C25D3/20

Roll stamp for imprint device, and manufacturing method therefor

The present invention relates to a roll stamp and a method of manufacturing the same, the roll stamp including a cylindrical metal mold including a debossed pattern formed on an outer side and a hollow portion formed on an inner side, and a dummy roller inserted into the hollow portion. Because a joining portion is not formed on the entire area of the cylindrical metal mold, a problem in which edge regions are separated does not occur. Also, due to the absence of the joining portion, it is possible to perform a patterning process continuously.

Surface-treated steel sheet and method for manufacturing surface-treated steel sheet

A surface-treated steel sheet of the present invention includes a base steel sheet and a Ni—Co—Fe alloy-plated layer on at least one surface of the base steel sheet, in which, in the alloy-plated layer, a Ni coating weight is 7.1 to 32.5 g/m.sup.2, a Co coating weight is 0.65 to 5.2 g/m.sup.2, and a total of the Ni coating weight and the Co coating weight is in a range of 9.0 to 35.0 g/m.sup.2. In an outermost layer of the alloy-plated layer, a Co concentration is in a range of 20 to 60 atom %, and a Fe concentration is in a range of 5 to 30 atom %. In the alloy-plated layer, a region having a thickness of 2 μm or more, in which a total of a Ni concentration and the Co concentration is 10 atom % or more and the Fe concentration is 5 atom % or more, is present, and the base steel sheet has a predetermined chemical composition, and a ferrite grain size number is 9.0 or more.

Surface-treated steel sheet and method for manufacturing surface-treated steel sheet

A surface-treated steel sheet of the present invention includes a base steel sheet and a Ni—Co—Fe alloy-plated layer on at least one surface of the base steel sheet, in which, in the alloy-plated layer, a Ni coating weight is 7.1 to 32.5 g/m.sup.2, a Co coating weight is 0.65 to 5.2 g/m.sup.2, and a total of the Ni coating weight and the Co coating weight is in a range of 9.0 to 35.0 g/m.sup.2. In an outermost layer of the alloy-plated layer, a Co concentration is in a range of 20 to 60 atom %, and a Fe concentration is in a range of 5 to 30 atom %. In the alloy-plated layer, a region having a thickness of 2 μm or more, in which a total of a Ni concentration and the Co concentration is 10 atom % or more and the Fe concentration is 5 atom % or more, is present, and the base steel sheet has a predetermined chemical composition, and a ferrite grain size number is 9.0 or more.

PRODUCTION OF NANOPOROUS FILMS
20230366116 · 2023-11-16 ·

A process is provided comprising submerging a substrate in an electrochemical deposit bath having at least a metal salt and saccharin. In embodiments, the film is further treated with anodization, and in other cases chemical vapor deposition. Films are also provided formed by the disclosed processes. The films are nanoporous on at least a portion of a surface of the films. Also disclosed are electronic devices having the films disclosed, including lithium-ion batteries, storage devices, supercapacitors, electrodes, semiconductors, fuel cells, and/or combinations thereof.

PRODUCTION OF NANOPOROUS FILMS
20230366116 · 2023-11-16 ·

A process is provided comprising submerging a substrate in an electrochemical deposit bath having at least a metal salt and saccharin. In embodiments, the film is further treated with anodization, and in other cases chemical vapor deposition. Films are also provided formed by the disclosed processes. The films are nanoporous on at least a portion of a surface of the films. Also disclosed are electronic devices having the films disclosed, including lithium-ion batteries, storage devices, supercapacitors, electrodes, semiconductors, fuel cells, and/or combinations thereof.

NANOSTRUCTURE-BASED ATOMIC SCALE ELECTROCHEMICAL REACTION CATALYSIS
20230357939 · 2023-11-09 ·

An electrode for a reaction in a chemical cell includes a substrate having a surface, an array of nanostructures supported by the substrate and extending outward from the surface of the substrate, each nanostructure of the array of nanostructures having a semiconductor composition, and a catalyst arrangement disposed along each nanostructure of the array of nanostructures, the catalyst arrangement comprising a metal-based catalyst for the reaction in the chemical cell. The semiconductor composition of each nanostructure of the array of nanostructures establishes sites at which the metal-based catalyst is anchored to the nanostructure. The array of nanostructures and the catalyst arrangement are configured such that the metal-based catalyst is distributed along sidewalls of each nanostructure of the array of nanostructures at an atomic scale.

GALVANIZED STEEL SHEET, ELECTRODEPOSITION-COATED STEEL SHEET, AUTOMOTIVE PART, METHOD OF PRODUCING ELECTRODEPOSITION-COATED STEEL SHEET, AND METHOD OF PRODUCING GALVANIZED STEEL SHEET

To provide a steel sheet with excellent resistance to cracking in resistance welding at a welded portion. Disclosed is a galvanized steel sheet including: a Si-containing cold-rolled steel sheet containing Si in an amount of 0.1 mass % or more and 3.0 mass % or less; an Fe-based electroplating layer formed on at least one surface of the Si-containing cold-rolled steel sheet with a coating weight per surface of 5.0 g/m.sup.2 or more; and a galvanized layer formed on the Fe-based electroplating layer, in which in an intensity profile measured by glow discharge optical emission spectrometry, I.sub.Si,Fe/I.sub.Si,bulk is 0.50 or more, and an average value of C concentration in a region ranging from 10 μm to 20 μm from an interface between the galvanized layer and the Fe-based electroplating layer towards the Fe-based electroplating layer is 0.10 mass % or less.

GALVANIZED STEEL SHEET, ELECTRODEPOSITION-COATED STEEL SHEET, AUTOMOTIVE PART, METHOD OF PRODUCING ELECTRODEPOSITION-COATED STEEL SHEET, AND METHOD OF PRODUCING GALVANIZED STEEL SHEET

To provide a steel sheet with excellent resistance to cracking in resistance welding at a welded portion. Disclosed is a galvanized steel sheet including: a Si-containing cold-rolled steel sheet containing Si in an amount of 0.1 mass % or more and 3.0 mass % or less; an Fe-based electroplating layer formed on at least one surface of the Si-containing cold-rolled steel sheet with a coating weight per surface of 5.0 g/m.sup.2 or more; and a galvanized layer formed on the Fe-based electroplating layer, in which in an intensity profile measured by glow discharge optical emission spectrometry, I.sub.Si,Fe/I.sub.Si,bulk is 0.50 or more, and an average value of C concentration in a region ranging from 10 μm to 20 μm from an interface between the galvanized layer and the Fe-based electroplating layer towards the Fe-based electroplating layer is 0.10 mass % or less.

Reactor for layer deposition by controllable anode array

An apparatus and method for electrochemically depositing a layer using a reactor configured to contain an electrolyte solution with an anode array containing a plurality of independently electrically controllable anodes arranged in a two-dimensional array, a cathode, an addressing circuit for receiving a signal containing anode address data, and for outputting a signal causing an anode array pattern; in communication with the addressing circuit, the current controller and the anode array, the second controller operable to communicate with the current controller to command the flow of current to each anode in the anode array thereby causing an electrochemical reaction at the cathode to deposit a layer corresponding to the anode array pattern signal received from the addressing circuit.

Reactor for layer deposition by controllable anode array

An apparatus and method for electrochemically depositing a layer using a reactor configured to contain an electrolyte solution with an anode array containing a plurality of independently electrically controllable anodes arranged in a two-dimensional array, a cathode, an addressing circuit for receiving a signal containing anode address data, and for outputting a signal causing an anode array pattern; in communication with the addressing circuit, the current controller and the anode array, the second controller operable to communicate with the current controller to command the flow of current to each anode in the anode array thereby causing an electrochemical reaction at the cathode to deposit a layer corresponding to the anode array pattern signal received from the addressing circuit.