Porous compositions and methods of making and using same. The compositions may be one or more layer(s) of mesoporous inorganic materials. The mesoporous inorganic material(s) may be a plurality of inorganic nanocages, which may be microporous. A composition may include homostacks of layers of the same inorganic mesoporous materials. A composition may include heterostacks of layers of inorganic mesoporous materials, where at least two of the layers are different. The compositions may be surface functionalized. The compositions may be formed in a reaction mixture including one or more precursor(s), one or more surfactant(s), water, and one or more organic solvent(s). The compositions may be formed at the liquid-liquid interface between the water and the one or more organic solvent(s). A composition may be used as a catalyst, in a catalytic method, as a separation medium, in a separation method, in nanomedicine applications, or the like.

Porous compositions and methods of making and using same. The compositions may be one or more layer(s) of mesoporous inorganic materials. The mesoporous inorganic material(s) may be a plurality of inorganic nanocages, which may be microporous. A composition may include homostacks of layers of the same inorganic mesoporous materials. A composition may include heterostacks of layers of inorganic mesoporous materials, where at least two of the layers are different. The compositions may be surface functionalized. The compositions may be formed in a reaction mixture including one or more precursor(s), one or more surfactant(s), water, and one or more organic solvent(s). The compositions may be formed at the liquid-liquid interface between the water and the one or more organic solvent(s). A composition may be used as a catalyst, in a catalytic method, as a separation medium, in a separation method, in nanomedicine applications, or the like.

An object of the present invention is to provide a silica particle, a silica sol containing the silica particle, and a polishing composition containing the silica sol, which prevent secondary aggregation, have excellent dispersion stability, and are suitable for polishing. The present invention relates to a silica particle in which an average value of a circularity coefficient measured by a field-emission scanning electron microscope is 0.90 or more, and a standard deviation of the circularity coefficient is 0.05 or less.

An object of the present invention is to provide a silica particle, a silica sol containing the silica particle, and a polishing composition containing the silica sol, which prevent secondary aggregation, have excellent dispersion stability, and are suitable for polishing. The present invention relates to a silica particle in which an average value of a circularity coefficient measured by a field-emission scanning electron microscope is 0.90 or more, and a standard deviation of the circularity coefficient is 0.05 or less.

An economic process for producing high quality finely divided silicon dioxide from mixtures comprising economical silicon compounds without operational disturbances is characterized by using as an Si source mixture of at least two silicon compounds, at least one being carbon-containing and at least one being carbon-free, supplying a fuel gas and an oxygen-containing source, the molar C/Si ratio of this mixture being between 10/BET and 35/BET, and the molar H/Cl ratio of this mixture being between 0.45+(BET/600) and 0.95+(BET/600), with BET being the specific surface area of the pyrogenic silicon dioxide under production, introducing this mixture as the main flow into a reaction space and igniting and reacting it, and isolating the resulting solid.

A method of forming nanoparticles having superhydrophobicity includes preparing a PDMS film including a structure having a predetermined shape on a surface thereof, and generating the nanoparticles having superhydrophobicity on the surface of the PDMS film by combusting the surface of the PDMS film using a diffusion flame. Transparent nanoparticles having superhydrophobicity and oleophobicity may be generated simply and easily on the surface of the PDMS film.

Synthesizing Janus nanoparticles including forming a lamellar phase having water layers, organic layers, and a surfactant, and reacting chemical precursors in the lamellar phase to form the Janus nanoparticles at interfaces of the water layers with the organic layers.

A negative electrode active material tor a secondary battery includes a silicate composite particle including crystalline silicon particles, an amorphous phase comprising an Li element, an O element, and an Si element, and a silicon oxide phase, wherein the silicon oxide phase and the silicon particles are dispersed in the amorphous phase.

There is provided a production method of a chain silica particle dispersion. This production method includes a dispersion preparation step of hydrolyzing alkoxysilane in the presence of ammonia to prepare a silica particle dispersion, an ammonia removal step of removing the ammonia from the silica particle dispersion such that an ammonia amount relative to silica contained in the silica particle dispersion is 0.3% by mass or less, and a hydrothermal treatment step of hydrothermally treating the silica particle dispersion having a silica concentration of 12% by mass or more, from which the ammonia has been removed, at a temperature of not lower than 150° C. and lower than 250° C. An abrasive including such chain silica particles is high in polishing rate and excellent in polishing properties.

There is provided a production method of a chain silica particle dispersion. This production method includes a dispersion preparation step of hydrolyzing alkoxysilane in the presence of ammonia to prepare a silica particle dispersion, an ammonia removal step of removing the ammonia from the silica particle dispersion such that an ammonia amount relative to silica contained in the silica particle dispersion is 0.3% by mass or less, and a hydrothermal treatment step of hydrothermally treating the silica particle dispersion having a silica concentration of 12% by mass or more, from which the ammonia has been removed, at a temperature of not lower than 150° C. and lower than 250° C. An abrasive including such chain silica particles is high in polishing rate and excellent in polishing properties.