A method for disinfecting water by UV irradiation in water supply systems in buildings, ships or the like with a water tapping point connected flexibly to a hose (1), in particular hand shower (1′), and a water tapping point mount (2) for receiving (21) the water tapping point (1) when not in use, wherein the UV radiation takes place at the water tapping point (1). The UV-irradiation is directed from the water tapping point mount (2) to the water tapping point (1) when the water tapping point (1) is deposited in the water tapping point mount (2). Furthermore, the invention relates to a water tapping point. Means are provided for UV irradiation (3) of the water guided in the water tapping point (1). The means for UV irradiation (3) are arranged in the water tapping point mount (2), and a UV radiation transmissive window is provided in the water tapping point (1) opposite to the means for UV irradiation (3) when deposited (21) in the water tapping point mount (2).

Disinfection apparatus having submersible disinfection devices for disinfecting fluid. The disinfection apparatus includes: a pipe having one or more linear segments; one or more disinfection devices installed on the pipe, each of the one or more disinfection devices generating light for disinfecting fluid in a linear segment of the pipe; and a controller electrically coupled to the one or more disinfection devices and controlling the one or more disinfection devices. Another embodiment of the disinfecting apparatus includes; side and bottom walls and a lid that define an enclosed chamber; an inlet and outlet for communicating fluid to the enclosed chamber; a plurality of disinfection devices disposed on the side wall, each of the plurality of disinfection devices generating light for disinfecting fluid inside the enclosed chamber; and a controller electrically coupled to the plurality of disinfection devices and controlling the plurality of disinfection devices.

Disclosed is a sterilization apparatus including: a semiconductor UV (ultraviolet) light emitting diode; and a case including an upper section with an internal space and an entrance opening, a bottom face opposite to the entrance opening, and a lateral face connecting the bottom face and the upper section.

A method for treating a liquid loaded with ingredients includes injecting the liquid into a reactor vessel such that a circular movement is imparted to the liquid and such that a concentration of the ingredients in a region of a peripheral wall of the reactor vessel increases in a direction from a reactor inlet to a reactor outlet, impinging ultrasound waves having a first intensity and/or ultraviolet radiation having a first intensity on the liquid in a first portion of the reactor vessel, and impinging ultrasound waves having a second intensity and/or ultraviolet radiation having a second intensity on the liquid in a second portion of the reactor vessel. The concentration of the ingredients in the first portion is less than the concentration of the ingredients in the second portion and the first intensity is less than the second intensity. Also a reactor vessel.

A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.

A fluid sterilization apparatus includes: a flow passage tube in which a processing passage where a passing fluid is sterilized is formed; a first light source that irradiates the processing passage with ultraviolet light; an inflow passage formed in a direction that intersects an outer circumferential surface of the flow passage tube; and a communication passage that causes the inflow passage to communicate with the processing passage. The communication passage has a narrow passage in the middle of a path from the inflow passage toward an opening of a first end, the narrow passage being narrower than a passage toward the inflow passage.

A UV/O.sub.3/H.sub.2O.sub.2 advanced oxidation reactor includes a water inlet pipe, a water outlet pipe, an ultraviolet reactor, an H.sub.2O.sub.2 adding device and an O.sub.3 adding device. The ultraviolet reactor has a plurality of ultraviolet lamps embedded therein, and the ultraviolet lamps are arranged at an angle with respect to partition plates. The water inlet pipe is connected to a water inlet in a lower portion of the ultraviolet reactor, and the water outlet pipe is connected to a water outlet in an upper portion of the ultraviolet reactor. The H.sub.2O.sub.2 adding device and the O.sub.3 adding device are arranged on a connecting pipe of the water inlet pipe. After raw water is pressurized, H.sub.2O.sub.2 is added into the raw water through the H.sub.2O.sub.2 adding device, then ozone is added in the raw water through a water injector, and finally the raw water enters the ultraviolet reactor.

A liquid treatment device includes a base with a power source, a UV-LED module for providing UV-B or UV-C light to liquid, an LED for providing visible light, and a processor for selectively powering the UV-LED module and the LED, and having a UV transmissive material above the UV-LED module for allowing the UV-B or UV-C band light from the UV-LED module to be transmitted from the base housing, and a liquid storage housing removably coupled to the base housing with a storage portion configured to hold liquid and having a bottom portion comprising a UV transmissive material for allowing the UV-B or UV-C band light from the UV-LED module to be transmitted into the liquid, and an output coupled for restricting outflow of the liquid from the storage portion.

A UV treatment cartridge having an exterior housing and a UV treatment module located inside of the exterior housing. The UV treatment module having a UVLED array for UV treatment of a fluid passing through the UV treatment module. An internal annular space between the exterior sidewall and the module sidewall forms an entry flow path to the UV treatment module thereby substantially balancing fluid pressure acting on the inside of the module sidewall and acting on the outside of the module sidewall.

A method and UV reactor, the UV reactor having a longitudinal flow chamber, an input, and an output for fluid flow entry and exit, where the input has an inlet pipe followed by an inlet cone, said UV reactor having at least one longitudinal UV-lamp, and where the UV-lamp has a flow path from the input to the output via the flow chamber, for UV radiation exposure as fluid flows from the input to the output to receive a UV dose, so that the fluid applied to the UV reactor via the input of the flow chamber, is applied a uniform helical flow path where all the fluid applied to the UV reactor passes at least one UV lamp at a distance to receive a prescribed UV dose related to the current UV reactor, during passing of the fluid inside the UV reactor.