One aspect relates to a process for the preparation of a quartz glass body. The process includes providing a silicon dioxide granulate I prepared from a pyrogenically produced silicon dioxide powder, treating the silicon dioxide granulate I with a reactant at a temperature in a range from 1000 to 1300° C., and making a glass melt out of the silicon dioxide granulate. A quartz glass body is made out of at least a part of the glass melt. Furthermore, one aspect relates to a quartz glass body obtainable by this process. Furthermore, one aspect relates to a light guide, an illuminant, and a formed body, each of which is obtainable by further processing of the quartz glass body. One aspect additionally relates to a process for the preparation of a silicon dioxide granulate II.

A Si-containing film forming composition comprising a catalyst and/or a polysilane and a N—H free, C-free, and Si-rich perhydropolysilazane having a molecular weight ranging from approximately 332 dalton to approximately 100,000 dalton and comprising N—H free repeating units having the formula [—N(SiH3)x(SiH2-)y], wherein x=0, 1, or 2 and y=0, 1, or 2 with x+y=2; and x=0, 1 or 2 and y=1, 2, or 3 with x+y=3. Also disclosed are synthesis methods and applications for using the same.

A method for depositing a silicon-containing film, the method comprising: placing a substrate comprising at least one surface feature into a flowable CVD reactor which is at a temperature of from about −20° C. to about 100° C.; increasing pressure in the reactor to at least 10 torr; and introducing into the reactor at least one silicon-containing compound having at least one acetoxy group to at least partially react the at least one silicon-containing compound to form a flowable liquid oligomer wherein the flowable liquid oligomer forms a silicon oxide coating on the substrate and at least partially fills at least a portion of the at least one surface feature. Once cured, the silicon oxide coating has a low k and excellent mechanical properties.

An asbestos waste neutralization device, that includes an acid tank and a vat containing a diluted acid solution, in which waste containing asbestos is dipped, the diluted acid solution neutralizing the waste containing asbestos during a neutralization reaction. The device further includes a filtration unit to separate, at the end of the neutralization reaction, solid inert waste from a liquid phase of the acid solution, and a regeneration unit for the liquid phase of the acid solution, which adjusts the hydrogen potential of the liquid phase of the acid solution by adding concentrated acid contained in the acid tank. In addition, the device includes an attenuation sensor for regenerated liquid phase of the acid solution from the regeneration unit, and a selective precipitation unit for the regenerated liquid phase of the acid solution, depending on the degree of attenuation the attenuation sensor senses.

This invention relates to anti-microbial active particles, compositions and uses thereof for inhibiting bacterial growth on surfaces or devices. This invention further discloses methods of making such anti-microbial active particles.

Disclosed herein are chlorodisazanes; silicon-heteroatom compounds synthesized therefrom; devices containing the silicon-heteroatom compounds; methods of making the chlorodisilazanes, the silicon-heteroatom compounds, and the devices; and uses of the chlorodisilazanes, silicon-heteroatom compounds, and devices.

An object of the present invention is to provide a metal oxide particle having a surface modified with a quaternary ammonium group, and a method for producing the particle. The present invention relates to a metal oxide particle having a surface modified with a silyl group and having an aggregation ratio (average particle size measured by dynamic light scattering/average diameter of primary particles measured in an SEM image) of 5.0 or less, the silyl group being at least one group selected from the group consisting of a silyl group represented by general formula (1): —Si(X).sub.n-[L-CR.sup.1(OH)—C(R.sup.2).sub.2-A].sub.3-n (1), wherein X is the same or different, and each represents a hydroxy group or the like; n is 0, 1, or 2; L is a linkage group; R.sup.1 is a hydrogen atom or the like; R.sup.2 is the same or different, and each represents a hydrogen atom or the like; and A is a quaternary ammonium group, and a silyl group represented by general formula (2):

##STR00001##

wherein X′ is the same or different, and each represents a hydroxy group or the like; n′ is 0, 1, or 2; L′ is a linkage group; and A′ is a quaternary ammonium group.

A 1,1,1-tris(organoamino)disilane compound and a method of preparing the 1,1,1-tris(organoamino)disilane compound are disclosed. The method comprises aminating a 1,1,1-trihalodisilane with an aminating agent comprising an organoamine compound to give a reaction product comprising the 1,1,1-tris(organoamino)disilane compound, thereby preparing the 1,1,1-tris(organoamino)disilane compound. A film-forming composition is also disclosed. The film-forming composition comprises the 1,1,1-tris(organoamino)disilane compound. A film formed with the film-forming composition, and a method of forming the film, are also disclosed. The method of forming the film comprises subjecting the film-forming composition comprising the 1,1,1-tris(organoamino)disilane compound to a deposition condition in the presence of a substrate, thereby forming the film on the substrate.

Embodiments of the invention include silica fiber compositions useful for treatment of animal wounds and tissue, as well as for other applications in industry. The fiber compositions may be formed via electrospinning of a sol gel produced with a silicon alkoxide reagent, such as tetraethyl ortho silicate, alcohol solvent, and an acid catalyst.

A 1,1,1-tris(organoamino)disilane compound and a method of preparing the 1,1,1-tris(organoamino)disilane compound are disclosed. The method comprises aminating a 1,1,1-trihalodisilane with an aminating agent comprising an organoamine compound to give a reaction product comprising the 1,1,1-tris(organoamino)disilane compound, thereby preparing the 1,1,1-tris(organoamino)disilane compound. A film-forming composition is also disclosed. The film-forming composition comprises the 1,1,1-tris(organoamino)disilane compound. A film formed with the film-forming composition, and a method of forming the film, are also disclosed. The method of forming the film comprises subjecting the film-forming composition comprising the 1,1,1-tris(organoamino)disilane compound to a deposition condition in the presence of a substrate, thereby forming the film on the substrate.