C23C18/48

ENVIRONMENTALLY FRIENDLY STABLE CATALYSTS FOR ELECTROLESS METALLIZATION OF PRINTED CIRCUIT BOARDS AND THROUGH-HOLES
20170171982 · 2017-06-15 ·

Catalysts include nanoparticles of catalytic metal and maltodextrin as a stabilizer in molar ratios which enable stabilization of the catalyst during storage and during electroless metal plating. The catalysts are environmentally friendly and are tin free. The catalysts adhere well to dielectric materials of printed circuit boards including the walls of through-holes.

ENVIRONMENTALLY FRIENDLY STABLE CATALYSTS FOR ELECTROLESS METALLIZATION OF PRINTED CIRCUIT BOARDS AND THROUGH-HOLES
20170171982 · 2017-06-15 ·

Catalysts include nanoparticles of catalytic metal and maltodextrin as a stabilizer in molar ratios which enable stabilization of the catalyst during storage and during electroless metal plating. The catalysts are environmentally friendly and are tin free. The catalysts adhere well to dielectric materials of printed circuit boards including the walls of through-holes.

ENVIRONMENTALLY FRIENDLY STABLE CATALYSTS FOR ELECTROLESS METALLIZATION OF PRINTED CIRCUIT BOARDS AND THROUGH-HOLES
20170171987 · 2017-06-15 ·

Catalysts include nanoparticles of catalytic metal and starch as a stabilizer in molar ratios which enable stabilization of the catalyst during storage and during electroless metal plating. The catalysts are environmentally friendly and are tin free. The catalysts adhere well to dielectric materials of printed circuit boards including the walls of through-holes.

ENVIRONMENTALLY FRIENDLY STABLE CATALYSTS FOR ELECTROLESS METALLIZATION OF PRINTED CIRCUIT BOARDS AND THROUGH-HOLES
20170171987 · 2017-06-15 ·

Catalysts include nanoparticles of catalytic metal and starch as a stabilizer in molar ratios which enable stabilization of the catalyst during storage and during electroless metal plating. The catalysts are environmentally friendly and are tin free. The catalysts adhere well to dielectric materials of printed circuit boards including the walls of through-holes.

ENVIRONMENTALLY FRIENDLY STABLE CATALYSTS FOR ELECTROLESS METALLIZATION OF PRINTED CIRCUIT BOARDS AND THROUGH-HOLES
20170171988 · 2017-06-15 ·

Catalysts include nanoparticles of catalytic metal and dextrin as a stabilizer in molar ratios which enable stabilization of the catalyst during storage and during electroless metal plating. The catalysts are environmentally friendly and are tin free. The catalysts adhere well to dielectric materials of printed circuit boards including the walls of through-holes.

ENVIRONMENTALLY FRIENDLY STABLE CATALYSTS FOR ELECTROLESS METALLIZATION OF PRINTED CIRCUIT BOARDS AND THROUGH-HOLES
20170171988 · 2017-06-15 ·

Catalysts include nanoparticles of catalytic metal and dextrin as a stabilizer in molar ratios which enable stabilization of the catalyst during storage and during electroless metal plating. The catalysts are environmentally friendly and are tin free. The catalysts adhere well to dielectric materials of printed circuit boards including the walls of through-holes.

FORMATION METHOD OF PLATING PATTERN AND SEMICONDUCTOR PACKAGE INCLUDING PLATING PATTERN LAYER FORMED THEREBY
20250054773 · 2025-02-13 · ·

A method of forming a plating pattern includes forming a first plating layer on a substrate, forming a photosensitive material layer on the first plating layer, patterning the photosensitive material layer to have a trench exposing a portion of the first plating layer, forming a superhydrophobic film on a surface of the photosensitive material layer, forming a second plating layer in the trench by immersing the photosensitive material layer and the first plating layer in a plating solution, and simultaneously removing the superhydrophobic film and the photosensitive material layer.

FORMATION METHOD OF PLATING PATTERN AND SEMICONDUCTOR PACKAGE INCLUDING PLATING PATTERN LAYER FORMED THEREBY
20250054773 · 2025-02-13 · ·

A method of forming a plating pattern includes forming a first plating layer on a substrate, forming a photosensitive material layer on the first plating layer, patterning the photosensitive material layer to have a trench exposing a portion of the first plating layer, forming a superhydrophobic film on a surface of the photosensitive material layer, forming a second plating layer in the trench by immersing the photosensitive material layer and the first plating layer in a plating solution, and simultaneously removing the superhydrophobic film and the photosensitive material layer.

Method of making multi-layer electronic components with plated terminations

Improved method steps for making a multilayer electronic components are disclosed. Monolithic components are formed with plated terminations whereby the need for typical thick-film termination stripes is eliminated or greatly simplified. Such termination technology eliminates many typical termination problems and enables a higher number of terminations with finer pitch, which may be especially beneficial on smaller electronic components. Electrodes and insulating substrates are provided in an interleaved arrangement and selected portions of the electrodes are exposed along selected edges of the substrates. Anchor tabs, which are not in direct contact with the electrodes and offer additional nucleation points for plated structures, may also optionally be provided and exposed in some embodiments. Termination material is then plated to the exposed portions of the electrodes and optional anchor tabs, such as via electroless and/or electrochemical processes, until exposed portions of selected groups thereof are connected.

Method of making multi-layer electronic components with plated terminations

Improved method steps for making a multilayer electronic components are disclosed. Monolithic components are formed with plated terminations whereby the need for typical thick-film termination stripes is eliminated or greatly simplified. Such termination technology eliminates many typical termination problems and enables a higher number of terminations with finer pitch, which may be especially beneficial on smaller electronic components. Electrodes and insulating substrates are provided in an interleaved arrangement and selected portions of the electrodes are exposed along selected edges of the substrates. Anchor tabs, which are not in direct contact with the electrodes and offer additional nucleation points for plated structures, may also optionally be provided and exposed in some embodiments. Termination material is then plated to the exposed portions of the electrodes and optional anchor tabs, such as via electroless and/or electrochemical processes, until exposed portions of selected groups thereof are connected.