A three-dimensional (3D) memory device includes a substrate, an alternating conductive/dielectric stack disposed on the substrate, an epitaxial layer disposed on the substrate, a blocking layer disposed on the epitaxial layer and surrounded by the alternating conductive/dielectric stack, a trapping layer disposed on and surrounded by the blocking layer, a tunneling layer disposed on and surrounded by the trapping layer, and a semiconductor layer disposed on and in contact with the epitaxial layer and partially disposed on and surrounded by the tunneling layer.

Disclosed are a component for a fuel injector and a method for coating the same. The component for the fuel injector may include a base material, a bonding layer laminated on the base material, a support layer laminated on the outer surface of the bonding layer, and an NbSiCN functional layer including an NbCN layer and an SiCN layer and alternately laminated on the outer surface of the support layer, thereby reducing friction, high hardness, shock resistance, heat resistance, and durability of the component for the fuel injector.

A coated cutting tool comprises a substrate and a coating layer formed on a surface of the substrate, and has a rake face and a flank. The coating layer comprises an alternating laminate structure in which first compound layers containing AlN and second compound layers containing a compound are laminated in an alternating manner, the compound having a composition represented by formula (1) below:
(Ti.sub.1-xAl.sub.x)N  (1)
(wherein x satisfies 0.40≤x≤0.70). An average thickness T.sub.1 per first compound layer is 5 nm or more to 160 nm or less, and an average thickness T.sub.2 per second compound layer is 8 nm or more to 200 nm or less. A ratio of T.sub.1 to T.sub.2 is 0.10 or more to 0.80 or less. An average thickness T.sub.3 of the alternating laminate structure is 2.5 μm or more to 7.0 μm or less. A ratio (H/E) of hardness H to elastic modulus E is 0.065 or more to 0.085 or less at the rake face or the flank.

Systems, methods, and apparatus for encapsulating objects like that of microelectronic components and batteries. The system includes three successive layers that include a first covering layer composed of an electrically insulating material deposited by atomic layer deposition, which at least partly covers the object, a second covering layer that includes parylene and/or polyimide, and which is disposed on the first covering layer, and a third covering layer deposited on the second covering layer in such a way as to protect the second encapsulation layer, namely, with respect to oxygen, and thereby increase the service life of the object.

A coated tool according to the present disclosure comprises a base body and a coating film. The base body contains a plurality of boron nitride particles. The coating film is located on the base body. In addition, in a case where a hardness is measured by pressing an indenter from a surface of the coating film to a depth of 20% of the coating film while changing an indentation load of the indenter, a maximum hardness difference, which is a difference between a maximum hardness and a minimum hardness of the hardness, is 4 GPa or more.

Apparatus for depositing germanium and carbon onto one or more substrates comprises a vacuum chamber, at least first and second magnetron sputtering devices and at least one movable mount for supporting the one or more substrates within the vacuum chamber. The first magnetron sputtering device is configured to sputter germanium towards the at least one mount from a first sputtering target comprising germanium, thereby defining a germanium sputtering zone within the vacuum chamber. The second magnetron sputtering device is configured to sputter carbon towards the at least one mount from a second sputtering target comprising carbon, thereby defining a carbon sputtering zone within the vacuum chamber. The at least one mount and the at least first and second magnetron sputtering devices are arranged such that, when each substrate is moved through the germanium sputtering zone on the at least one movable mount, germanium is deposited on the said substrate, and when each substrate is moved through the carbon sputtering zone on the at least one movable mount, carbon is deposited on the said substrate.

A coating includes a first base layer including a nitride of at least Al and Cr, a second base layer including a nitride of at least Al and Cr overlying the first base layer, and an outermost indicator layer overlying the second base layer. The first base layer has a positive residual compressive stress gradient. The second base layer has substantially constant residual compressive stresses. The outermost indicator layer includes a nitride of Si and Me, wherein Me is at least one of Ti, Zr, Hf, and Cr. The outermost indicator layer has residual compressive stresses that are less than the residual compressive stresses of the second base layer.

Provided is a surface-coated cutting tool including a complex carbonitride layer on the tool body, wherein a ratio of crystal grains having a NaCl type face-centered cubic structure is 80 area % or more, x.sub.avg and y.sub.avg satisfy 0.60≤x.sub.avg≤0.90 and 0.000≤y.sub.avg≤0.050, respectively, a composition of the Ti—Al complex carbonitride layer being represented by (Ti.sub.1-xAl.sub.x)(C.sub.yN.sub.1-y), the x.sub.avg being an average of x that is an Al content in a total content of Al and Ti, and the y.sub.avg being an average of y that is a C content in a total content of C and N, the crystal grains having the NaCl type face-centered cubic structure include crystal grains in which the x repeatedly increases and decreases, the crystal grains include 10 to 40 area % of crystal grains G.sub.1 having an average distance of 40 to 160 nm and crystal grains G.sub.s having an average distance of 1 to 7 nm.

A coated tool for hot stamping of coated or uncoated sheet metals, comprising a coated substrate surface to be in contact with the coated or uncoated metal sheet, wherein the coating in the coated substrate surface comprises one or more inferior layers and one or more superior layers, where the inferior layers are deposited closer to the substrate surface than the superior layers, and: the inferior layers are designed for providing load bearing capacity, the superior layers are designed for providing galling resistance, at least one superior layer is deposited having a multi-nanolayer structure wherein: one type of nanolayer is composed of at least 90 at.-% of chromium and nitrogen, a second type of nanolayer is composed of at least 90 at.-% of titanium, aluminum and nitrogen, a third type of nanolayer is composed of at least 90 at.-% of vanadium carbon and nitrogen.

An optical filter may include a set of optical filter layers disposed onto a substrate. The set of optical filter layers may include a first subset of optical filter layers comprising a first material with a first refractive index. The first material may comprise at least silicon and hydrogen. The set of optical filter layers may include a second subset of optical filter layers comprising a second material with a second refractive index. The second material is different from the first material and the second refractive index is less than the first refractive index. The set of optical filter layers may include a third subset of optical filter layers comprising a third material different from the first material and the second material.