The present invention relates generally to an apparatus for cleaning or otherwise treating a floored surface that includes a platform adapted to support the weight of an operator. In addition, one embodiment of the present invention is capable of generally performing 360 degree turns to facilitate the treatment of difficult to access portions of the floored surface.

The present invention relates generally to an apparatus for cleaning or otherwise treating a floored surface that includes a platform adapted to support the weight of an operator. In addition, one embodiment of the present invention is capable of generally performing 360 degree turns to facilitate the treatment of difficult to access portions of the floored surface.

The present invention relates generally to an apparatus for cleaning or otherwise treating a floored surface that includes a platform adapted to support the weight of an operator. In addition, one embodiment of the present invention is capable of generally performing 360E turns to facilitate the treatment of difficult to access portions of the floored surface.

The present invention relates generally to an apparatus for cleaning or otherwise treating a floored surface that includes a platform adapted to support the weight of an operator. In addition, one embodiment of the present invention is capable of generally performing 360E turns to facilitate the treatment of difficult to access portions of the floored surface.

The present disclosure provides a cleaning robot docking station and a cleaning system with the cleaning robot docking station. The cleaning robot docking station includes an evaporation equipment, configured to evaporate liquid inside the evaporation equipment and expel a first gas. The cleaning robot docking station further includes a condensation equipment, configured to receive the first gas from the evaporation equipment, condense at least a part of the water vapor in the first gas, and expel a second gas. The first gas is pre-cooled before entering the condensation equipment.

A supply tank assembly for a cleaning apparatus includes first and second reservoirs for housing first and second liquids, respectively, and a cap assembly with a plunger. A first flow path for the first liquid is defined from the first reservoir to the dispensing outlet. A second flow path for the second liquid is defined from the second reservoir to the dispensing outlet. A switch assembly is operable between different positions to control dispensing of the second liquid. The plunger is biased toward a sealed position to seal the first and second flow paths and is configured to move to an opened position to open the first and second flow paths to concurrently dispense the first and second liquids to be mixed outside of the supply tank assembly based on a position of the switch assembly.