A single-cell-based electromechanical method for cancerous state detection including the steps of preparing a suspension of individually suspended biological cells, extracting a single cell from the suspension, holding the extracted single cell from the suspension, measuring a first electrical response of the held single cell, step-wised mechanical aspirating the held single cell to form a mechanically deformed cell, and measuring an electrical response of the held single cell after each step of mechanical aspirating. The cancerous state of the single cell is determined based on the changes in the measured electrical responses.

A method for fabricating a microelectromechanical system device. Submerging a microelectromechanical system device in water. The microelectromechanical system devices include a sacrificial layer deposited on the surface of a substrate between the portion of a structural layer to be freed for movement and a base. Anodically etching the sacrificial layer from the microelectromechanical device to free the portion of the structural layer for movement. A system comprising a solution of water, a microelectromechanical system device including a sacrificial layer of chromium deposited on the surface of a substrate between a portion of a structural layer and a base. The microelectromechanical system device is submerged in the solution of water. An electrode is submerged in the water. The electrode provides a negative bias. A voltage source provides a positive bias to the sacrificial layer of chromium, anodically etching the sacrificial layer of chromium and freeing the portion of the structural layer.

A method for fabricating a microelectromechanical system device. Submerging a microelectromechanical system device in water. The microelectromechanical system devices include a sacrificial layer deposited on the surface of a substrate between the portion of a structural layer to be freed for movement and a base. Anodically etching the sacrificial layer from the microelectromechanical device to free the portion of the structural layer for movement. A system comprising a solution of water, a microelectromechanical system device including a sacrificial layer of chromium deposited on the surface of a substrate between a portion of a structural layer and a base. The microelectromechanical system device is submerged in the solution of water. An electrode is submerged in the water. The electrode provides a negative bias. A voltage source provides a positive bias to the sacrificial layer of chromium, anodically etching the sacrificial layer of chromium and freeing the portion of the structural layer.

A method for fabricating a microelectromechanical system device. Submerging a microelectromechanical system device in water. The microelectromechanical system devices include a sacrificial layer deposited on the surface of a substrate between the portion of a structural layer to be freed for movement and a base. Anodically etching the sacrificial layer from the microelectromechanical device to free the portion of the structural layer for movement. A system comprising a solution of water, a microelectromechanical system device including a sacrificial layer of chromium deposited on the surface of a substrate between a portion of a structural layer and a base. The microelectromechanical system device is submerged in the solution of water. An electrode is submerged in the water. The electrode provides a negative bias. A voltage source provides a positive bias to the sacrificial layer of chromium, anodically etching the sacrificial layer of chromium and freeing the portion of the structural layer.

A method for fabricating a microelectromechanical system device. Submerging a microelectromechanical system device in water. The microelectromechanical system devices include a sacrificial layer deposited on the surface of a substrate between the portion of a structural layer to be freed for movement and a base. Anodically etching the sacrificial layer from the microelectromechanical device to free the portion of the structural layer for movement. A system comprising a solution of water, a microelectromechanical system device including a sacrificial layer of chromium deposited on the surface of a substrate between a portion of a structural layer and a base. The microelectromechanical system device is submerged in the solution of water. An electrode is submerged in the water. The electrode provides a negative bias. A voltage source provides a positive bias to the sacrificial layer of chromium, anodically etching the sacrificial layer of chromium and freeing the portion of the structural layer.

A method for producing round stock (10) which is provided with at least one inscription and/or marking (16), at least the surface (12) of the round stock (10) consisting of a metallic material, in particular of chromium or steel, for example of hardened steel, chromium-plated steel or stainless steel. In order to improve this method such that disadvantages and shortcomings are avoided, the method includes the following steps: placing on the surface (12) at least one cover (20) which is adapted to the shape of the surface (12) and in particular has the inscription and/or marking (16), such that the region to be provided with the inscription and/or marking (16) is not covered by the cover (20),exposing the round stock (10) to a first electrolyte (30) together with the cover (20), material being removed from the surface (12) by said electrolyte in the region to be provided with the inscription and/or the marking (16) while producing depressions (14), andexposing the round stock (10) together with the cover (20) and the depressions (14) not covered by the cover (20) to a second electrolyte (32) by which the depressions (14) are filled to produce the inscription and/or marking (16) which differs from the surface (12) optically, in particular with respect to color. The present invention also relates to round stock (10) which is manufactured from a metallic material, with the round stock being provided with a correspondingly produced inscription and/or marking (16).

A method for producing round stock (10) which is provided with at least one inscription and/or marking (16), at least the surface (12) of the round stock (10) consisting of a metallic material, in particular of chromium or steel, for example of hardened steel, chromium-plated steel or stainless steel. In order to improve this method such that disadvantages and shortcomings are avoided, the method includes the following steps: placing on the surface (12) at least one cover (20) which is adapted to the shape of the surface (12) and in particular has the inscription and/or marking (16), such that the region to be provided with the inscription and/or marking (16) is not covered by the cover (20),exposing the round stock (10) to a first electrolyte (30) together with the cover (20), material being removed from the surface (12) by said electrolyte in the region to be provided with the inscription and/or the marking (16) while producing depressions (14), andexposing the round stock (10) together with the cover (20) and the depressions (14) not covered by the cover (20) to a second electrolyte (32) by which the depressions (14) are filled to produce the inscription and/or marking (16) which differs from the surface (12) optically, in particular with respect to color. The present invention also relates to round stock (10) which is manufactured from a metallic material, with the round stock being provided with a correspondingly produced inscription and/or marking (16).

Method for the surface treatment of a dental implant or a prosthetic component made out of titanium or a titanium alloy, which enables an outer surface of the implant or the prosthetic component to be obtained with a notable capacity to prevent bacterial adhesion and offer a better aesthetic finish. This method comprises the steps of providing an outer surface of the implant or the prosthetic component with a surface roughness, and applying an anodizing treatment on the implant or the prosthetic component, smoothing the roughness and generating nanopores on this outer surface of the implant or the prosthetic component. The invention also relates to a dental implant or a prosthetic component made out of titanium or a titanium alloy, which comprises an outer surface that is rough and has nanopores.

Method for the surface treatment of a dental implant or a prosthetic component made out of titanium or a titanium alloy, which enables an outer surface of the implant or the prosthetic component to be obtained with a notable capacity to prevent bacterial adhesion and offer a better aesthetic finish. This method comprises the steps of providing an outer surface of the implant or the prosthetic component with a surface roughness, and applying an anodizing treatment on the implant or the prosthetic component, smoothing the roughness and generating nanopores on this outer surface of the implant or the prosthetic component. The invention also relates to a dental implant or a prosthetic component made out of titanium or a titanium alloy, which comprises an outer surface that is rough and has nanopores.

Disclosed herein are methods and systems for thinning a transition metal dichalcogenide. The methods comprise: illuminating the transition metal dichalcogenide material with electromagnetic radiation while applying a positive potential between the transition metal dichalcogenide material and a gate electrode; wherein the electromagnetic radiation has an energy that is less than the energy of the direct band gap and greater than or equal to the energy of the indirect band gap of the transition metal dichalcogenide material; thereby: promoting electrons from the valence band to the conduction band of the indirect band gap of the transition metal dichalcogenide material and decreasing the thickness of the transition metal dichalcogenide via electrochemical degradation. The methods disclosed herein are self-limiting. Also disclosed herein are patterned transition metal dichalcogenide materials and monolayers of transition metal dichalcogenide materials made using the methods disclosed herein, and methods of use thereof.