An apparatus for producing trifluoramine oxide includes: a reactor in which a photochemical reaction for generating trifluoramine oxide by using vapor-phase FNO and F.sub.2 as starting materials is performed; an ultraviolet irradiation means for irradiating ultraviolet rays having a peak wavelength in a wavelength band of 300 nm to 400 nm into the reactor; and a separation and collection means which is in vapor communication with the reactor, separating and collecting generated trifluoramine oxide from reaction products generated in the reactor. The ultraviolet rays are such that an intensity of rays having a wavelength band of less than 300 nm is less than 5% of an intensity of rays having a wavelength band of 300 nm to 400 nm.

An apparatus for producing trifluoramine oxide includes: a reactor in which a photochemical reaction for generating trifluoramine oxide by using vapor-phase FNO and F.sub.2 as starting materials is performed; an ultraviolet irradiation means for irradiating ultraviolet rays having a peak wavelength in a wavelength band of 300 nm to 400 nm into the reactor; and a separation and collection means which is in vapor communication with the reactor, separating and collecting generated trifluoramine oxide from reaction products generated in the reactor. The ultraviolet rays are such that an intensity of rays having a wavelength band of less than 300 nm is less than 5% of an intensity of rays having a wavelength band of 300 nm to 400 nm.

There is provided a method for storing a fluorine-containing nitrogen compound that prevents the progress of decomposition of the fluorine-containing nitrogen compound during storage. The fluorine-containing nitrogen compound, which is at least one type among nitrosyl fluoride, nitroyl fluoride, and trifluoroamine-N-oxide, contains or does not contain at least one type among manganese, cobalt, nickel, and silicon as metal impurities. When any of the foregoing is contained, the fluorine-containing nitrogen compound is stored in a container with the total concentration of the manganese, the cobalt, the nickel, and the silicon set to 1000 ppb by mass or less.

There is provided a method for storing a fluorine-containing nitrogen compound that prevents the progress of decomposition of the fluorine-containing nitrogen compound during storage. The fluorine-containing nitrogen compound, which is at least one type among nitrosyl fluoride, nitroyl fluoride, and trifluoroamine-N-oxide, contains or does not contain at least one type among manganese, cobalt, nickel, and silicon as metal impurities. When any of the foregoing is contained, the fluorine-containing nitrogen compound is stored in a container with the total concentration of the manganese, the cobalt, the nickel, and the silicon set to 1000 ppb by mass or less.

There is provided a method for storing a fluorine-containing nitrogen compound that prevents the progress of a reaction of the fluorine-containing nitrogen compound during storage. A fluorine-containing nitrogen compound containing nitrosyl fluoride and nitroyl fluoride contains or does not contain at least one type among sodium, potassium, magnesium, and calcium as metal impurities. When any of the foregoing is contained, the fluorine-containing nitrogen compound is stored in a container with the total concentration of the sodium, the potassium, the magnesium, and the calcium set to 1000 ppb by mass or less.

There is provided a method for producing trifluoroamine oxide. The method includes a step of preparing an intermediate product by simultaneously providing and reacting nitrogen trifluoride and nitrous oxide under the presence of a SbF.sub.5 reaction activator; and a step of producing trifluoroamine oxide by reacting the intermediate product with potassium fluoride. The step of reacting the intermediate product with potassium fluoride is performed under atmospheric pressure and room temperature.