Patent classifications
C01B33/10773
Process and use of amino-functional resins for dismutating halosilanes and for removing extraneous metals
The invention relates to a process for dismutating at least one halosilane and reducing the content of extraneous metal and/or a compound containing extraneous metal in the at least one halosilane and in the at least one silane obtained, by contacting at least one halosilane of the general formula I, H.sub.nSiCl.sub.m (I), where n and m are integers and n=1, 2 or 3 and m=1, 2 or 3 and n+m=4, with a particulate, organic, amino-functional resin to obtain at least one silane of the general formula II, H.sub.aSiCl.sub.b (II), where a and b are integers and a=0, 2, 3 or 4 and b=0, 1, 2 or 4 where a+b=4, in one step, in which the content of extraneous metal and/or compounds containing extraneous metal has been reduced compared to the halosilane of the formula I. The invention further provides for the use of this resin for dismutating halosilanes and as an absorbent of extraneous metals or compounds containing extraneous metal in a process for preparing monosilane.
Neutral complex of cyclic silane, manufacturing method therefor, and method for manufacturing cyclic hydrogenated silane or cyclic organic silane
A neutral complex of a cyclic silane characterized in being represented by the general formula [Y].sub.1[Si.sub.mZ.sub.2m-aH.sub.a]. (In the formula: Y is at least one kind of coordination compound selected from a group consisting of (1) compounds represented as X.sup.1R.sup.1.sub.n. (when X.sup.1 is P, PO or N, n=3 and each R.sup.1 represents a substituted or unsubstituted alkyl group or aryl group and R.sup.1s are the same or different; when X.sup.1 is S, SO or O, n=2 and each R.sup.1 represents the same group as described above and R.sup.1s are the same or different; and the number of amino groups in X.sup.1R.sup.1.sub.n is 0 or 1), and (2) at least one heterocyclic compound selected from the group consisting of substituted or unsubstituted N, O, S or P containing heterocyclic compounds that have an unshared electron pair in the ring (the number of amino groups in the heterocyclic compound is 0 or 1), each Z represents a halogen atom of any of Cl, Br, I and F and Zs are the same or different, l is 1 or 2, m is 3 to 8, and a is 0 to m.
Process For The Cleavage Of Silicon-Silicon Bonds And/Or Silicon-Chlorine Bonds In Mono-, Poly- And/Or Oligosilanes
The invention relates to a method for cleaving silicon-silicon bindings and/or silicon-chlorine bindings in monosilanes, polysilanes, and/or oligosilanes. According to the invention, the monosilane, polysilane, and/or oligosilane is dissolved or suspended in an ether or in an ether-hydrochloric acid solution. Said method is used for example for preparing halogenated oligosilanes from halogenated polysilanes and for preparing siloxanes from organochlorosilanes and chlorinated monosilanes. Said method is particularly simple to carry out and as a result is economical.
PROCESS FOR THE PREPARATION OF PURE OCTACHLOROTRISILANES AND DECACHLOROTETRASILANES
The invention relates to a process for producing trimeric and/or quaternary silicon compounds or trimeric and/or quaternary germanium compounds, where a mixture of silicon compounds or a mixture of germanium compounds is exposed to a nonthermal plasma, and the resulting phase is subjected at least once to a vacuum rectification and filtration.
Synthesis of 1,1,1-trichlorodisilane
A method of making a trihalodisilane, the method comprising: combining a reductive effective amount of an alkylaluminum hydride, a halodisilane comprising at least 4 halogen atoms, and a solvent at a temperature <80 C. and reducing the halodisilane to form a reaction product mixture comprising a trihalodisilane and an alkylaluminum halide.
METHOD OF PREPARING IODOSILANES AND COMPOSITIONS THEREFROM
Provided are complexes useful in the conversion of chloro- and bromo-silanes to highly desired iodosilanes such as H.sub.2SiI.sub.2 and HSiI.sub.3, via a halide exchange reaction. The species which mediates this reaction is an iodide reactant comprising aluminum.
METHOD FOR PRODUCING HALOTRISILANE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME
A halotrisilane preparation method may include providing a reactant that contains halotrisilane including M halogen atoms (where, M may be a natural number from 2 to 8), reducing the halotrisilane in the reactant by using a mixed reducing agent that includes a first reducing agent represented by Formula 1-1 and a second reducing agent represented by Formula 2-1, and obtaining a product that contains the reduced halotrisilane that includes N halogen atoms, where N may be a natural number from 1 to 7 and where N<M.
In Formula 1-1 above, R.sub.A may represent an alkyl group, a and b each may be either 1 or 2, and a+b=3.
In Formula 2-1 above, R.sub.S may represent an alkyl group or an aryl group, p and q each independently may be a natural number from 1 to 3, and p+q=4.