Patent classifications
C23C16/48
Quantum printing nanostructures within carbon nanopores
The invention includes apparatus and methods for instantiating and quantum printing materials, such as elemental metals, in a nanoporous carbon powder.
Methods for depositing anti-coking protective coatings on aerospace components
Embodiments of the present disclosure generally relate to protective coatings on an aerospace component and methods for depositing the protective coatings. The protective coating can be anti-coking coatings to reduce or suppress coke formation when the aerospace component is heated in the presence of a fuel. In one or more embodiments, a method for depositing the protective coating on an aerospace component includes exposing the aerospace component to a cleaning process to produce a cleaned surface on the aerospace component and sequentially exposing the aerospace component to a precursor and a reactant to form a protective coating on the cleaned surface of the aerospace component by an atomic layer deposition (ALD) process. The aerospace component can be one or more of a fuel nozzle, a combustor liner, a combustor shield, a heat exchanger, a fuel line, a fuel valve, or any combination thereof.
Method and apparatus for forming a patterned layer of carbon, method of forming a patterned layer of material
Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.
QUANTUM PRINTING NANOSTRUCTURES WITHIN CARBON NANOPORES
The invention includes apparatus and methods for instantiating and quantum printing materials, such as elemental metals, in a nanoporous carbon powder.
APPARATUS AND METHOD FOR FORMING THIN FILM
Provided are an apparatus and method for forming a thin film. The apparatus for forming a thin film include a chamber configured to define a substrate processing space therein, a substrate support part connected to the chamber to support a substrate inside the chamber, a heat source part connected to the chamber to face the substrate support part, and a plasma generation part connected to the chamber to supply radicals between the substrate support part and the heat source part at at least two points.
Depositive shielding for fiducial protection from redeposition
Redeposition of substrate material on a fiducial resulting from charged particle beam (CPB) or laser beam milling of a substrate can be reduced with a shield formed on the substrate surface. The shield typically has a suitable height that can be selected based on proximity of an area to be milled to the fiducial. The shield can be formed with the milling beam using beam-assisted chemical vapor deposition (CVD). The same or different beams can be used for milling and beam-assisted CVD.
LASER-ENHANCED CHEMICAL VAPOR DEPOSITION
A laser-enhanced chemical vapor deposition transport system includes a resistive heated crucible and, projecting from the crucible at a first end, a plurality of spokes. The spokes are configured to deliver, substantially simultaneously, vaporized and/or sublimated media powder from the crucible to a plurality of deposition sites, deliver precursor gasses to the deposition sites and propagate beams emitted from one or more laser sources to the deposition sites.
Apparatus and Methods for Roll-to-Roll (R2R) Plasma Enhanced/Activated Atomic Layer Deposition (PEALD/PAALD)
Techniques are disclosed for roll-to-roll (R2R) atomic layer deposition (ALD). R2R ALD is accomplished by arranging precursor nozzles in A/B pairs while a flexible web substrate moves underneath the A/B pairs at a uniform speed. Nozzles A of the A/B pairs continuously flow a precursor A into the process volume of the R2R ALD chamber. The plasma enhanced/activated ALD (PEALD/PAALD) embodiments utilize electron cyclotron rotation (ECR)-enhanced hollow cathode plasma sources (HCPS) where nozzles B flow activated neutrals of precursor B into the process volume. As the flexible web moves in an R2R motion, nucleates from precursor A deposited on the surface of the substrate, and neutrals of precursor B undergo a self-limiting reaction to deposit a single atomically sized ALD film/layer. In this manner, multiple ALD layers may be deposited by each successive A/B pair in a single pass of the web. There is also a heat source underneath the web to further facilitate the ALD reaction, or to support thermal ALD embodiments.
Quantum printing methods
The invention includes apparatus and methods for instantiating and quantum printing materials, such as elemental metals, in a nanoporous carbon powder.
QUANTUM PRINTING NANOSTRUCTURES WITHIN CARBON NANOPORES
The invention includes apparatus and methods for instantiating and quantum printing materials, such as elemental metals, in a nanoporous carbon powder.