In order to provide a device and a method for treating workpieces (102), in which an optimized workpiece treatment is possible, it is proposed that a treatment station (114) comprise a treatment chamber (136) that can be flooded for workpiece treatment.

The invention relates to a method for removing residues present on a metal strip at the outlet of a cooling stage of a continuous line, the residues being formed during a cooling of said metal strip by a non-oxidizing liquid solution for the metal strip and a stripping liquid solution for the oxides present on the surface of the strip, or by a mixture of this liquid solution and a gas. The method according to the invention is characterized in that it comprises a step of reducing the residues by hydrogen.

A system for and method of removing residues, deposits, and debris from a substrate that has been marked by a chemical etching process is disclosed. The system includes one or more upper sprayers that deposit a cleaning solution to a top surface of the product as it passes beneath the one or more upper sprayers. The system further includes at least one upper brush that operates to scrub the top surface of the product after the cleaning solution has been applied thereto. The system optionally includes one or more lower sprayers and lower brushes to clean a bottom surface of the product as it is conveyed through the system. The system further includes an air knife system that assists with drying the product prior to exiting the system. The system further includes a controller that is operable to adjust various system parameters.

A system for and method of removing residues, deposits, and debris from a substrate that has been marked by a chemical etching process is disclosed. The system includes one or more upper sprayers that deposit a cleaning solution to a top surface of the product as it passes beneath the one or more upper sprayers. The system further includes at least one upper brush that operates to scrub the top surface of the product after the cleaning solution has been applied thereto. The system optionally includes one or more lower sprayers and lower brushes to clean a bottom surface of the product as it is conveyed through the system. The system further includes an air knife system that assists with drying the product prior to exiting the system. The system further includes a controller that is operable to adjust various system parameters.

A system for and method of removing residues, deposits, and debris from a substrate that has been marked by a chemical etching process is disclosed. The system includes one or more upper sprayers that deposit a cleaning solution to a top surface of the product as it passes beneath the one or more upper sprayers. The system further includes at least one upper brush that operates to scrub the top surface of the product after the cleaning solution has been applied thereto. The system optionally includes one or more lower sprayers and lower brushes to clean a bottom surface of the product as it is conveyed through the system. The system further includes an air knife system that assists with drying the product prior to exiting the system. The system further includes a controller that is operable to adjust various system parameters.

A system for and method of removing residues, deposits, and debris from a substrate that has been marked by a chemical etching process is disclosed. The system includes one or more upper sprayers that deposit a cleaning solution to a top surface of the product as it passes beneath the one or more upper sprayers. The system further includes at least one upper brush that operates to scrub the top surface of the product after the cleaning solution has been applied thereto. The system optionally includes one or more lower sprayers and lower brushes to clean a bottom surface of the product as it is conveyed through the system. The system further includes an air knife system that assists with drying the product prior to exiting the system. The system further includes a controller that is operable to adjust various system parameters.

The present invention addresses the problem of providing a flame treatment device which is capable of performing a flame treatment on a metal-based base material without requiring a preheat treatment. For the purpose of solving the above-described problem, a flame treatment device according to the present invention comprises: a first temperature measurement unit which measures the temperature of a metal-based base material before a flame treatment; a control unit which determines the combustion energy of flame on the basis of the temperature before a flame treatment, said temperature having been measured by the first temperature measurement unit, so that the surface temperature of the metal-based base material during the flame treatment is 56 C. or higher; and a flame treatment unit which performs a flame treatment on the metal-based base material on the basis of the combustion energy, which has been determined by the control unit.

The present invention addresses the problem of providing a flame treatment device which is capable of performing a flame treatment on a metal-based base material without requiring a preheat treatment. For the purpose of solving the above-described problem, a flame treatment device according to the present invention comprises: a first temperature measurement unit which measures the temperature of a metal-based base material before a flame treatment; a control unit which determines the combustion energy of flame on the basis of the temperature before a flame treatment, said temperature having been measured by the first temperature measurement unit, so that the surface temperature of the metal-based base material during the flame treatment is 56 C. or higher; and a flame treatment unit which performs a flame treatment on the metal-based base material on the basis of the combustion energy, which has been determined by the control unit.

A system for and method of removing residues, deposits, and debris from a substrate that has been marked by a chemical etching process is disclosed. The system includes one or more upper sprayers that deposit a cleaning solution to a top surface of the product as it passes beneath the one or more upper sprayers. The system further includes at least one upper brush that operates to scrub the top surface of the product after the cleaning solution has been applied thereto. The system optionally includes one or more lower sprayers and lower brushes to clean a bottom surface of the product as it is conveyed through the system. The system further includes an air knife system that assists with drying the product prior to exiting the system. The system further includes a controller that is operable to adjust various system parameters.

A system for and method of removing residues, deposits, and debris from a substrate that has been marked by a chemical etching process is disclosed. The system includes one or more upper sprayers that deposit a cleaning solution to a top surface of the product as it passes beneath the one or more upper sprayers. The system further includes at least one upper brush that operates to scrub the top surface of the product after the cleaning solution has been applied thereto. The system optionally includes one or more lower sprayers and lower brushes to clean a bottom surface of the product as it is conveyed through the system. The system further includes an air knife system that assists with drying the product prior to exiting the system. The system further includes a controller that is operable to adjust various system parameters.