Methods for forming high temperature coating systems are provided. In embodiments, the coating formation method includes forming a fracture-resistant Thermal Barrier Coating (TBC) layer over a workpiece surface. The fracture-resistant TBC layer is produced from a first coating precursor material containing an amount of zirconia in mole percent (ZrO.sub.mol%1) and an amount of tantala in mole percent (TaO.sub.mol%1). A Calcium-Magnesium Aluminosilicate (CMAS) resistant TBC layer is formed over the fracture-resistant TBC layer from a second coating precursor material, which contains an amount of zirconia in mole percent (ZrO.sub.mol%2), an amount of tantala in mole percent (TaO.sub.mol%2), and an amount of one or more rare earth oxides in mole percent (REO.sub.mol%2). The first and second coating precursor materials are formulated such that ZrO.sub.mol%1 is greater than ZrO.sub.mol%2, TaO.sub.mol%1 is less than TaO.sub.mol%2, and TaO.sub.mol%2 is substantially equivalent to REO.sub.mol%2.

A coating including a CMAS-resistant layer with a rare earth oxide. The CMAS-resistant layer is essentially free of zirconia and hafnia, and may further include at least one of alumina, silica, and combinations thereof.

A method for producing a wear and corrosion resistant WC based material coated with one or more metals selected from group IVB, VB and VIB metals (according to CAS system) and Al is disclosed. The method comprises treating of said coated structure with electrochemical boriding treatment in an electrolyte which is substantially free of halogenated compounds wherein the electrolyte comprises alkali carbonates and boron sources and said electrolyte being heated during electrolysis under an induction heating regime having electromagnetic frequency ranging from 50 to 300 kHz during electrolysis.

In some examples, an article may include a substrate and a coating on the substrate. The substrate may include a superalloy, a ceramic, or a ceramic matrix composite. The coating may include a layer comprising a matrix material and a plurality of nanoparticles. The matrix material may include at least one of silica, zirconia, alumina, titania, or chromia, and the plurality of nanoparticles may include nanoparticles including at least one of yttria, zirconia, alumina, or chromia. In some examples, an average diameter of the nanoparticles is less than about 400 nm.

A thermal barrier coating includes a highly porous layer and a dense layer. The highly porous layer is formed on a heat-resistant base, is made of ceramic, has pores, has a layer thickness of equal to or larger than 0.3 mm and equal to or smaller than 1.0 mm, and has a pore ratio of equal to or higher than 1 vol % and equal to or lower than 30 vol %. The dense layer is formed on the highly porous layer, is made of ceramic, has a pore ratio of equal to or lower than 0.9 vol % that is equal to or lower than the pore ratio of the highly porous layer, and has a layer thickness of equal to or smaller than 0.05 mm.

A coating including a CMAS-resistant layer with a rare earth oxide. The CMAS-resistant layer is essentially free of zirconia and hafnia, and may further include at least one of alumina, silica, and combinations thereof.

A method includes casting a metallic material (56) in a mold (20) containing a core, the core having a substrate (40, 44) coated with a coating (42). A removing of the metallic material from the mold and decoring leaves a casting having a layer formed by the coating. The coating has a ceramic having a porosity in a zone (50) near the substrate less than a porosity in a zone (52) away from the substrate.

The present invention relates to a method of case hardening a Group IV metal or a Group IV metal alloy and to components hardened in the method. The method comprising the steps of: providing a workpiece of a Group IV metal or a Group IV metal alloy, the workpiece being in its final shape; nitriding the workpiece in a nitriding atmosphere comprising NHs as a nitriding species at a first temperature in the range of 450? C. to 750? C. for a nitriding duration of at least 16 hours to provide a hydrogen containing diffusion zone; removing hydrogen from the hydrogen containing diffusion zone at a second temperature of up to 750? C. and a partial pressure of H.sub.2 of up to 10.sup.?4 mbar over a hydrogen removal duration of at least 4 hours to provide a hydrogen depleted diffusion zone. The method and the component are useful for implants, in particular dental implants.

A protective coating layer, an electronic device including such a protective coating layer, and the methods of making the same are provided. The electronic device includes a substrate, a thin film circuit layer disposed over the substrate, and a protective coating layer disposed over the thin film circuit layer. The protective coating layer includes a first coating and a second coating disposed over the first coating. Each coating has a cross-plane thermal conductivity in a direction normal to a respective coating surface equal to or higher than 0.5 W/(m*K). The first coating and the second coating have different crystal or amorphous structures, different crystalline orientations, different compositions, or a combination thereof to provide different nanoindentation hardness. The first coating has a hardness lower than that of the second coating.

At least a (Al.sub.1-a-b-cCr.sub.aSi.sub.bCu.sub.c)N (where 0.15a0.40, 0.05b0.20, and 0.005c0.05) layer is provided on a surface of a tool body, a Cr concentration or a Cu concentration periodically changes in a layer thickness direction, a concentration Crmax in a highest content point of Cr is in a range of a<Crmax1.3a, a concentration Crmin in a lowest content point of Cr is in a range of 0.50aCrmin<a, and optionally in a case where a Cu composition at one point z along the layer thickness direction is represented by c.sub.z and a Cr composition at the point z is represented by a.sub.z, (c.sub.z/a.sub.z)/(c/a) is 0.7 to 1.5 over the layer thickness direction entirely.