The disclosure provides for anti-scale deposition coatings for use on surface, such as on oilfield parts. The coating includes a first, sublayer of a metal, ceramic, or metal-ceramic composite, which is characterized in having a hardness in excess of 35 HRC. The coating includes a second, top layer over the first layer, that is a polymer. A surface of the first layer may be conditioned to have a roughened or patterned topology for receipt of and adherence with the at least one top layer. The first layer may provide the coating with hardness, and the at least one top layer may provide the coating with low-friction and anti-scale properties.

Provided is a coated cutting tool having improved wear resistance and fracture resistance and a long tool life. The coated cutting tool includes a substrate, and a coating layer formed on a surface of the substrate. The coating layer has a laminated structure in which a first layer and a second layer are alternately laminated for one or more layers. The first layer is a compound layer having a composition represented by Ti(C.sub.xN.sub.1-x). The second layer is a compound layer having a composition represented by (Ti.sub.yAl.sub.1-y)N. The laminated structure includes first to third laminated structures in this order from a substrate side to a surface side of the coating layer. An average thickness per layer of each of the first layer and the second layer in the first to third laminated structures is in a specific range. An average thickness of the first to third laminated structures is in a specific range.

A coated cutting tool includes a substrate and a coating, wherein the coating has a (Ti,Al)N multilayer of alternating cubic Ti.sub.1-xAl.sub.xN sub-layers, 0.60≤x≤0.75, and cubic+hexagonal Ti.sub.1-yAl.sub.yN sub-layers, 0.60≤y≤0.75. The average cubic Ti.sub.1-xAl.sub.xN sub-layer thickness is from 75 to 450 nm and the average cubic+hexagonal Ti.sub.1-yAl.sub.yN sub-layer thickness is from 50 to 300 nm. The number of each of the cubic Ti.sub.1-xAl.sub.xN sub-layers and cubic+hexagonal Ti.sub.1-yAl.sub.yN sub-layers is from 2 to 50.

The invention relates to a metallized multilayer sheet material for packaging having a water vapour transmission rate of below 5 g/m.sup.2/day at 38° C. RH:90% comprising:

a water vapour permeable sheet substrate, and

at least two metallized layers, each covered directly by a solvent based polymeric coating layer,

wherein the cumulated metallized layers have an optical density of at least 2.5 and/or a thickness of at least 15 nm.

A CVD preparation method for minimizing camera module dot defects includes: performing ultrasonic cleaning and drying on a base substrate to obtain a pre-treated base substrate; placing the pre-treated base substrate into a reaction chamber, evacuating, and introducing nitrogen or inert gas to slightly positive pressure; simultaneously introducing precursor I and precursor II at a temperature of 500-700° C. to deposit a low-refractive-index L layer on the base substrate; halting introduction of the precursor I and the precursor II, and purging the reaction chamber with nitrogen or the inert gas; introducing raw gas precursor III and precursor IV at a temperature of 600-800° C. to deposit a high-refractive-index H layer on the low-refractive-index L layer; and halting introduction of the precursor III and precursor IV, and purging the reaction chamber with nitrogen or inert gas; and cooling to room temperature to obtain an optical element with coating films having different refractive indices.

An ALD preparation method for eliminating camera module dot defects includes: placing a base substrate in a reaction chamber, and heating to 100-400° C.; introducing a first reaction precursor into the reaction chamber to chemically adsorb the first reaction precursor on the base substrate to form a first film layer; removing the excess first reaction precursor, and purging with inert gas; introducing a second reaction precursor into the reaction chamber to create a reaction between the second reaction precursor and the first reaction precursor to form a first refractive index layer; removing the excess second reaction precursor and a by-product of the reaction, and purging with inert gas; introducing a third reaction precursor into the reaction chamber to chemically adsorb the third reaction precursor on a surface of the first refractive index layer to form a second film layer; and removing the excess third reaction precursor, and purging with inert gas.

A hard coating includes a three kinds of layers that are alternately laminated. The three kinds of layers consist of a single composition layer and two kinds of nanolayer-alternated layers. The single composition layer is constituted by one of an A composition (nitride of AlCrSiα), a B composition (nitride of CrBSiβ) and a C composition (nitride of AlCr(SiC)γ). The two kinds of nanolayer-alternated layers include nanolayers which are alternately laminated and which are constituted by two of three combinations consisting of a combination of the A composition and B composition, a combination of the A composition and C composition and a combination of the B composition and C composition. The single composition layer has a thickness of 0.5-1000 nm. Each of the nanolayers constituting the two kinds of nanolayer-alternated layers has a thickness of 0.5-500 nm, and each of the two kinds of nanolayer-alternated layers has a thickness of 1-1000 nm.

A hard coating includes a three kinds of layers that are alternately laminated. The three kinds of layers consist of a single composition layer and two kinds of nanolayer-alternated layers. The single composition layer is constituted by one of an A composition (nitride of AlCrα), a B composition (nitride of AlTiCrβ) and a C composition (nitride of AlCr(SiC)γ). The two kinds of nanolayer-alternated layers include nanolayers which are alternately laminated and which are constituted by two of three combinations consisting of a combination of the A composition and B composition, a combination of the A composition and C composition and a combination of the B composition and C composition. The single composition layer has a thickness of 0.5-1000 nm. Each of the nanolayers constituting the two kinds of nanolayer-alternated layers has a thickness of 0.5-500 nm, and each of the two kinds of nanolayer-alternated layers has a thickness of 1-1000 nm.

A hard coating includes a three kinds of layers that are alternately laminated. The three kinds of layers consist of a single composition layer and two kinds of nanolayer-alternated layers. The single composition layer is constituted by one of an A composition (nitride of AlCrSiα), a B composition (nitride of AlTiSiβ) and a C composition (nitride of AlCr(SiC)γ). The two kinds of nanolayer-alternated layers include nanolayers which are alternately laminated and which are constituted by two of three combinations consisting of a combination of the A composition and B composition, a combination of the A composition and C composition and a combination of the B composition and C composition. The single composition layer has a thickness of 0.5-1000 nm. Each of the nanolayers constituting the two kinds of nanolayer-alternated layers has a thickness of 0.5-500 nm, and each of the two kinds of nanolayer-alternated layers has a thickness of 1-1000 nm.

A hard coating includes three kinds of alternately laminated layers. The three kinds of layers consist of two kinds of single composition layers and a nanolayer-alternated layer. The two kinds of single composition layers are constituted by respective two of an A composition, a B composition and a C composition, wherein the A composition is a nitride of AlCrα, the B composition is a nitride of AlCrSiβ, and the C composition is a nitride of AlCr(SiC)γ. The nanolayer-alternated layer includes two kinds of nanolayers which are constituted by respective two of the A composition, the B composition and the C composition and which are alternately laminated. Each of the two kinds of single composition layers has a thickness of 0.5-1000 nm. Each of the two kinds of nanolayers has a thickness of 0.5-500 nm, and the nanolayer-alternated layer has a thickness of 1-1000 nm.