A method of manufacturing a grain oriented electrical steel sheet includes subjecting a steel slab to a rolling process including cold rolling to obtain a steel sheet with a final sheet thickness, the steel slab containing by mass % C: 0.01% to 0.20%, Si: 2.0% to 5.0%, Mn: 0.03% to 0.20%, sol. Al: 0.010% to 0.05%, N: 0.0010% to 0.020%, at least one element selected from S and Se in a total of 0.005% to 0.040%, and the balance including Fe and incidental impurities; forming, by a chemical process, a linear groove extending in a direction forming an angle of 45° or less with a direction orthogonal to a rolling direction of the steel sheet; subjecting the steel sheet to decarburization annealing; applying an annealing separator thereon mainly composed of MgO; and subjecting the steel sheet to final annealing to manufacture a grain oriented electrical steel sheet.

A non-uniform initial metal film is non-uniformly deplated to provide a more uniform metal film on a substrate. Electrochemical deplating may be performed by placing the substrate in a deplating bath formulated specifically for deplating, rather than for plating. The deplating bath may have a throwing power of 0.3 or less; or a bath conductivity of 1 mS/cm to 250 mS/cm. Reverse electrical current conducted through the deplating bath non-uniformly. electro-etches or deplates the metal film.

Nanopore arrays are fabricated by controlled breakdown in solid-state membranes integrated within polydimethylsiloxane (PDMS) microfluidic devices. This technique enables the scalable production of independently addressable nanopores. By confining the electric field within the microfluidic architecture, nanopore fabrication is precisely localized and electrical noise is significantly reduced during sensing.

Nanopore arrays are fabricated by controlled breakdown in solid-state membranes integrated within polydimethylsiloxane (PDMS) microfluidic devices. This technique enables the scalable production of independently addressable nanopores. By confining the electric field within the microfluidic architecture, nanopore fabrication is precisely localized and electrical noise is significantly reduced during sensing.

A method for forming holes to form holes in a surface of a metal part includes: putting the metal part into a first solution as an anode; applying a first voltage on the metal part to form the first holes in a surface of the metal part; and cleaning and drying the metal part with the first holes. The first solution comprises a first organic solvent, chloride, and a phosphoric acid compound. The disclosure also provides a metal product and a metal composite.

Compositions and methods for etching a nanoscale geometry on a metal or metal alloy surface are disclosed. Such surfaces, when included on an implantable medical device, enhance healing after surgery. When included on a bone contacting medical implant, the nanoscale geometry may enhance osseointegration. When included on a tissue contacting device, the nanoscale geometry may enhance endothelial cell attachment, proliferation, and restoration of a healthy endothelial surface.

A method of manufacturing a semiconductor wafer having a roughened metallization layer surface is described. The method includes immersing the semiconductor wafer in an electrolytic bath. Gas bubbles are generated in the electrolytic bath. A surface of a metallization layer on the semiconductor wafer is electrochemically roughened in the presence of the gas bubbles by applying a reversing voltage between the metallization layer and an electrode of the electrolytic bath.

Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and optionally an amine, one or more chelating agents, and certain dissolved metals, such as component metals of the metal or alloy to be etched and optionally iron. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.

The apparatus for making a nanopore in a membrane generally has an electrode configured to connect to one of two opposing surfaces of the membrane; a conductive tip configured to contact a location of the other one of the two opposing surfaces of the membrane; and a voltage source electrically connected between the electrode and the conductive tip and operable to generate an electric potential across the membrane, the electric potential locally removing material of the membrane at the location to make the nanopore.

The apparatus for making a nanopore in a membrane generally has an electrode configured to connect to one of two opposing surfaces of the membrane; a conductive tip configured to contact a location of the other one of the two opposing surfaces of the membrane; and a voltage source electrically connected between the electrode and the conductive tip and operable to generate an electric potential across the membrane, the electric potential locally removing material of the membrane at the location to make the nanopore.