A sol-gel method for forming durable, scratch-resistant coatings on glass substrates. Zirconia coatings, for example, are formed from a solution of zirconium oxychloride octahydrate in an organic, polar, aprotic solvent such as dimethylformamide. Annealed coatings, which optionally include an additive such as graphene, have a low coefficient of friction and can exhibit high hardness and hydrophobicity.

A conductive structure is provided. The conductive ink composition includes a silver complex formed by mixing a silver carboxylate, at least one dissolving agent that dissolves the silver carboxylate, and a catalyst. The catalyst includes an amine that decarboxylates the silver carboxylate to make the conductive ink composition. The catalyst decarboxylates the silver carboxylate at a temperature of 100 C. or less. An ink composition comprising a metallic salt with a sterically bulky counter ion and a ligand is also provided. An ink composition for making a conductive structure, comprising a reducible metal complex formed by mixing: a reducing agent, wherein the reducing agent is dissolved in a dissolving agent; and at least one metal salt or metal complex comprising a Group 4, 5, 6, 7, 8, 9, 10, 11, or 12 metal, wherein the reducing agent reduces the metal to form the conductive structure is further provided.

A coating method is disclosed including disposing a coating composition into a fluidly communicating space defined by an internal surface of an article. The fluidly communicating space includes at least one aperture, which is sealed, forming an enclosed space. The internal surface and the coating composition are heated under autogenous pressure, coating the internal surface with the coating composition. The at least one aperture is unsealed, re-forming the fluidly communicating space. Another coating method is disclosed in which the coating composition is disposed into a reservoir which is connected in fluid communication with the enclosed space prior to heating under autogenous pressure, coating the internal surface with the coating composition. Yet another coating method is disclosed in which the coating composition and the article are disposed in a vessel, which is sealed, forming the enclosed space prior to heating under autogenous pressure, coating the internal surface with the coating composition.

Molecular precursor compounds, processes and compositions for making Zn-Group 13 mixed oxide materials including IZO, GZO, AZO and BZO, by providing inks comprising a molecular precursor compound having the formula M.sup.A.sub.aZn(OROR).sub.3a+2, and printing or depositing the inks on a substrate. The printed or deposited ink films can be treated to convert the molecular precursor compounds to a material.

Molecular precursor compounds, processes and compositions for making Zn-Group 13 mixed oxide materials including IZO, GZO, AZO and BZO, by providing inks comprising a molecular precursor compound having the formula M.sup.A.sub.aZn(OROR).sub.3a+2, and printing or depositing the inks on a substrate. The printed or deposited ink films can be treated to convert the molecular precursor compounds to a material.

A method of forming a variable refractive index thin film includes forming a coating including a tin (II) halide precursor and a liquid solvent, where the composition and/or concentration of the liquid solvent may vary spatially over one or more lateral dimension(s) of the coating. Annealing at elevated temperature may induce densification of the coating and the formation of a thin film having a variable refractive index. Local variability in the refractive index may be correlated to the location oxidation state of tin within the thin film, which may be related to the conformation of the liquid solvent.

A substrate processing apparatus includes: a rotation support table capable of supporting and rotating a substrate; a chemical liquid nozzle that is arranged above an outer edge portion of the substrate that is supported by the rotation support table, and through which a chemical liquid is applied to the outer edge portion; and a solidified film forming unit that is arranged at least either on an upper side or on a lower side of the outer edge portion of the substrate that is supported by the rotation support table, and on a downstream side, in a direction of rotation of the substrate, of a position where the chemical liquid nozzle is arranged, and solidifies the chemical liquid applied to the outer edge portion, to form a solidified film that forms a part of an annular film.

A substrate processing apparatus includes: a rotation support table capable of supporting and rotating a substrate; a chemical liquid nozzle that is arranged above an outer edge portion of the substrate that is supported by the rotation support table, and through which a chemical liquid is applied to the outer edge portion; and a solidified film forming unit that is arranged at least either on an upper side or on a lower side of the outer edge portion of the substrate that is supported by the rotation support table, and on a downstream side, in a direction of rotation of the substrate, of a position where the chemical liquid nozzle is arranged, and solidifies the chemical liquid applied to the outer edge portion, to form a solidified film that forms a part of an annular film.

A sol-gel method for forming durable, scratch-resistant coatings on glass substrates. Zirconia coatings, for example, are formed from a solution of zirconium oxychloride octahydrate in an organic, polar, aprotic solvent such as dimethylformamide. Annealed coatings, which optionally include an additive such as graphene, have a low coefficient of friction and can exhibit high hardness and hydrophobicity.

A method for depositing metal or metal alloy on a substrate includes preparing a mixture including a hydroxide, a polyol solvent, a metal precursor and a complexing agent, wherein the mixture does not include water; applying the mixture to a substrate including exposed metal surfaces to selectively deposit metal onto the exposed metal surfaces of the substrate; and heating the mixture to a predetermined deposition temperature range from 120 C. and 160 C. at least one of before or after applying the mixture to the substrate.