Various examples related to fabrication of thermally stable ultra-high density particle-in-cavity (PIC) nanostructures. In one example, a method includes disposing an anodized aluminum oxide (AAO) template onto a surface of a substrate; removing, from the AAO template, a support layer disposed on a side of the AAO template opposite the surface of the substrate; etching nanocavities into the surface of the substrate using the AAO template as an etch mask; and removing the AAO template from the surface of the substrate. The method can include fabricating the AAO template on an aluminum substrate by anodization of an aluminum film and removing the AAO template from the aluminum substrate after formation of the support layer on the AAO template.

Methods and systems include supplying pulsed microwave radiation through a waveguide, where the microwave radiation propagates in a direction along the waveguide. A pressure within the waveguide is at least 0.1 atmosphere. A supply gas is provided at a first location along a length of the waveguide, a majority of the supply gas flowing in the direction of the microwave radiation propagation. A plasma is generated in the supply gas, and a process gas is added into the waveguide at a second location downstream from the first location. A majority of the process gas flows in the direction of the microwave propagation at a rate greater than 5 slm. An average energy of the plasma is controlled to convert the process gas into separated components, by controlling at least one of a pulsing frequency of the pulsed microwave radiation, and a duty cycle of the pulsed microwave radiation.

Methods and systems include supplying pulsed microwave radiation through a waveguide, where the microwave radiation propagates in a direction along the waveguide. A pressure within the waveguide is at least 0.1 atmosphere. A supply gas is provided at a first location along a length of the waveguide, a majority of the supply gas flowing in the direction of the microwave radiation propagation. A plasma is generated in the supply gas, and a process gas is added into the waveguide at a second location downstream from the first location. A majority of the process gas flows in the direction of the microwave propagation at a rate greater than 5 slm. An average energy of the plasma is controlled to convert the process gas into separated components, by controlling at least one of a pulsing frequency of the pulsed microwave radiation, and a duty cycle of the pulsed microwave radiation.

Various examples related to fabrication of thermally stable ultra-high density particle-in-cavity (PIC) nanostructures. In one example, a method includes disposing an anodized aluminum oxide (AAO) template onto a surface of a substrate; removing, from the AAO template, a support layer disposed on a side of the AAO template opposite the surface of the substrate; etching nanocavities into the surface of the substrate using the AAO template as an etch mask; and removing the AAO template from the surface of the substrate. The method can include fabricating the AAO template on an aluminum substrate by anodization of an aluminum film and removing the AAO template from the aluminum substrate after formation of the support layer on the AAO template.

A torch for fabricating optical fiber preforms may include a body having a surface and two or more slit-shaped orifices oriented parallel or substantially parallel to each other along the surface. The torch body may further include two or more conduits connected to corresponding orifices. The torch may be used by orienting it relative to a preform substrate, and simultaneously emitting two or more gases from corresponding orifices toward the surface of the preform substrate, such that the gases are involved in a reaction to form a soot.

A torch for fabricating optical fiber preforms may include a body having a surface and two or more slit-shaped orifices oriented parallel or substantially parallel to each other along the surface. The torch body may further include two or more conduits connected to corresponding orifices. The torch may be used by orienting it relative to a preform substrate, and simultaneously emitting two or more gases from corresponding orifices toward the surface of the preform substrate, such that the gases are involved in a reaction to form a soot.

In an apparatus for producing thin layers on substrates for solar cell production, wherein the thin layers are applied by an APCVD process at temperatures of more than 250 C., the substrates are conveyed on a horizontal conveyor path and coated by means of an APCVD coating in continuous operation. The conveyor path has conveyor rollers, which consist of a temperature-resistant, non-metallic material, preferably of ceramic. A heating device and/or a purge gas feeding device is/are arranged on that side of the conveyor path which is remote from the coating apparatus.

In an apparatus for producing thin layers on substrates for solar cell production, wherein the thin layers are applied by an APCVD process at temperatures of more than 250 C., the substrates are conveyed on a horizontal conveyor path and coated by means of an APCVD coating in continuous operation. The conveyor path has conveyor rollers, which consist of a temperature-resistant, non-metallic material, preferably of ceramic. A heating device and/or a purge gas feeding device is/are arranged on that side of the conveyor path which is remote from the coating apparatus.

Provided is a light extraction substrate capable of achieving both light extraction efficiency and preservability. Before forming a cap layer, a step of reducing in-membrane water content such that the in-membrane water content of a layer formed between a gas barrier layer and the cap layer is less than 1.0?10.sup.15/mg is performed. The in-membrane water content of less than 1.0?10.sup.15/mg is maintained until at least a step of forming the cap layer after the step of reducing the in-membrane water content, and the cap layer is then formed through a dry process.

Provided is a light extraction substrate capable of achieving both light extraction efficiency and preservability. Before forming a cap layer, a step of reducing in-membrane water content such that the in-membrane water content of a layer formed between a gas barrier layer and the cap layer is less than 1.0?10.sup.15/mg is performed. The in-membrane water content of less than 1.0?10.sup.15/mg is maintained until at least a step of forming the cap layer after the step of reducing the in-membrane water content, and the cap layer is then formed through a dry process.