A coating includes a first base layer including a nitride of at least Al and Cr, a second base layer including a nitride of at least Al and Cr overlying the first base layer, and an outermost indicator layer overlying the second base layer. The first base layer has a positive residual compressive stress gradient. The second base layer has substantially constant residual compressive stresses. The outermost indicator layer includes a nitride of Si and Me, wherein Me is at least one of Ti, Zr, Hf, and Cr. The outermost indicator layer has residual compressive stresses that are less than the residual compressive stresses of the second base layer.

According to various embodiments, a method for manufacturing a metal housing can be provided, comprising: a step of forming a metal base made of a metal material; a step of pretreating the surface of the metal base such that the surface has a predetermined gloss and flatness; an anodizing step of forming a predetermined oxide film on the flat surface of the metal base; a step of coloring the oxide film by using a colorant having a desired color; a sealing step for maintaining the performance and characteristics of the colorant on the colored oxide film; and a step of laminating at least one deposition layer on the upper part of the sealed oxide film.

A surface-coated cutting tool includes a substrate and a coating film that coats the substrate, wherein the coating film includes a hard coating layer constituted of a domain region and a matrix region, the domain region is a region having a plurality of portions divided and distributed in the matrix region, the domain region has a structure in which a first layer composed of a first Al.sub.x1Ti.sub.(1-x1) compound and a second layer composed of a second Al.sub.x2Ti.sub.(1-x2) compound are layered on each other, the matrix region has a structure in which a third layer composed of a third Al.sub.x3Ti.sub.(1-x3) compound and a fourth layer composed of a fourth Al.sub.x4Ti.sub.(1-x4) compound are layered on each other.

Provided is a transparent structure having improved wear resistance and flexibility, and a structure according to the present invention is a nanolayered structure in which a nitride nanofilm of one or more elements selected from metals and metalloids; and a boron nitride nanofilm are alternately layered.

Disclosed are approaches for forming semiconductor device cavities. One method may include providing a set of semiconductor structures defining an opening, wherein the opening has a first opening width along an upper portion of the opening and a second opening width along a lower portion of the opening, the first opening width being greater than the second opening width. The method may further include forming a blocking layer along the set of semiconductor structures by delivering a material at a non-zero angle of inclination relative to a normal extending perpendicular from a top surface of the set of semiconductor structures. The blocking layer may be formed along the upper portion of the opening without being formed along the lower portion of the opening, and wherein an opening through the blocking layer is present above the opening.

A turbine article includes a substrate with a geometric surface having a multiple of divots recessed into the substrate, and a ceramic topcoat disposed over the geometric surface, the topcoat including at least a first layer having a first hardness and a second layer having a second hardness, the first hardness different than the second hardness.

Techniques for depositing a functionally integrated coating structure on a substrate are provided. An example method according to the disclosure includes receiving the substrate into a process chamber of a multi-process ion beam assisted deposition system, disposing the substrate in a first zone including a first evaporator species and a first ion beam, wherein the first evaporator species is Aluminum Oxide (Al2O3), disposing the substrate in a second zone including a second evaporator species and a second ion beam, wherein the second evaporator species is Yttrium Oxide (Y2O3), and disposing the substrate in a third zone including a third evaporator species and a third ion beam, wherein the third evaporator species is Yttrium Fluoride (YF3).

A film includes a base layer, where each of front and back sides of the base layer is provided with a bonding layer, a composite structure layer, an aluminum material layer, and an anti-oxidation layer in sequence. The composite structure layer includes at least two structure layers. Each structure layer is composed of an aluminum material layer and a reinforcement layer, and the structure layers are stacked. With the composite structure layer, the new film has a resistivity as low as 4.5×10.sup.−8 Ω.Math.m, a peel force as high as 4.8 N to 5.2 N, and improved bonding force and compactness.

A layer system includes at least one bonding layer and a plurality of functional layers arranged on the at least one bonding layer. Each functional layer has a first nanolayer of a first metal nitride with a first metal constituent, and a metallic second nanolayer. Each functional layer has a layer thickness d in a range of 1 to 100 nm.

A surface-coated cutting tool includes a substrate and a coating film that coats the substrate, wherein the coating film includes a hard coating layer constituted of a domain region and a matrix region, the domain region is a region having a plurality of portions divided and distributed in the matrix region, the domain region has a structure in which a first layer composed of a first Al.sub.x1Ti.sub.(1-x1) compound and a second layer composed of a second Al.sub.x2Ti.sub.(1-x2) compound are layered on each other, the matrix region has a structure in which a third layer composed of a third Al.sub.x3Ti.sub.(1-x3) compound and a fourth layer composed of a fourth Al.sub.x4Ti.sub.(1-x4) compound are layered on each other, the first AlTi compound and the third AlTi compound have a hexagonal crystal structure, the second AlTi compound and the fourth AlTi compound have a cubic crystal structure.