An aqueous composition for reducing corrosive removal of material in pickling of metallic surfaces comprising bare and/or galvanized steel. The composition includes a mixture of a compound of the formula R.sup.1O—(CH.sub.2).sub.x—C≡C—(CH.sub.2).sub.y—OR.sup.2 in which R.sup.1 and R.sup.2 are both H, and a compound of the formula R.sup.1O—(CH.sub.2).sub.x—C≡C—(CH.sub.2).sub.y—OR.sup.2 in which R.sup.1 and R.sup.2 are each, independently of one another, an HO—(CH.sub.2).sub.w— group with w≥2. X and y are each, independently of one another, from 1 to 4 in each of the two compounds of the formula R.sup.1O—(CH.sub.2).sub.x—C≡C—(CH.sub.2).sub.y—OR.sup.2. A process for pickling a metallic surface with reduced corrosive removal of material is disclosed.

An aqueous composition for reducing corrosive removal of material in pickling of metallic surfaces comprising bare and/or galvanized steel. The composition includes a mixture of a compound of the formula R.sup.1O—(CH.sub.2).sub.x—C≡C—(CH.sub.2).sub.y—OR.sup.2 in which R.sup.1 and R.sup.2 are both H, and a compound of the formula R.sup.1O—(CH.sub.2).sub.x—C≡C—(CH.sub.2).sub.y—OR.sup.2 in which R.sup.1 and R.sup.2 are each, independently of one another, an HO—(CH.sub.2).sub.w— group with w≥2. X and y are each, independently of one another, from 1 to 4 in each of the two compounds of the formula R.sup.1O—(CH.sub.2).sub.x—C≡C—(CH.sub.2).sub.y—OR.sup.2. A process for pickling a metallic surface with reduced corrosive removal of material is disclosed.

A process for anticorrosion treatment of a metallic surface, including bringing the surface into successive contact with the an alkaline or acidic cleaner composition, a first rinsing composition, optionally a second rinsing composition, an acidic conversion composition, optionally a third rinsing composition, and a composition including a (meth)acrylate- and/or epoxide-based cathodic electrophoretic coating. At least one of the compositions includes at least one compound of the formula R.sup.1O—(CH.sub.2).sub.x—Z—(CH.sub.2).sub.y—OR.sup.2. R.sup.1 and R.sup.2 are each, independently of one another, H or an HO—(CH.sub.2).sub.w— group with w≥2. X and y are each, independently of one another, from 1 to 4 and Z is an S atom or a C—C triple bond. An aqueous composition for reducing corrosive removal of material in anticorrosion treatment of metallic surfaces is disclosed.

Embodiments of the present disclosure provide a surface treatment composition and methods for using same. The composition for removing contaminants from a metallic surface, can include 3 wt % to 40 wt % of at least one bifunctional alkaline compound, 0.03 wt % to 10 wt % of at least one oxidizer comprising a metal salt, and water, where all weight percentages are based on the total weight of the composition.

Embodiments of the present disclosure provide a surface treatment composition and methods for using same. The composition for removing contaminants from a metallic surface, can include 3 wt % to 40 wt % of at least one bifunctional alkaline compound, 0.03 wt % to 10 wt % of at least one oxidizer comprising a metal salt, and water, where all weight percentages are based on the total weight of the composition.

A solution is provided comprising a strong base, a corrosion inhibitor, wherein the strong base is an alkali metal hydroxide, wherein the corrosion inhibitor is at least one of an organic acid having a-COOH functional group or an alkali metal salt one of an organic acid having a-COOH functional groups.

Embodiments of the present disclosure provide a surface treatment composition and methods for using same. The composition for removing contaminants from a metallic surface, can include 3 wt % to 40 wt % of at least one bifunctional alkaline compound, 0.03 wt % to 10 wt % of at least one oxidizer comprising a metal salt, and water, where all weight percentages are based on the total weight of the composition.

Embodiments of the present disclosure provide a surface treatment composition and methods for using same. The composition for removing contaminants from a metallic surface, can include 3 wt % to 40 wt % of at least one bifunctional alkaline compound, 0.03 wt % to 10 wt % of at least one oxidizer comprising a metal salt, and water, where all weight percentages are based on the total weight of the composition.

The present invention discloses a method and a composition for removing metal sulfide scale present on the surface of a metal, said method comprising: providing a liquid composition comprising: a chelating agent and a counterion component selected from the group consisting of: sodium gluconate; gluconic acid; tetrasodium EDTA; EDTA; propylenediaminetetraacetic acid (PDTA); nitrilotriacetic acid (NTA); N-(2-hydroxyethyl) ethylenediaminetriacetic acid (HEDTA); diethylenetriaminepentaacetic acid (DTPA); hydroxyethyliminodiacetic acid (HEIDA); cyclohexylenediaminetetraacetic acid (CDTA); diphenylaminesulfonic acid (DPAS); ethylenediaminedi(o-hydroxyphenylacetic) acid (EDDHA); glucoheptonic acid; gluconic acid; oxalic acid; malonic acid; succinic acid; glutaric acid; adipic acid; pimelic acid; suberic acid; azelaic acid; sebacic acid; phthalic acid; terephthalic acid; aconitic acid; carballylic acid; trimesic acid; isocitric acid; citric acid; L-glutamic acid-N,N-diacetic acid (GLDA); salts thereof; and mixtures thereof; and an aldehyde; and water exposing a surface contaminated with said metal sulfide scale to the liquid composition; allowing sufficient time of exposure to remove said metal sulfide scale from the contaminated surface and sequestration of the sulfur ions from solution.

The present invention discloses a method and a composition for removing metal sulfide scale present on the surface of a metal, said method comprising: providing a liquid composition comprising: a chelating agent and a counterion component selected from the group consisting of: sodium gluconate; gluconic acid; tetrasodium EDTA; EDTA; propylenediaminetetraacetic acid (PDTA); nitrilotriacetic acid (NTA); N-(2-hydroxyethyl) ethylenediaminetriacetic acid (HEDTA); diethylenetriaminepentaacetic acid (DTPA); hydroxyethyliminodiacetic acid (HEIDA); cyclohexylenediaminetetraacetic acid (CDTA); diphenylaminesulfonic acid (DPAS); ethylenediaminedi(o-hydroxyphenylacetic) acid (EDDHA); glucoheptonic acid; gluconic acid; oxalic acid; malonic acid; succinic acid; glutaric acid; adipic acid; pimelic acid; suberic acid; azelaic acid; sebacic acid; phthalic acid; terephthalic acid; aconitic acid; carballylic acid; trimesic acid; isocitric acid; citric acid; L-glutamic acid-N,N-diacetic acid (GLDA); salts thereof; and mixtures thereof; and an aldehyde; and water exposing a surface contaminated with said metal sulfide scale to the liquid composition; allowing sufficient time of exposure to remove said metal sulfide scale from the contaminated surface and sequestration of the sulfur ions from solution.