Electroless plating is accomplished by forming a metal salt and a polymer solution as a binder into a solid electrolyte block and depositing metal on the surface by rubbing or brushing the solid electrolyte block onto a surface with minimal or no water and without an electric potential/power source. The solid electrolyte block is also conformable/moldable and can be used to deposit metal on to both conductive and nonconductive surface through electroless deposition process.

Electroless plating is accomplished by forming a metal salt and a polymer solution as a binder into a solid electrolyte block and depositing metal on the surface by rubbing or brushing the solid electrolyte block onto a surface with minimal or no water and without an electric potential/power source. The solid electrolyte block is also conformable/moldable and can be used to deposit metal on to both conductive and nonconductive surface through electroless deposition process.

An anodising apparatus for selectively anodizing at least a portion of a surface of a component can include a conformable wicking element configured to absorb a fluid, the conformable wicking element being conformable to at least the portion of the surface of the component, wherein, upon bringing the component into contact with the conformable wicking element, the fluid completes an electric circuit between the component and a conductive element, the anodising apparatus being configured to grow an anodised layer on the portion of the surface of the component that is in contact with the conformable wicking element when an electric current is supplied to the electric circuit between the conductive element and the component.

An anodising apparatus for selectively anodizing at least a portion of a surface of a component can include a conformable wicking element configured to absorb a fluid, the conformable wicking element being conformable to at least the portion of the surface of the component, wherein, upon bringing the component into contact with the conformable wicking element, the fluid completes an electric circuit between the component and a conductive element, the anodising apparatus being configured to grow an anodised layer on the portion of the surface of the component that is in contact with the conformable wicking element when an electric current is supplied to the electric circuit between the conductive element and the component.

A new system has a plurality of modular segments flexibly attached to one other and a source of electrical power and plating and coating solutions at the rear of the plurality of modular segments. The plurality of modular segments include a drive stage configured to push the plurality of modular segments along a surface, a plating stage configured to apply the plating solution to the surface under a pre-set operating current density to deposit metal or metal alloy onto the surface, a surface treatment application stage configured to apply the coating solution to the surface, and a curing stage configured to cure the coating solution to form a final coating on the surface that is resistant to corrosion, chemical attacks and chemical buildup.

A new system has a plurality of modular segments flexibly attached to one other and a source of electrical power and plating and coating solutions at the rear of the plurality of modular segments. The plurality of modular segments include a drive stage configured to push the plurality of modular segments along a surface, a plating stage configured to apply the plating solution to the surface under a pre-set operating current density to deposit metal or metal alloy onto the surface, a surface treatment application stage configured to apply the coating solution to the surface, and a curing stage configured to cure the coating solution to form a final coating on the surface that is resistant to corrosion, chemical attacks and chemical buildup.

The presently disclosed apparatus and method offer the capability to electroplate pure metals or alloys onto substrates, having no current collectors or being connected to the power supply by a low conductivity seed layer. Thus, the disclosed system enables pure metal or alloy deposition on various substrates, including flexible electronic circuits, wafers for IC processing, and discrete electronic devices in surface finishing applications.

The presently disclosed apparatus and method offer the capability to electroplate pure metals or alloys onto substrates, having no current collectors or being connected to the power supply by a low conductivity seed layer. Thus, the disclosed system enables pure metal or alloy deposition on various substrates, including flexible electronic circuits, wafers for IC processing, and discrete electronic devices in surface finishing applications.

A coating forming device for forming a metal coating on a surface of a substrate includes: an anode; a power supply; and a solid electrolyte membrane disposed between the anode and the substrate and contains metal ions. The solid electrolyte membrane includes: a contact surface that is a region contacting a coating-forming region where the metal coating is formed; and a concave portion recessed relative to the contact surface such that, when the contact surface contacts the coating-forming region, the solid electrolyte membrane is not in contact with a portion of the surface of the substrate excluding the coating-forming region. The metal ions are reduced to form the metal coating on the coating-forming region by the power supply applying a voltage between the anode and the substrate.

A coating forming device for forming a metal coating on a surface of a substrate includes: an anode; a power supply; and a solid electrolyte membrane disposed between the anode and the substrate and contains metal ions. The solid electrolyte membrane includes: a contact surface that is a region contacting a coating-forming region where the metal coating is formed; and a concave portion recessed relative to the contact surface such that, when the contact surface contacts the coating-forming region, the solid electrolyte membrane is not in contact with a portion of the surface of the substrate excluding the coating-forming region. The metal ions are reduced to form the metal coating on the coating-forming region by the power supply applying a voltage between the anode and the substrate.