C23C28/042

Molybdenum monoxide layers, and production thereof using PVD

The invention relates to a coating comprising at least one molybdenum-containing layer having molybdenum oxide, said molybdenum being essentially molybdenum monoxide. The invention further relates to a PVD process for producing the disclosed coating, in which the layer comprising the molybdenum monoxide is produced using arc evaporation. The invention also relates to a component that has said coating.

PLASMA-PROCESSING DETECTION INDICATOR IN WHICH METAL OXIDE FINE PARTICLES ARE USED AS COLOR-CHANGE LAYER

The present invention provides a plasma treatment detection indicator including a color-changing layer that changes color by plasma treatment, exhibiting excellent heat resistance, with the gasification of the color-changing layer or the scattering of the fine debris of the color-changing layer caused by the plasma treatment being suppressed to the extent that electronic device properties are not affected. Specifically, the present invention provides a plasma treatment detection indicator comprising a color-changing layer that changes color by plasma treatment, the color-changing layer comprising metal oxide fine particles containing at least one element selected from the group consisting of Mo, W, Sn, V, Ce, Te, and Bi, the metal oxide fine particles having a mean particle size of 50 μm or less.

METHODS OF PROTECTING AEROSPACE COMPONENTS AGAINST CORROSION AND OXIDATION

Embodiments of the present disclosure generally relate to protective coatings on an aerospace component and methods for depositing the protective coatings. In one or more embodiments, a method for depositing a coating on an aerospace component includes depositing one or more layers on a surface of the aerospace component using an atomic layer deposition or chemical vapor deposition process, and performing a partial oxidation and annealing process to convert the one or more layers to a coalesced layer having a preferred phase crystalline assembly. During oxidation cycles, an aluminum depleted region is formed at the surface of the aerospace component, and an aluminum oxide region is formed between the aluminum depleted region and the coalesced layer. The coalesced layer forms a protective coating, which decreases the rate of aluminum depletion from the aerospace component and the rate of new aluminum oxide scale formation.

HIGH TEMPERATURE COATING FOR SILICON NITRIDE ARTICLES
20170327937 · 2017-11-16 ·

A coated article, comprising an article having at least one surface having disposed thereupon an oxidation resistant coating comprising at least two constituents to form a composition, a first constituent comprising at least one thermal expansion component comprising at least about 10% by volume to up to about 99% by volume of the composition, a second constituent comprising at least one oxygen scavenger comprising at least about 1% by volume to up to about 90% by volume of the composition.

Sliding member with carbon transfer layer

A sliding member includes a carbon transfer layer and can superiorly effectively decrease friction and reduce wear. A method produces the sliding member. The sliding member includes a substrate and a carbon transfer layer. The carbon transfer layer is disposed on the surface of the substrate and includes both sp.sup.2 bonded carbon and sp.sup.3 bonded carbon. The carbon transfer layer preferably has a ratio sp.sup.3/(sp.sup.2+sp.sup.3) of the sp.sup.3 bonded carbon to the totality of the sp.sup.2 bonded carbon and the sp.sup.3 bonded carbon of 0.1 or more.

Hybrid Thermal Barrier Coating

An article has a metallic substrate having a plurality of recesses. A first coating is at least at the recesses and has: a splatted layer; and a columnar layer atop the splatted layer. A second coating is away from the recesses and has: a columnar layer atop the substrate without an intervening splatted layer.

ATOMIC LAYER DEPOSITION OF PROTECTIVE COATINGS FOR SEMICONDUCTOR PROCESS CHAMBER COMPONENTS
20170314125 · 2017-11-02 ·

A multi-component coating composition for a surface of a semiconductor process chamber component comprising at least one first film layer of a yttrium oxide or a yttrium fluoride coated onto the surface of the semiconductor process chamber component using an atomic layer deposition process and at least one second film layer of an additional oxide or an additional fluoride coated onto the surface of the semiconductor process chamber component using an atomic layer deposition process, wherein the multi-component coating composition is selected from the group consisting of YO.sub.xF.sub.y, YAl.sub.xO.sub.y, YZr.sub.xO.sub.y and YZr.sub.xAl.sub.yO.sub.z.

Method of facilitating visual detection of a crack in a component of a gas turbine engine
09804058 · 2017-10-31 · ·

A component of a gas turbine engine comprises a substrate, a corrosion resistant top layer, and an intermediate corrodible layer disposed between the corrosion resistant top layer and the substrate. When corroding, the intermediate layer has a color contrasting with a color of the top layer. A method of detecting a crack when it penetrated the top layer in a component of a gas turbine engine having a corrosion resistant top layer and an intermediate corrodible layer comprises, in sequence, observing that at least one area of the component has a color contrasting with that of the top layer; determining that the color of the at least one area is a result of corrosion of the intermediate corrodible layer; and determining that the top layer has a crack as a result of determining corrosion of the intermediate layer. A method of facilitating crack detection in a component is also presented.

CUTTING TOOL
20170306500 · 2017-10-26 · ·

A cutting tool comprises a base material which includes particles including a tungsten carbide (WC) as a main component, a binder phase including cobalt (Co) as a main component, and particles including a carbide or a carbonitride of at least one selected from the group consisting of Group 4a, 5a, and 6a elements, or a solid solution thereof; and a hard film formed on the base material, wherein the hard film comprises at least an alumina layer, a cubic phase free layer (CFL), in which the carbide or the carbonitride is not formed, is formed from a surface of the base material to a depth of 10 μm to 50 μm, and a Co content of a surface of the CFL is 80% or more of a maximum Co content of the CFL.

METHODS FOR FORMING A LAMINATE FILM BY CYCLICAL PLASMA-ENHANCED DEPOSITION PROCESSES
20220059340 · 2022-02-24 ·

Methods for forming a laminate film on substrate by a plasma-enhanced cyclical deposition process are provided. The methods may include: providing a substrate into a reaction chamber, and depositing on substrate a metal oxide laminate film by alternatingly depositing a first metal oxide film and a second metal oxide film different from the first metal oxide film, wherein depositing the first metal oxide film and the second metal oxide film comprises, contacting the substrate with sequential and alternating pulses of a metal precursor and an oxygen reactive species generated by applying RF power to a reactant gas comprising at least nitrous oxide (N.sub.2O).