An example article includes a substrate and a barrier coating on the substrate. The barrier coating includes a matrix including a rare-earth disilicate extending from an inner interface facing the substrate to an outer surface opposite the inner interface. The barrier coating includes a graded volumetric distribution of rare-earth oxide rich (REO-rich) phase regions in the matrix along a direction from the inner interface to the outer surface. The graded volumetric distribution defines a first volumetric density of the REO-rich phase regions at a first region of the matrix adjacent the outer surface. The graded volumetric distribution defines a second volumetric density of the REO-rich phase regions at a second region of the matrix adjacent the inner surface. The second volumetric density is different from the first volumetric density. An example technique includes forming the barrier coating on the substrate of a component.

Coatings for metal forming tools or metal forming members used for cold forming of high-strength steels include a CrN lower layer and a TiCN upper layer. The lower layer is deposited closer to the substrate than the upper layer. The lower layer is made of oxygen-enriched chromium nitride exhibiting a cubic structure with preferred orientation, and the upper layer is made of hydrogen-enriched titanium carbonitride. Methods for depositing the coatings are also described.

An object of the present invention is to provide magnesium oxide for an annealing separator which is useful for obtaining grain-oriented electromagnetic steel sheets with excellent magnetic properties and insulating properties. To resolve the above object, an aspect of the present invention resides in magnesium oxide for an annealing separator having a Blaine specific surface area of 2.510.sup.3 to 7.010.sup.3 m.sup.2.Math.kg.sup.1 and CAA of 50 to 170 seconds.

To provide a piston ring comprising a hard carbon film that is easy to form and exhibits excellent wear resistance. The above-described problem is solved by having a hard carbon film 4 formed on at least an outer peripheral sliding surface 11 of a piston ring base material 1, wherein the hard carbon film 4 is a laminated film comprising a plurality of layers, and is configured so as to contain boron within a range of an atomic density of 0.210.sup.22 atoms/cm.sup.3 to 2.010.sup.22 atoms/cm.sup.3 inclusive. This hard carbon film 4 may be configured to have an sp.sup.2 component ratio within a range of 40% to 80% inclusive, measured in a TEM-EELS spectrum formed by combining electron energy loss spectroscopy (EELS) with a transmission electron microscope (TEM), and a hydrogen content within a range of 0.1 atom % to 5 atom % inclusive. Further, a total thickness of this hard carbon film 4 may be configured to be within a range of 0.5 m to 20 m inclusive.

The invention relates to a process for coating an article (1), wherein a coating (2) having one or more coating layers (3, 4, 5) is applied to the article (1), wherein at least one coating layer (5) is formed essentially from aluminium, titanium and nitrogen, wherein the coating layer (5) has, at least in some regions, adjoining lamellae of different chemical composition and is deposited from a gas phase comprising at least one aluminium precursor and at least one titanium precursor. According to the invention, by setting a molar ratio of aluminium to titanium, the lamellae of different chemical composition are each formed with a cubic structure, it being possible for aluminium and titanium to be partly replaced by other metals and for nitrogen to be partly replaced by oxygen and/or carbon with retention of the cubic structure. The invention further relates to a correspondingly produced coating (2).

The use of a physical mixture of partially stabilized and fully stabilized zirconium oxide powder for producing a thermal barrier coating results in good thermal barrier properties and good mechanical properties is provided.

A sealing process includes applying a first reactant to a substrate having a porous structure, the first reactant comprising a chromium (III) precursor and a transition metal precursor and applying a second reactant to the first reactant, the second reactant comprising a rare earth element precursor and an alkaline earth element precursor to form reservoirs of trivalent chromium in pore space of the porous structure, and a physical barrier over the substrate and the reservoirs.

The present invention relates to a semiconductor manufacturing component for manufacturing a semiconductor device by using a substrate such as a wafer in a dry etching process, and a manufacturing method thereof. The semiconductor manufacturing component comprising a deposition layer covering an interlayer boundary according to the present invention comprises: a base material containing carbon; a first deposition layer formed on the base material; a second deposition layer formed on the first deposition layer; and a third deposition layer formed on the first deposition layer and the second deposition layer, and formed to cover at least one portion of a boundary line between the first deposition layer and the second deposition layer.

An article may include a substrate including a metal or alloy; a bond coat directly on the substrate; an intermediate ceramic layer on the bond coat; and an abradable ceramic layer directly on the intermediate ceramic layer. The intermediate ceramic layer includes a stabilized tetragonal prime phase constitution and defines a first porosity. The abradable ceramic layer includes zirconia or hafnia stabilized in the tetragonal prime phase by a second mixture including between about 5 wt. % and about 10 wt. % ytterbia, between about 0.5 wt. % and about 2.5 wt. % samaria, and between about 1 wt. % and about 4 wt. % of at least one of lutetia, scandia, ceria, neodymia, europia, or gadolinia, and a balance zirconia or hafnia. The abradable ceramic layer defines a second porosity, and the second porosity is higher than the first porosity.

A coated cutting tool for chip forming machining of metals includes a substrate having a surface coated with a chemical vapour deposition (CVD) coating. The coated cutting tool has a substrate coated with a coating including a layer of -Al2O3, wherein the -Al2O3 layer exhibits a dielectric loss of 106tan 0.0025, as measured with AC at 10 kHz, 100 mV at room temperature of 20 C.