more motors, a rotary vacuum chamber configured to hold particles to be coated, wherein the rotary vacuum chamber is coupled to the motors, a controller configured to cause the motors to rotate the rotary vacuum chamber about an axial axis of the rotary vacuum chamber such that the particles undergo tumbling agitation, a vacuum port to exhaust gas from the rotary vacuum chamber, a paddle assembly including a rotatable drive shaft extending through the rotary vacuum chamber and coupled to the motors and at least one paddle extending radially from the drive shaft, such that rotation of the drive shaft by the motors orbits the paddle about the drive shaft in a second direction, and a chemical delivery system including a gas outlet on the paddle configured inject process gas into the particles.