Patent classifications
C23F1/04
MANUFACTURING METHOD FOR DEPOSITION MASK, METAL PLATE USED FOR PRODUCING DEPOSITION MASK, AND MANUFACTURING METHOD FOR SAID METAL SHEET
The present invention provides a metal sheet, on a first surface of which a resist pattern having a narrow width can be stably provided. This manufacturing method for a metal sheet includes a preparation step of preparing a sheet material comprising an iron alloy that contains nickel. When a composition analysis of the first surface of the metal sheet obtained from the sheet material is performed using X-ray photoelectron spectroscopy, the ratio A1/A2 obtained by the result of the X-ray photoelectron spectroscopy does not exceed 0.4, where A1 is the sum of the peak area value of nickel oxide and the peak area value of nickel hydroxide, and A2 is the sum of the peak area value of iron oxide and the peak area value of iron hydroxide.
Light shielding plate, camera unit, and electronic device
A light shielding plate including a front surface located on a light incident side, a rear surface facing away from the front surface, and an aperture penetrating through the front and rear surfaces. The aperture includes a first aperture portion and a second aperture portion connected to the first aperture portion via a central opening. The first aperture portion extends from a rear opening in the rear surface toward the central opening and has a shape tapered from the rear surface toward the front surface. The second aperture portion extends from a front opening in the front surface toward the central opening and has a shape tapered from the front surface toward the rear surface. The front opening is larger than the rear opening.
Method of preparing metal mask substrate
A method of preparing a metal mask substrate includes providing a metal substrate. Next, a gloss is measured and obtained from the surface of the metal substrate. Next, the gloss is determined whether to be within a predetermined range. When the gloss is determined within the predetermined range, a photolithography process is performed to the metal substrate, where the predetermined range is between 90 GU and 400 GU.
Method of preparing metal mask substrate
A method of preparing a metal mask substrate includes providing a metal substrate. Next, a gloss is measured and obtained from the surface of the metal substrate. Next, the gloss is determined whether to be within a predetermined range. When the gloss is determined within the predetermined range, a photolithography process is performed to the metal substrate, where the predetermined range is between 90 GU and 400 GU.
Light shielding plate, camera unit, electronic device, and method of producing the light shielding plate
A light shielding plate includes a front surface that is located on a light incident side, a rear surface that is a surface facing away from the front surface, and an aperture that penetrates through the front surface and the rear surface. The aperture has a first aperture portion and a second aperture portion that is connected to the first aperture portion via a central opening, and the first aperture portion extends from a rear opening in the rear surface toward the central opening and has a shape tapered from the rear surface toward the front surface. The second aperture portion extends from a rear opening in the front surface to the central opening and has a shape tapered from the front surface toward the rear surface. The front opening is larger than the rear opening.
MASK FOR THIN FILM DEPOSITION, AND FABRICATION METHOD THEREOF
A mask for thin film deposition includes a first mask which defines an opening, and a second mask on a surface of the first mask, and which defines a plurality of deposition holes and has a multilayer structure, in which the opening and the plurality of deposition holes communicate with each other and provide a passage for a deposition material, a size of each of the plurality of deposition holes is smaller than a size of the opening, and each of the plurality of deposition holes has a shape corresponding to a deposition pattern to be patterned on a substrate.
METHOD AND DEVICE FOR ETCHING PATTERNS INSIDE OBJECTS
Systems and methods for etching complex patterns on an interior surface of a hollow object are disclosed. A method generally includes positioning a laser system within the hollow object with a focal point of the laser focused on the interior surface, and operating the laser system to form the complex pattern on the interior surface. Motion of the laser system and the hollow object is controlled by a motion control system configured to provide rotation and/or translation about a longitudinal axis of one or both of the hollow object and the laser system based on the complex pattern, and change a positional relationship between a reflector and a focusing lens of the laser system to accommodate a change in distance between the reflector and the interior surface of the hollow object.
METHODS FOR CREATING FLUIDIC CAVITIES BY TRANSMEMBRANE ETCHING THROUGH POROUS MEMBRANES AND STRUCTURES MADE THEREBY AND USES OF SUCH STRUCTURES
Provided are monolithic structures comprising one or more suspended, nanoporous membranes that are in contact with one or more fluidic cavities, methods of making same, and exemplary uses of same. The monolithic structures can be formed using a transmembrane etch. The monolithic structures can be used, as examples, as filters and filtration modules in microfluidic devices, dialysis devices, and concentration devices in laboratory, industrial, and medical processes.
MASK MANUFACTURING METHOD AND MASK MANUFACTURING DEVICE
A mask manufacturing method includes a step of providing a metal substrate having a plurality of virtual zones on its surface, using a plurality of nozzles to spray an etching solution on the surface, wherein the virtual zones include a first and a second zone, and the metal substrate has a first thickness and a second thickness respectively in an unit area of the first zone and the second zone, wherein the first thickness is greater than the second thickness; the step of using the nozzles to spray the etching solution on the surface further includes respectively using a first spraying pressure and a second spraying pressure to spray the etching solution on the first zone and the second zone, and the first spraying pressure is greater than the second spraying pressure. The invention also provides a mask manufacturing device.
Pipe welding structure
A pipe welding structure includes: a channel plate that includes a fluid channel; through-hole plates stacked on the channel plate, each of the through-hole plates having through holes that communicate with each other and forming a combined through hole; and a pipe inserted into the combined through hole and welded to one of the through-hole plates disposed farthest from the channel plate, the pipe internally including a pipe channel that connects to the fluid channel.