The present invention provides a method for producing a silanol compound capable of efficiently producing a silanol compound. The method for producing a silanol compound includes a proton exchange step of forming a silanol compound having a structure represented by following formula (c) by reacting a silicate having a structure represented by following formula (a) with an acidic compound having an acid dissociation constant pK.sub.a of −1 to 20 in dimethyl sulfoxide (DMSO).

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(In formula (a), Q.sup.i+ represents an i-valent cation and i represents an integer of 1 to 4).

Particles are disclosed. Methods of making and using the particles are also disclosed.

Particles are disclosed. Methods of making and using the particles are also disclosed.

The invention relates to a method for producing solid particles from an inorganic solid containing at least one alkali metal and/or alkaline earth metal, comprising at least the following steps: a) providing the inorganic solid containing at least one alkali metal and/or alkaline earth metal; b) extracting the at least one alkali metal and/or alkaline earth metal from the inorganic solid containing alkali metal and/or alkaline earth metal to obtain an extract containing the alkali metal and/or alkaline earth metal and an alkali metal-depleted and/or alkaline earth metal-depleted residue; c) separating the extract from the residue; d) processing the residue to obtain the solid particles, wherein at least one of the processing steps is selected from a group comprising transporting, filling, packaging, washing, drying, adjusting the pH value, separating according to a mean grain size and/or mass and/or density, adjusting a mean grain size, magnetic separating, calcining, thermal rounding and surface coating.

A method of producing a carbon material-containing material having a precisely controlled structure under a mild condition, a carbon material-containing material covalently bonded to an inorganic matter, and an intermediate material which is useful for, for example, industrially producing carbon-coated inorganic particles, hollow carbon fine particles, and can be industrially produced under a mild condition, are provided. The method of producing a carbon material-containing material includes heating a composition containing a compound (A), which causes a condensation reaction between the same and/or different molecules, and an inorganic matter. When the compound (A) has a condensation reaction temperature of T° C., a heating temperature is (T−150)° C. or more. The carbon material-containing material includes a carbon material and an inorganic matter. At least part of the carbon material and inorganic matter are covalently bonded. The organic-inorganic composite includes a carbon material and an inorganic matter. The carbon material is soluble in a solvent.

A method of producing a carbon material-containing material having a precisely controlled structure under a mild condition, a carbon material-containing material covalently bonded to an inorganic matter, and an intermediate material which is useful for, for example, industrially producing carbon-coated inorganic particles, hollow carbon fine particles, and can be industrially produced under a mild condition, are provided. The method of producing a carbon material-containing material includes heating a composition containing a compound (A), which causes a condensation reaction between the same and/or different molecules, and an inorganic matter. When the compound (A) has a condensation reaction temperature of T° C., a heating temperature is (T−150)° C. or more. The carbon material-containing material includes a carbon material and an inorganic matter. At least part of the carbon material and inorganic matter are covalently bonded. The organic-inorganic composite includes a carbon material and an inorganic matter. The carbon material is soluble in a solvent.

The present invention provides aqueous chemical mechanical planarization (CMP) polishing compositions have excellent heat aging and shelf stability in the form of concentrates comprising a mixture of a compound containing two quaternary ammonium groups, such as hexabutyl C.sub.1-C.sub.8 alkanediammonium dihydroxides or salts thereof, preferably N,N,N,N′,N′,N′-hexabutyl-1,4-butanediammonium dihydroxide (HBBAH), and aminosilane group containing silica particles in the amount of from 1 to 30 wt. % or, preferably, from 15 to 22 wt. %, as solids based on the total weight of the composition, the composition having a pH ranging from 3 to 5 or, preferably, from 3.5 to 4.5 wherein the composition is stable against visible precipitation or sedimentation at a 15 wt. % solids content after heat aging at a temperature of 45° C. for at least 6 days.

The present invention provides aqueous chemical mechanical planarization (CMP) polishing compositions have excellent heat aging and shelf stability in the form of concentrates comprising a mixture of a compound containing two quaternary ammonium groups, such as hexabutyl C.sub.1-C.sub.8 alkanediammonium dihydroxides or salts thereof, preferably N,N,N,N′,N′,N′-hexabutyl-1,4-butanediammonium dihydroxide (HBBAH), and aminosilane group containing silica particles in the amount of from 1 to 30 wt. % or, preferably, from 15 to 22 wt. %, as solids based on the total weight of the composition, the composition having a pH ranging from 3 to 5 or, preferably, from 3.5 to 4.5 wherein the composition is stable against visible precipitation or sedimentation at a 15 wt. % solids content after heat aging at a temperature of 45° C. for at least 6 days.

A porous silica particle with the small specific surface area and large pore volume, which is contained as the scrubbing agent in the cleansing cosmetics is provided. The porous silica particle has high collapsibility, and therefore the damage of the skin can be prevented. A porous silica particle according to the present invention has: an average circularity of 0.1 to 0.5; a pore volume of 0.1≦Pv<1.0 ml/g; a specific surface area of 5 to 60 m.sup.2/cm.sup.3; a median size of 100 to 1000 μm; a ratio of a maximum particle diameter to the median size, of 3.0 or less; and a median size of 5 to 40 μm and a maximum particle diameter of 15 to 200 μm, after rubbing for 30 seconds with a load of 1.0 to 1.4 KPa.

The present invention discloses an equipment and process for preparing silicon oxides, and relates to the field of chemical equipments. Said equipment comprises at least one tank having opening(s) at at least one end thereof and comprising a reaction unit and a collection unit, wherein the reaction unit is used for placing raw materials therein; and the collection unit is used for placing a collector therein which is placed at the opening end of the tank; and the reaction unit is placed away from the opening end of the tank and placed inside a heating furnace; the collection unit and opening(s) are both placed outside the heating furnace; the tank is vacuumized via a port; and a tank lid is used for opening or closing the opening(s) of the tank. The preparation process uses such equipment. The present invention solves the problems of great energy consumption and low efficiency caused by the fact that the previous equipment and process for preparing silicon oxides are unable to achieve continuous production.