A method of producing a silicate fluorescent material, the method includes: providing a raw material mixture that contains an M source containing M, an Mg source, an Eu source, and an Si source, and optionally an Mn source, obtaining at least one core particle comprising a silicate fluorescent composition having a formula: (M.sub.1-cEu.sub.c).sub.3a(Mg.sub.1-dMn.sub.d).sub.bSi.sub.2O.sub.8, in which M is at least one element selected from the group consisting of Ca, Sr, and Ba, and a, b, c, and d are numbers respectively satisfying 0.93≤a≤1.07, 0.90≤b≤1.10, 0.016≤c≤0.090, and 0≤d≤0.22; using a chemical vapor deposition method, depositing aluminum oxide on surfaces of the at least one core particle; and heat treating at a temperature in a range of 210° C. to 490° C. in an oxygen-containing atmosphere.

A method for forming a Group IV transition metal containing film comprises a) exposing a substrate to a vapor of a Group IV transition metal containing film forming composition; b) exposing the substrate to a co-reactant; and c) repeating the steps of a) and b) until a desired thickness of the Group IV transition metal containing film is deposited on the substrate using a vapor deposition process,

A supported catalyst comprises: a support that is particulate; and a composite layer laminate formed outside the support and including two or more composite layers, wherein each of the composite layers includes a catalyst portion containing a catalyst and a metal compound portion containing a metal compound, the support contains 10 mass % or more of each of Al and Si, and a volume-average particle diameter of the support is 50 μm or more and 400 μm or less.

The present invention provides a method of manufacturing a graphene nanosphere through a single process that is simplified in order to enable mass production. The method includes step 1 of manufacturing a silicon carbide nanosphere coated with graphene through chemical vapor deposition (CVD) using a gas containing a silicon source and a carbon source and step 2 of discontinuing the chemical vapor deposition (CVD) and then performing cooling.

A reactor for coating particles includes a vacuum chamber configured to hold particles to be coated, a vacuum port to exhaust gas from the vacuum chamber via the outlet of the vacuum chamber, a chemical delivery system configured to flow a process gas into the particles via a gas inlet on the vacuum chamber, one or more vibrational actuators located on a first mounting surface of the vacuum chamber, and a controller configured to cause the one or more vibrational actuators to generate a vibrational motion in the vacuum chamber sufficient to induce a vibrational motion in the particles held within the vacuum chamber.

The present invention relates to utilizing atomic layer deposition (ALD) techniques to deposit a layer of boron compound in a light-weight composite carbon-based foam derived from natural precursors, graphene, or other carbon-based materials, to minimize the effects of radiation in space applications. A method of manufacturing radiation shielding material includes: preparing a carbon-based foam product in a predetermined volume; and doping the carbon-based foam product by depositing a boron or boron-10 aluminum oxide (B/B.sup.10—Al—O) compound using ALD in a vacuum chamber on either carbon-based foam or spherical silica particles prior to generating a carbon-based foam; wherein doping the carbon-based foam product includes depositing the boron.sup.10-Al—O compound at a thickness of between one and two atomic percent of boron-10 within the carbon-based foam or on the silica particles; or coating a percentage of average foam pores (50% of average foam pore diameter) of the carbon-based foam product with the boron.sup.10-Al—O compound.

A method for forming a coating film on a powder includes: a dispersion step of setting a container having contained the powder P in a main body of a dispersion device, and dispersing the powder in the container by the main body of the dispersion device; and an ALD step for forming the coating film on a surface of the powder, by setting the container having been removed from the main body of the dispersion device in a main body of an ALD apparatus in such a state that gas can be introduced and be exhausted, introducing a gas for performing an ALD cycle into the container, filling the container with the gas, and then exhausting the gas.

A powder atomic layer deposition apparatus with special cover lid is disclosed, which includes a vacuum chamber, a shaft sealing device, and a driving unit that drives the vacuum chamber to rotate through the shaft sealing device. The vacuum chamber includes a chamber and a cover lid having an inner surface. At least one fan unit and a monitor wafer are arranged on the inner surface of the cover lid, wherein the monitor wafer is located between the fan unit and the cover lid, and there is a gap between the monitor wafer and the fan unit. An air intake line directs a gas toward the fan unit, and the fan unit drives the gas to flow throughout a reaction space, so that powders in the reaction space are blown around for thin films of uniform thickness to form on the surface of the powders and the monitor wafer.

Batteries, methods for recycling batteries, and methods of forming one or more electrodes for batteries are disclosed. The battery includes at least one of (i) a cathode including a nickel-rich material and a first sub-nanoscale metal oxide coating on the nickel-rich material; and (ii) an anode including an anode material and a second sub-nanoscale metal oxide coating disposed on the anode material.

An atomic layer deposition apparatus for coating particles is disclosed. The atomic layer deposition apparatus includes a vacuum chamber, a shaft sealing device, and a driving unit. The driving unit is connected to and drives the vacuum chamber to rotate through the shaft sealing device. The vacuum chamber includes a reaction space for accommodating a plurality of particles, wherein the reaction space has a polygonal columnar shape or a wavy circular columnar shape. An air extraction line and an air intake line are fluidly connected to the vacuum chamber, and the air intake line is used to transport a precursor gas and a non-reactive gas to the reaction space. Through the special shape of the reaction space together with the non-reactive gas, the particles in the reaction space can be effectively stirred to form a thin film with a uniform thickness on the surface of each particle.