A method of preparing an adsorbent for removing siloxane, in which the method includes mixing a silica particle and an OH compound to bond OH functional groups to the silica particle; measuring percentage by weight of OH bonded to the silica particle; calculating a bonding number and spacing of the OH functional groups by the percentage by weight of OH bonded to the silica particle; performing an evaluation of an adsorption rate and desorption rate of the silica particle to which the OH functional groups, of which the bonding number and spacing are calculated, are bonded; and adjusting the bonding number of the OH functional groups in the silica particle according to the evaluation.

Described herein are compositions and methods for forming silicon oxide films. In one aspect, the film is deposited from at least one silicon precursor compound, wherein the at least one silicon precursor compound is selected from the following Formulae A and B: ##STR00001##
as defined herein.

The present invention relates to a silicon dioxide composite particle with far-infrared radioactivity, which is formed by the hydrolysis, condensation and polymerization of an organic silane precursor having the structure of the formula (I) with a tetra-alkoxysilane. The high stability of organic silane precursor compounds and the low biotoxicity of silicon dioxide composite particles make the present far-infrared radioactive silicon dioxide composite particles of great potential for extensive use in related bio-products.

A-R.sup.1Si(OR.sup.2).sub.3 Formula (I)

Embodiments of the invention include silica fiber compositions useful for treatment of animal wounds and tissue, as well as for other applications in industry. The fiber compositions may be formed via electrospinning of a sol gel produced with a silicon alkoxide reagent, such as tetraethyl ortho silicate, alcohol solvent, and an acid catalyst.

Porous amorphous silica can be obtained from siliceous plant matter containing non-siliceous inorganic substances. The siliceous plant matter is soaked in an aqueous solution which includes a chelating agent. The chelating agent is present in an amount which helps to extract at least some of the non-siliceous inorganic matter. The aqueous solution is then separated from the siliceous plant matter. Beneficial properties are imparted to the siliceous plant matter by controlling the amount of at least one preselected non-siliceous inorganic substance in the siliceous plant matter. At the end of the process, the siliceous plant matter is heat treated in the presence of oxygen at a temperature to produce the resulting amorphous silica having the beneficial properties.

A method for depositing a silicon-containing film, the method comprising: placing a substrate comprising at least one surface feature into a flowable CVD reactor which is at a temperature of from about 20 C. to about 400 C.; introducing into the reactor at least one silicon-containing compound having at least one acetoxy group to at least partially react the at least one silicon-containing compound to form a flowable liquid oligomer wherein the flowable liquid oligomer forms a silicon oxide coating on the substrate and at least partially fills at least a portion of the at least one surface feature. Once cured, the silicon oxide coating has a low k and excellent mechanical properties.

Described herein are compositions and methods for forming silicon oxide films. In one aspect, the film is deposited from at least one silicon precursor compound, wherein the at least one silicon precursor compound is selected from the following Formulae A and B:

##STR00001##

as defined herein.

A method is presented for producing hollow microspheres of metal oxides (HMOMS) and/or hollow metal silicates microspheres (HMSMS) in a transforming solution. The transforming solution contains an atom M, or an M-ion, or a radical containing M. M in the transforming solution has the thermodynamic ability to replace silicon atoms in hollow silica microspheres (HSMS) and/or hollow glass microspheres (HGMS). The maximum temperature for transformation is set by the chemical physical properties of the transforming solution, and the viscosity of the silica in the walls of the HSMS and/or the glass in the walls of the HGMS. Viscosity, of enough magnitude, helps retain the desired shape of the hollow sphere as it is transformed to HMOMS and/or HMSMS. Non-spherical shapes can be produced by increasing the transformation temperature whereby the viscosity of the walls of the HSMS and/or the HGMS is reduced. Transformation can take place at a single temperature or at several temperatures, each temperature for a separate hold time. Methods are presented for: 1. production of micro composite castings and continuous production of sheets of micro composites, both consisting of hollow spheres in a matrix, 2. harvesting of HMOMS and HMSMS, and 3. specialty castings for anisotropic properties using 3-dimensional printing.

A method for chemical processing of sewage sludge ash comprises dissolving a start material, emanating from sewage sludge ash, in an acid comprising hydrochloric acid. The start material comprising at least silicon and iron compounds. Undissolved residues are separated, whereby a leachate remains. The amount of colloidal silica in the dissolved sewage sludge ash is controlled. At least one of iron and phosphorus is extracted from the leachate by liquid-liquid extraction with an organic solvent. At least a part of a raffinate at least partly depleted in at least one of iron and phosphorus originating from the step of extracting at least one of iron and phosphorus is recirculated for dissolving the start material, emanating from sewage sludge ash. The recirculated part of the raffinate at least partly depleted in at least one of iron and phosphorus comprises chloride ions.

A method for depositing a silicon-containing film, the method comprising: placing a substrate comprising at least one surface feature into a flowable CVD reactor which is at a temperature of from about 20 C. to about 400 C.; introducing into the reactor at least one silicon-containing compound having at least one acetoxy group to at least partially react the at least one silicon-containing compound to form a flowable liquid oligomer wherein the flowable liquid oligomer forms a silicon oxide coating on the substrate and at least partially fills at least a portion of the at least one surface feature. Once cured, the silicon oxide coating has a low k and excellent mechanical properties.