An apparatus and method for processing particulate matter by exposing the particulate matter to successive surface reactions of at least a first and a second gaseous precursor according to the principles of atomic layer deposition. The apparatus includes a vacuum chamber, a reaction chamber for particulate matter, wherein the reaction chamber is provided inside the vacuum chamber, a vibration mechanism for vibrating particulate matter inside the reaction chamber; and a precursor system arranged to supply the at least first and second gaseous precursors through the reaction chamber for subjecting the particulate matter to the at least first and second gaseous precursors. The method includes the steps of supplying the at least first and second gaseous precursors through the reaction chamber for subjecting the particulate matter to the at least first and second gaseous precursors, and vibrating particulate matter inside the reaction chamber.

The present invention provides various passive electronic components comprising a layer of coated particles, and methods for producing and using the same. Some of the passive electronic components of the invention include, but are not limited to conductors, resistors, current collectors, capacitors, piezoelectronic devices, inductors and transformers. The present invention also provides energy storage devices and electrode layers for such energy storage devices having passive, electrically-conductive particles coated with one or more thin film materials.

The present invention provides various passive electronic components comprising a layer of coated particles, and methods for producing and using the same. Some of the passive electronic components of the invention include, but are not limited to conductors, resistors, current collectors, capacitors, piezoelectronic devices, inductors and transformers. The present invention also provides energy storage devices and electrode layers for such energy storage devices having passive, electrically-conductive particles coated with one or more thin film materials.

A particulate for an additive manufacturing technique includes a particulate body formed from a particulate material and a coating disposed over particulate body. The coating includes a carbonaceous material that has a reflectivity that is lower than a reflectivity of the particulate material to reduce an energy input requirement of the particulate such that less energy is necessary to fuse the particulate into a layer of an article fabricated using the additive manufacturing technique. A method of making particulate is also disclosed.

A particulate for an additive manufacturing technique includes a particulate body formed from a particulate material and a coating disposed over particulate body. The coating includes a carbonaceous material that has a reflectivity that is lower than a reflectivity of the particulate material to reduce an energy input requirement of the particulate such that less energy is necessary to fuse the particulate into a layer of an article fabricated using the additive manufacturing technique. A method of making particulate is also disclosed.

A reactor for coating particles includes a vacuum chamber configured to hold particles to be coated, a vacuum port to exhaust gas from the vacuum chamber via the outlet of the vacuum chamber, a chemical delivery system configured to flow a process gas into the particles via a gas inlet on the vacuum chamber, one or more vibrational actuators located on a first mounting surface of the vacuum chamber, and a controller configured to cause the one or more vibrational actuators to generate a vibrational motion in the vacuum chamber sufficient to induce a vibrational motion in the particles held within the vacuum chamber.

A granular fluidized bed reactor (FBR) for production of high purity silicon is described. The FBR uses a draft tube to promote internal circulation while minimizing voids in the fluidized bed, one significant cause of dust formation. The FBR design has geometries to minimize reactive gas concentration within the draft tube and imposes a desirable circulation pattern in operation. A portion of the FBR wall above a reactive zone provides heat input to maximize deposition on silicon beads while minimizing wall deposition. The FBR is made of carbon composite, ceramic, and graphite materials in a design to minimize contamination and enable silicon deposits to be melted out.

A granular fluidized bed reactor (FBR) for production of high purity silicon is described. The FBR uses a draft tube to promote internal circulation while minimizing voids in the fluidized bed, one significant cause of dust formation. The FBR design has geometries to minimize reactive gas concentration within the draft tube and imposes a desirable circulation pattern in operation. A portion of the FBR wall above a reactive zone provides heat input to maximize deposition on silicon beads while minimizing wall deposition. The FBR is made of carbon composite, ceramic, and graphite materials in a design to minimize contamination and enable silicon deposits to be melted out.

The present invention relates to a gas distribution unit for a fluidized bed reactor system, a fluidized bed reactor system having the gas distribution unit, and a method for preparing granular polysilicon using the fluidized bed reactor system. The gas distribution unit for a fluidized bed reactor system according to the present invention enables gas flow rate control and gas composition control for each zone within the plenum chamber. In addition, a fluidized bed reactor system having the gas distribution unit enables shape control of a fluidized bed (in particular, transition between a bubbling fluidized bed and a spout fluidized bed). The method for preparing granular polysilicon using the fluidized bed reactor system not only simultaneously improves process stability and productivity, but also enables more flexible handling in the event of an abnormal situation.

The present invention relates to a gas distribution unit for a fluidized bed reactor system, a fluidized bed reactor system having the gas distribution unit, and a method for preparing granular polysilicon using the fluidized bed reactor system. The gas distribution unit for a fluidized bed reactor system according to the present invention enables gas flow rate control and gas composition control for each zone within the plenum chamber. In addition, a fluidized bed reactor system having the gas distribution unit enables shape control of a fluidized bed (in particular, transition between a bubbling fluidized bed and a spout fluidized bed). The method for preparing granular polysilicon using the fluidized bed reactor system not only simultaneously improves process stability and productivity, but also enables more flexible handling in the event of an abnormal situation.