Patent classifications
C01B33/14
Silica sol
The present invention relates to a silica sol having a pH above about 10, molar ratio of SiO2:M2O, in which M is alkali metal, of from about 6:1 to about 16:1, concentration of soluble silica above about 3000 mg SiO2/l, and S-value of from about 18 to about 40%. The invention further relates to a process for producing a silica sol which comprises acidifying an aqueous alkali metal silicate solution to a pH of from 1 to 4 to form an acid sol, alkalizing the acid sol by addition of aqueous alkali metal silicate solution to obtain an intermediate sol and interrupt the addition of aqueous alkali metal silicate solution when the intermediate sol has reached a pH of from about 5 to about 8, stirring the intermediate sol for a time period of from about 10 to about 6000 seconds without addition of aqueous alkali metal silicate solution, alkalizing the intermediate sol by addition of aqueous alkali metal silicate solution to obtain a silica sol having a pH above about 10 and molar ratio of SiO2:M2O, in which M is alkali metal, of from about 6:1 to about 16:1, and optionally adding an aluminum compound to the acid sol, intermediate sol or silica sol. The invention further relates to a silica sol obtainable by the process of the invention. The invention further relates to the use of the silica sol as a flocculating agent, in water purification and in producing paper and board. The invention further relates to a process for producing paper and board which comprises: (i) providing an aqueous suspension comprising cellulosic fibers; (ii) adding to the suspension one or more drainage and retention aids comprising the silica sol; and (iii) dewatering the obtained suspension to provide a sheet or web of paper or board.
Silica sol
The present invention relates to a silica sol having a pH above about 10, molar ratio of SiO2:M2O, in which M is alkali metal, of from about 6:1 to about 16:1, concentration of soluble silica above about 3000 mg SiO2/l, and S-value of from about 18 to about 40%. The invention further relates to a process for producing a silica sol which comprises acidifying an aqueous alkali metal silicate solution to a pH of from 1 to 4 to form an acid sol, alkalizing the acid sol by addition of aqueous alkali metal silicate solution to obtain an intermediate sol and interrupt the addition of aqueous alkali metal silicate solution when the intermediate sol has reached a pH of from about 5 to about 8, stirring the intermediate sol for a time period of from about 10 to about 6000 seconds without addition of aqueous alkali metal silicate solution, alkalizing the intermediate sol by addition of aqueous alkali metal silicate solution to obtain a silica sol having a pH above about 10 and molar ratio of SiO2:M2O, in which M is alkali metal, of from about 6:1 to about 16:1, and optionally adding an aluminum compound to the acid sol, intermediate sol or silica sol. The invention further relates to a silica sol obtainable by the process of the invention. The invention further relates to the use of the silica sol as a flocculating agent, in water purification and in producing paper and board. The invention further relates to a process for producing paper and board which comprises: (i) providing an aqueous suspension comprising cellulosic fibers; (ii) adding to the suspension one or more drainage and retention aids comprising the silica sol; and (iii) dewatering the obtained suspension to provide a sheet or web of paper or board.
COLLOIDAL SILICA FOR METAL POLISHING
The problem to be solved by the present invention is to provide colloidal silica for metal polishing that is capable of achieving a high polishing rate. This problem can be achieved by a colloidal silica for metal polishing, comprising a silica particle having a surface on which a functional group having at least one carboxyl group is immobilized by covalent bonding.
Silica products from geothermal fluids by reverse osmosis
The invention concerns a method and apparatus for producing silica concentrates from geothermal fluids containing at least 300 ppm silica, by passing the fluid at a temperature above 80° C. and at a pH reduced to between 4.0 and 7.5 through a reverse osmosis membrane. In the diagram, geothermal fluid (I) is passed to a separator (2) to be flashed to produce steam (3) and separated geothermal water (SGW) (4). The SGW (4) is passed to a heat exchanger (5) then inlet pump (7). Acid is introduced to the geothermal fluid flow at a dosing means (6) to reduce the pH and an anti-sealant may also be introduced. The geothermal fluid is then passed to a reverse osmosis unit (8) to produce a concentrate (9) and a permeate (10). Following reverse osmosis, the concentrate and permeate may be treated with other processes to produce the desired product and concentration. For example, if precipitated silica is produced, the concentrate is passed to a curing tank (11) and to a thickener (12). The precipitated silica is collected (13) while the retained fluid is removed (14).
Silica products from geothermal fluids by reverse osmosis
The invention concerns a method and apparatus for producing silica concentrates from geothermal fluids containing at least 300 ppm silica, by passing the fluid at a temperature above 80° C. and at a pH reduced to between 4.0 and 7.5 through a reverse osmosis membrane. In the diagram, geothermal fluid (I) is passed to a separator (2) to be flashed to produce steam (3) and separated geothermal water (SGW) (4). The SGW (4) is passed to a heat exchanger (5) then inlet pump (7). Acid is introduced to the geothermal fluid flow at a dosing means (6) to reduce the pH and an anti-sealant may also be introduced. The geothermal fluid is then passed to a reverse osmosis unit (8) to produce a concentrate (9) and a permeate (10). Following reverse osmosis, the concentrate and permeate may be treated with other processes to produce the desired product and concentration. For example, if precipitated silica is produced, the concentrate is passed to a curing tank (11) and to a thickener (12). The precipitated silica is collected (13) while the retained fluid is removed (14).
METHOD OF PRODUCING ANIONICALLY MODIFIED COLLOIDAL SILICA
There is provided a method of producing anionically modified colloidal silica capable of polishing a silicon nitride film at a high speed and suppressing a polishing speed of a silicon oxide film. A method of producing anionically modified colloidal silica includes ion exchanging raw colloidal silica using an ion exchange resin (ion exchange step); and anionically modifying ion-exchanged raw colloidal silica to obtain anionically modified colloidal silica (modification step).
METHOD OF PRODUCING ANIONICALLY MODIFIED COLLOIDAL SILICA
There is provided a method of producing anionically modified colloidal silica capable of polishing a silicon nitride film at a high speed and suppressing a polishing speed of a silicon oxide film. A method of producing anionically modified colloidal silica includes ion exchanging raw colloidal silica using an ion exchange resin (ion exchange step); and anionically modifying ion-exchanged raw colloidal silica to obtain anionically modified colloidal silica (modification step).
SILICA PARTICLE AND PRODUCTION METHOD THEREFOR, SILICA SOL, POLISHING COMPOSITION, POLISHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR WAFER AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
An object of the present invention is to provide a silica particle having excellent polishing characteristics and storage stability, a method for producing the silica particle, a silica sol containing the silica particles, and a polishing composition containing the silica sol.
Another object of the present invention is to provide a polishing method, a method for producing a semiconductor wafer, and a method for producing a semiconductor device, which are excellent in productivity of an object to be polished. The silica particle in the present invention satisfies formula (1): y≥4.2 where a d value measured by wide-angle X-ray scattering is y ∪.
SILICA PARTICLE AND PRODUCTION METHOD THEREFOR, SILICA SOL, POLISHING COMPOSITION, POLISHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR WAFER AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
An object of the present invention is to provide a silica particle having excellent polishing characteristics and storage stability, a method for producing the silica particle, a silica sol containing the silica particles, and a polishing composition containing the silica sol.
Another object of the present invention is to provide a polishing method, a method for producing a semiconductor wafer, and a method for producing a semiconductor device, which are excellent in productivity of an object to be polished. The silica particle in the present invention satisfies formula (1): y≥4.2 where a d value measured by wide-angle X-ray scattering is y ∪.
PREPARATION OF RARE EARTH METALS AND OTHER CHEMICALS FROM INDUSTRIAL WASTE COAL ASH
A process disclosed herein is related to the isolation and purification of substantially pure chemicals, including silica gel, sodium silicate, aluminum silicate, iron oxide, and rare earth elements (or rare earth metals, REEs), from massive industrial waste coal ash. In one embodiment, the process includes a plurality of caustic extractions of coal ash at an elevated temperature, followed by an acidic treatment to dissolve aluminum silicate and REEs. The dissolved aluminum silicate is precipitated out by pH adjustment as a solid product while REEs remain in the solution. REEs are captured and enriched using an ion exchange column. Alternatively, the solution containing aluminum silicate and REEs is heated to produce silica gel, which is easily separated from the enriched REEs solution. REEs are then isolated and purified from the enriched solution to afford substantially pure individual REE by a ligand-assisted chromatography. Additionally, a simplified process using one caustic extraction and one acidic extraction with an ion exchange process was also investigated and optimized to afford a comparable efficiency.